X-ray Focusing
Compound Refractive Lenses (CRL)

Compound refractive lenses focusing monochromatic hard X-ray

Hard X-ray focusing

X-ray lens system with changeablefocal distance Zoom lensStandard CRL

©1

©1

©1

Compound refractive lens (CRL) for high energy X-ray
focusing applications

Flexible X-ray lens systemwith changeable working distance- Line and point focusing- High energy for > 100 keV applicable- Also useable as collimating lens©1

- User can optimise the working distance withremoveable focusing elements- Manually or electrically driven- Small outer dimension of 100 mm x 120 mm x 100 mm©1

Multiple focusing conditions in one
lens array Multi-focus lensLarge aperture with low absorption
X-ray prism lens (XPL)©1

Prisms arranged to redirect
refracted ray to the focus point©1

Lens arrays in 2D-grid- Lenses optimised for different set-ups can be mounted in asingle lens block- At most 10 x 10 lens matrix available (in the case of 150 µm
physical aperture)- Multiple focal points on one plane by illuminating the wholeaperture

Focusing example
12.4 keV, WD = 1.6 m
Incident beam size: 1.5 mm x 1.5 mm
Focus point size: 52 µm x 46 µm
Delivery examples (SPring-8)
BL13XU, BL43LXU©1 Karlsruhe Institute of Technology IMT©1With supporting structures

Ver. 201806

Your Local Contact: ASICON Tokyo Ltd.
代理店：株式会社ASICON（日本，韓国，台湾）
www.asicon-tokyo.com microtech@asicon-tokyo.com

X-ray Focusing
Compound Refractive Lenses (CRL)

Compound refractive lenses focusing monochromatic hard X-ray

Compound refractive lens

2D focusing lens

Focusing concept and standard specifications

Standard layout

With more lens elements, getting shorter focal lengths©1CRL specifications- Lens material: SU-8 (epoxy resist)- Entrance aperture size (physical): up to 1,500 μm- Wide energy range applicable (> 8 keV)
- Focal point size: min. 0.5 μm x 0.5 μm- Focal length: > several tens mm- Lens plate dimension: 70 mm x 35 mm

CRL application example

CRLs made by KIT/IMT and X-ray aperture made by microworks GmbH realised a focused
beam size of 1 µm x 1 µm (FWHM).
Courtesy of Dr Naohisa Hirao (JASRI) and Dr Yasuo Ohishi (JASRI)

BL10XU SPring-8 JapanOH

EH1Long WD CRL

EH2Virtual source
pin-hole#1357

Undulator

Strengths- Point focusing realised by crossing two lens arrays by 90°- Optical axis does not change- Easily installed because only one plate is required- Can be used as collimating lens
- Fresnel lens is also available

Short WD CRL#1405(10 µm diameter aperture)SampleSource30 keVSD1

WD1SD2WD2

42,000 mm

7,200 mm7,500 mm

500 mmDelivery record
SPring-8 and Photon Factory,Japan

BL24XU（兵庫県）兵庫県 ID

BL19LXU（RIKEN）物理科学 II

BL35XU（JASRI）高分解能非弾性散乱
BL39XU（JASRI）磁性材料

First delivery:
12.2005
Lens manufacturer:
Karlsruhe Institute of Technology(KIT)/IMTBL22XU（JAEA）重元素科学 I

BL40XU（JASRI）高フラックス
BL41XU（JASRI）構造生物学Ⅰ
BL43LXU（RIKEN）量子ナノダイナミクス
BL45XU（RIKEN）構造生物学 I
BL46XU（JASRI）産業利用 III

Delivery record
SPring-8
1D Standard ... 5
2D Standard ... 31
1D Customised ... 2
2D Customised ... 5Photon Factory
1D Standard ... 1
As of 1.2018©1 Karlsruhe Institute of Technology IMT

BL15XU（NIMS）

広エネルギー帯域先端材料解析

BL13XU（JASRI）表面界面構造解析
BL10XU（JASRI）高圧構造物性
BL09XU（JASRI）核共鳴散乱
BL08W（JASRI）高エネルギー非弾性散乱
BL03XU

フロンティアソフトマター開発産学連合

Ver. 201806

Your Local Contact: ASICON Tokyo Ltd.
代理店：株式会社ASICON（日本，韓国，台湾）
www.asicon-tokyo.com microtech@asicon-tokyo.com

X-ray Gratings
for Talbot Interferometry

X-ray gratings fabricated by KIT/IMT and microworks GmbHHigh aspect ratio structure©1

Large structured area
©1Structure examples

100 mm round Ni mask 6 inch wafer

Height [µm]2004Period [µm]

4.8

3.57

MaterialAu

Ni

AR

791.1

TypeG0/G2

G1

Karlsruhe Institute of Technology (KIT)/IMT and microworks GmbHhave a long experience in the LIGA process, develop and provide
high AR X-ray gratings worldwide.

Very small period grating
Within a limited area andlimited metal thickness, 1.0
μm to 2.0 μm period gratings
have been realised.

70 mm round Ti mask 4 inch waferStandard(a) 4 inch wafer:
70-90 mm round(b) 6 inch wafer:up to 110 mm
20 mm x 60 mm
with some constraints
Ti mask 4 inch wafer
Optional- Tiling multiple grating plates- Enlarging the structured area made in a single fabrication
process

Bent grating

Structure examples
Example 1

Example 2

Period

2.0 µm

1.0 µm

MetalNi

AuHeight

3.2 µmUp to 5 µm

For18 keV, π/226 keV, π/2Area

10 mm x 10 mm 5 mm x 5 mm

SubstratePolyimide

Si 200 µm

DesignContinuousBridges

To avoid shadow
effect due to conebeam, bending canbe implemented.

©1©2Lamella width: 0.5 μm

FoodinspectionNondestructivetesting

2.5 mmAbsorption

2.5 mm©3BL-14C Photon Factory, JapanE = 17.8 keV with Al filter (2.0 mm)
G1: period 2.4 μm (Ni)G2: period 2.4 μm (Au)

©1Images taken with a slot scanning set-up at 70 kVp (tubesource) under a symmetric Talbot-Lau arrangement usinggratings with a period of 10 µm.
Gratings were linearly tiled to form a 400 mm x 25 mm area.

Differential phase

G1Sample

Double-crystal mono.
Si (220)©1 Karlsruhe Institute of Technology IMT, ©2 microworks GmbH, ©3 ASICON Tokyo Ltd.

Your Local Contact: ASICON Tokyo Ltd.
代理店：株式会社ASICON（日本，韓国，台湾）
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G2©3

X-rayimager

Asymmetric crystal
Si (220), 8.5 degVer. 201806

High Aspect Ratio Micro StructuresLIGA process and its applications

X-ray aperture

Central beam stopSingle/multi through-holes©2Examples(a) Multi holes with
3.0 μm diameter and80 μm gold thickness(b) Single hole with
5.0-10.0 μm diameterand 200 μm gold thickness

X-ray aperture and CRL
application example

ExampleMaterial: Au
Pillar diameter:
30-160 μm,height: 80 μm
Supporting fin thickness:
2.5-10 μm (centre / outer)

EH1

EH2

Virtual source
pin-hole#1357

Undulator

ExampleMaterial: NiHeight: 1,500 μm
Smallest structure: 12 μm Smallest air
gap: 5-8 μm (smaller apertures feasible
with smaller height)
Top surface polishable©2

X-ray focusing lenses (CRLs) made by KIT/IMT and X-ray aperture made by microworks
GmbH realised a focused beam size of 1 µm x 1 µm (FWHM).
Courtesy of Dr Naohisa Hirao (JASRI) and Dr Yasuo Ohishi (JASRI)

BL10XU SPring-8 JapanLong WD CRL

©1

©2

©2

OH

High aspect ratiostructure

Short WD CRL#1405(10 µm diameter aperture)SampleSource30 keVSD1WD1SD2

WD2

42,000 mm

7,200 mm7,500 mm

500 mm

LIGA
micro fabrication process
Example: absorption grating(a) Resist layer preparation(b) X-ray exposure through the mask to the resist layer(c) Realisation of precise resist structure(d) Gold structure realisation by electroplating

(a)

TiO

ResistSi(b)

Low AR: Low aspect ratio (AR) structures can be directly drawn on
the resist without mask and it can be electroplated afterwards.

(c)Developed resist

Ti
X-rayMask(d)

AuHigh AR: Depending on the aspect ratio,
one or two masks will be required.

©1 Karlsruhe Institute of Technology IMT, ©2 microworks GmbHVer. 201806

Your Local Contact: ASICON Tokyo Ltd.
代理店：株式会社ASICON（日本，韓国，台湾）
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Institute of Microstructure Technologyof Karlsruhe Institute of Technology (KIT/IMT)

カールスルーエ技術研究所
（KIT）
・IMT

Organisation: In Division III of the Karlsruhe Institute of Technology (KIT), Germany
Expertise: Structuring diverse polymeric materials and selected metals (esp. Au and Ni)
down to the nm range.
Major technologies: Lithographic structuring (e-beam, deep X-ray, and UV
lithographies) and replication methods (hot embossing, thermoforming, and nanoimprint).

KITFZK研究所

研究所名：カールスルーエ技術研究所（KIT）
・IMT

主要技術：リソグラフィ（電子ビーム，ディープ X線，UV）を用いた構造化と，複製技術（ホットエンボス，熱形成，ナノインプリント）。多種のポリマーや金属（特に金とニッケル）を nm レンジまで微細に構造化可能。

X-ray imaging
and Spectroscopy

Uni-KA大学

Bio-,
Nano photonics
Microfluidics,
BioMEMS
KARA

放射光施設

Merged in 2009
Employees: 9,239 (2016)
Budget: Euro 851 million (2016)
Baden-Württemberg, Germany

Smart materials
Micro-,
Nano replication©1

Synchrotron radiation source KARA (formerly ANKA)

microworks GmbHA spin-off company from KIT/IMT providing high precision metal structures

カールスルーエ技術研究所・IMT のスピンオフ企業About: Founded in 2007 as a spin- off from the Instituteof Microstructure Technology (IMT) of Karlsruhe Institute ofTechnology (KIT) in Germany.
Core competence: X-ray lithography which realises thehighest aspect ratios and a precision well below 1 μm
within a wafer and from wafer to wafer.
Production chain: From layout and mask making to UV
and X-ray lithography up to electroplating and surface
finishing.
Mission: To serve the clients as the number-one supplierof high-precision microstructures made with X-ray andlaser LIGA technology.
Founder and Managing Director: Dr Joachim Schulz

ドイツ ・ カールスルーエ技術研究所・IMT のスピンオフ企業（2007年設立）

コアコンピタンス：高アスペクト比と 1 µ m 未満の高精度を可能 とする X 線リソグラフィ

製造プロセス：レイアウトとマスク作製から，UV ，X 線リソグラ フィ，更には電鋳と表面仕上げまで対応

ミッション： X 線リソグラフィとレーザーLIGA 技術による高精度微細構造の最良のサプライヤーとして顧客に貢献する

ASICON Tokyo Ltd.
株式会社ASICON
URL: http://www.asicon-tokyo.com
Contact: microtech@asicon-tokyo.com
Company name
Founded on
Managing Director
Main businesses
Suppliers

ASICON Tokyo Ltd.
25.12.2006
Tomoaki TSUGITA
Sales and facilitation services of customer specificmicrostructured parts in X-ray optic and microfluidic fields
Karlsruhe Institute of Technology (KIT) / IMTmicroworks GmbHmicrofluidic ChipShop GmbH

©1 Karlsruhe Institute of Technology IMT, ©2 microworks GmbH©2

In the fields of X-ray optics andmicrofluidics, ASICON Tokyo Ltd.
of fers end-user specific microstructured parts fabricated inGermany to Japanese, Korean
and Taiwanese customers.
商号
設立
代表取締役
主要事業

サプライヤー株式会社 ASICON は，欧州（特にドイツ）にて開発された，微細加工を中心とした技術やサービスと，それらから派生した製品を，日本，韓国，台湾のお客様に提供しております。

株式会社 ASICON
2006年12月25日
次田 友暁
・微細加工技術によって製造された製品の販売と仕様達成のためのコンサルティング
・国外技術並びに製品の販売及び研究開発のためのコンサルティング
並びに市場調査
カールスルーエ技術研究所・IMT

microworks GmbHmicrofluidic ChipShop GmbHwww.asicon-tokyo.com / Ver. 201806