ALD/ALE 2020 Virtual Meeting Overview
The AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the7th International Atomic Layer Etching Workshop (ALE 2020) will be adapted into a Virtual Meeting comprisedof Live and On Demand (recorded) Sessions. The pre-registration deadline is June 25, 2020.

Virtual Meeting Highlights
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Live Daily Session with Plenary and Invited
Speakers with Q&A Chat
Live Announcement of the AVS ALD Innovator &JVST Best Paper Award
Live Two-Day Tutorial with Academicand Industry Experts with Q&A Chat
Live Student Awards Presentations withQ&A Chat and an Awards Presentation
Live Virtual Sponsor Rooms
On Demand Poster Sessions with a Mix of Prerecorded (Video or Audio) Talks and/or PDFs
On Demand Sessions Available ThroughJuly 2021

Time Zone: All Live Sessions will be held in Eastern
Daylight Time (EDT). Please note that Live Sessions
will also be recorded and added to the On DemandSessions. Time Zone Converter Tool

Virtual Meeting Quick LinksConference Website
Registration
Presentation Instructions
Viewing Instructions

The ALD/ALE 2020 Virtual Meeting will kick off
on Monday, June 29, 2020, with a FREE(registration required) live Plenary & ALD
Innovator Award Session. Following theannouncement of the ALD 2020 Awardee there will
be a series of plenary and invited talks.
Paid attendees will also be able to participate inthe Tuesday, June 30, 2020 and Wednesday,
July 1, 2020, Technical & Poster Sessions. The
live sessions will feature invited and student awards
talks. After each day’s live sessions, we also invite
attendees to view the pre-recorded Technical &Poster Sessions On Demand. Posters will be a mixof pre-recorded (video or audio) talks and/or PDFs.
Attendees may also register for the Tutorial that isbeing held live over a two-day period (Tuesday,June 30-Wednesday, July 1). The Tutorial willfeature three speakers each day with a live question
and answer period where your chat questions canbe answered. The Tutorial Sessions will be recorded
and placed On Demand for those who paid for them
until July 31, 2020

Virtual Meeting ScheduleLive Session Schedule: May be found on the next several pages or in the ALD/ALE 2020 Online
Scheduler and Mobile App. Live Sessions will be presented over the conference dates: June 29-July 1.
On Demand Session Schedule: Will be posted soon in the ALD/ALE 2020 Online
Scheduler and Mobile App. On Demand access will begin on June 29.

All sessions will be accessible via the ALD/ALE 2020 Online Scheduler and/or Mobile App until July 31, 2020*. Live sessions will
be presented over the conference dates (June 29-July 1, 2020). On Demand access will begin on Monday, June 29, 2020.
*Access After July 31, 2020: AVS Platinum Members will have access to all On Demand Sessions (except the Tutorial) inthe AVS Technical Library until their membership expiration date. Non-Members will also receive access to all On DemandSessions as AVS Silver Members until July 31, 2021.

Monday Morning, June 29, 2020
Live Session
Room: Live - Session LI1-MoM
Plenary & ALD Innovator Award Session: Monday Live
Moderators:
Christophe Detavernier, Ghent University, Belgium,
Erwin Kessels, Eindhoven University of Technology, The Netherlands
10:00 am

LI1-MoM7 Plenary & ALD Innovator Award Session Welcome Introduction, C. DETAVERNIER, J. DENDOOVEN, Ghent
University, Belgium, P. POODT, TNO/Holst Center, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology,Netherlands, H.C.M. KNOOPS, Oxford Instruments Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium

10:15 am

LI1-MoM8 Invited
ALD Innovator Awardee Introduction, MIKKO RITALA, University of Helsinki, FinlandLI1-MoM9 Invited
Selective and Atomic Scale Processes to Enable Future Nano-Electronics, ROBERT CLARK, TEL Technology Center, America,
LLC
10:45 am Invited talk continued.
10:30 am

11:00 am

LI1-MoM11 Invited
The First Application of ALD Technology in Display Industry, HYUN-CHUL CHOI, LG Display, Republic of Korea

11:15 amBreak

11:30 am

LI1-MoM13 Invited
ALD on Powders for Catalysis, FRANK ROSOWSKI, BASF SE, Germany

11:45 amInvited talk continued.

12:00 pm

LI1-MoM15 Invited
The Flip Side of the Story: Atomic Layer Etching, KEREN KANARIK, Lam Research Corp.

12:15 pm

Invited talk continued.

12:30 pm

LI1-MoM17 JVST Best Paper Award, Closing Remarks, & Sponsor Thank You, C. DETAVERNIER, J. DENDOOVEN, Ghent
University, Belgium, P. POODT, TNO/Holst Center, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology,Netherlands, H.C.M. KNOOPS, Oxford Instruments Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium

Tuesday Morning, June 30, 2020
Live Session
Room: Live - Session LI2-TuM
Technical & Poster Sessions: Tuesday Live
Moderators:Harm C.M. Knoops, Oxford Instruments Plasma Technology, The Netherlands,Paul Poodt, TNO/Holst Center, The Netherlands
10:00 am LI2-TuM7 Welcome and Introduction, CHRISTOPHE DETAVERNIER, J. DENDOOVEN, Ghent University, Belgium, P.
POODT, TNO/Holst Center, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology, Netherlands, H.C.M.
KNOOPS, Oxford Instruments Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium
10:15 am

LI2-TuM8 Invited
Thermal Atomic Layer Deposition of Noble Metal Films Using Non-Oxidative Coreactants, CHARLES H. WINTER, Wayne State
University

10:30 amInvited talk continued.

10:45 am

LI2-TuM10 Mixing It Up: Tuning Atomic Ordering in 2-D Mo1-xWxS2 Alloys by ALD, JEFF SCHULPEN, W.M.M. KESSELS, V.
VANDALON, A. BOL, Eindhoven University of Technology, Netherlands

11:00 am

LI2-TuM11 Deposition of Conductive PEDOT Thin Films with EDOT and ReCl5 Precursors, SABA GHAFOURISALEH, G.
POPOV, M. LESKELÄ, M. PUTKONEN, M. RITALA, University of Helsinki, Finland

11:15 amBreak

11:30 am

LI2-TuM13 Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon, MIKHAILKRISHTAB, KU Leuven/Imec, Belgium, T. KULMALA, E. CAGIN, Heidelberg Instruments Nano, Switzerland, S. ARMINI, Imec,Belgium, S. DE GENDT, KU Leuven/Imec, Belgium, R. AMELOOT, KU Leuven, Belgium

11:45 am

LI2-TuM14 Mimicking Chitin and Chitosan Type of Functionality with Novel Thin Films Grown by Molecular Layer Deposition,KARINA ASHURBEKOVA, M. KNEZ, CIC nanoGUNE BRTA, Spain

12:00 pm

LI2-TuM15 Closing Remarks & Sponsor Thank You, C. DETAVERNIER, J. DENDOOVEN, Ghent University, Belgium, P.
POODT, TNO/Holst Center, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology, Netherlands, H.C.M.
KNOOPS, Oxford Instruments Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium

Wednesday Morning, July 1, 2020
Live Session
Room: Live - Session LI3-WeM

10:00 am

10:15 am

10:30 am

10:45 am

11:00 am

11:15 am

11:30 am

Technical & Poster Sessions: Wednesday Live
Moderators:Christophe Detavernier, Ghent University, Belgium,Jean-François de Marneffe, IMEC, Belgium
LI3-WeM7 Welcome & Introduction, C. DETAVERNIER, J. DENDOOVEN, Ghent University, Belgium, P. POODT, TNO/HolstCenter, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology, Netherlands, H.C.M. KNOOPS, Oxford Instruments
Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium
LI3-WeM8 Invited
Surface Reactions Between Metals and Diketone induced by Gas Cluster Ion Bombardments, N. TOYODA, K. UEMATSUi,University of Hyogo, Japan
Invited talk continued.
LI3-WeM10 ALE 2020 Best Student Paper Award Talk: Isotropic Plasma ALE of Al2O3 using SF6 Plasma and TMA, N.
CHITTOCK, M. VOS, A. MACKUS, Eindhoven University of Technology, Netherlands, H.C.M. KNOOPS, Oxford Instruments
Plasma Technology, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology, Netherlands
Break
LI3-WeM12 Invited
Monolayer Lithography: Exploiting Inhibition Contrast from the Extreme Ultraviolet Irradiation of Organic Monolayers for Area
Selective Depositions, R. WOJTECKI, IBM Research - Almaden
Invited talk continued.

11:45 am

LI3-WeM14 Super-Conformal ALD of Metallic Mo Films by Simultaneous Deposition and Etch, J.-S. LEHN, EMD Performance
Materials, C. DEZELAH, ASM, Finland, J. WOODRUFF, R. KANJOLIA, D. MOSER, T. POLSON, EMD Performance Materials

12:00 pmBreak

12:15 pm

LI3-WeM16 Process Optimization in Atomic Layer Deposition Using Machine Learning, A. YANGUAS-GIL, S. LETOURNEAU, A.
MANE, N. PAULSON, A. LANCASTER, JEFFREY W. ELAM, Argonne National Laboratory

12:30 pm

LI3-WeM17 ALD/ALE Student Awards, Closing Remarks, & Sponsor Thank You, C. DETAVERNIER, J. DENDOOVEN, Ghent
University, Belgium, P. POODT, TNO/Holst Center, Netherlands, W.M.M. KESSELS, Eindhoven University of Technology,Netherlands, H.C.M. KNOOPS, Oxford Instruments Plasma Technology, Netherlands, J.-F. DE MARNEFFE, IMEC, Belgium

Tuesday, June 30 – Wednesday, July 1,
2020Tutorials

Tutorials
Room: Live - Session TU1-TuA
Tutorial Session: Tuesday Live
Moderators: Christophe Detavernier, Ghent University, Belgium,Harm C.M. Knoops, Oxford Instruments Plasma Technology, The
Netherlands

Room: Live - Session TU2-WeA
Tutorial Session: Wednesday Live
Moderators: Jean-François de Marneffe, IMEC, Belgium,Erwin Kessels, Eindhoven University of Technology, TheNetherlands, Paul Poodt, TNO/Holst Center, The Netherlands

1:00 TU1-TuA1 Tuesday Tutorial Welcome & Sponsor Thank You,pm CHRISTOPHE DETAVERNIER, Ghent University, Belgium

TU2-WeA1 Wednesday Tutorial Welcome & Sponsor Thank
You, ERWIN KESSELS, Eindhoven University of Technology,Netherlands

1:15 TU1-TuA2 Invited
pm ALD Precursor Chemistry: Synthetic Routes, Purification andEvaluation of Precursors, ANJANA DEVI, Ruhr UniversityBochum, Germany

TU2-WeA2 Invited
Growth Mechanisms and Selectivity During Atomic Layer
Deposition, ANNELIES DELABIE, KU Leuven – University ofLeuven/IMEC, Belgium

1:30
pm
1:45
pm
2:00 Breakpm

Break2:15 TU1-TuA6 Invited
pm Atomic Layer Engineering: Hardware Considerations for ALD
System Design and Process Development, NEIL DASGUPTA,
University of Michigan

TU2-WeA6 InvitedSelf-limiting Surface Reactions for Atomic-level Control ofMaterials Processing, SIMON D. ELLIOTT, Schrödinger, Inc.

2:30
pm
2:45
pm
3:00 Breakpm

Break3:15 TU1-TuA10 Invitedpm ALD on High Aspect Ratio and Nanostructured Materials: fromFundamentals to Economics, ANGEL YANGUAS-GIL, Argonne
National Laboratory

TU2-WeA10 Invited
Fundamentals of ALE – Optimizing Passivation and Etch*,
MARK KUSHNER, University of Michigan

3:30
pm
3:45
pm
4:00 TU1-TuA13 Questions & Answers, A. DEVI, Ruhr University
pm Bochum, Germany, N. DASGUPTA, University of Michigan, A.
YANGUAS-GIL, Argonne National Laboratory

TU2-WeA13 Questions & Answers, M. KUSHNER, University ofMichigan, ANNELIES DELABIE, KU Leuven – University ofLeuven/IMEC, Belgium, S.D. ELLIOTT, Schrödinger, Inc.

4:15
pm

4:30 TU1-TuA15 Session Over - View On Demand Presentations
pm
4:45
pm

TU2-WeA15 Session Over - View On Demand Presentations