LPM2001 Oral Program

Oral Presentations
Wednesday, May 16 (A)
10:00
10:10

Opening Remarks (10:00am-10:10am) --- Conference Hall (7th Floor)
Miyamoto Isamu
Session 1A: Overview --- Conference Hall (7th Floor)
Chair: Sugioka Koji, RIKEN (Institute of physical and Chemical research) (Japan)• Laser microprocessing in data storage industry (Invited Paper), Chong Tow Chong, DSI (Singapore)[A101]• Femtosecond pulses for medicine and production technology - Overview of a German national project(Invited Paper), Dausinger Friedrich, University of Stuttgart (Germany)[A086]• Review on recent progress of laser precision microfabrication in China (Invited Paper), Cheng Zhao Gu,
Xu Guoliang, Zhao Quanzhong, Chinese Academy of Sciences (China)[A068]• History and future prospect of excimer lasers (Invited Paper), Basting Dirk, Lambda Physik (Germany)[A110]
Lunch (12:10pm-1:40pm)

13:40

Session 2A: Ultrafast Laser Processing(1) --- Conference Hall (7th Floor)
Chair: Mazur Eric, Harvard University (USA)
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15:30

Optimum energy absorption of a short-pulse laser in a doped dielectric slab, Ang LayKee, Los Alamos
National Laboratory (USA)[A002]
Sub-Picosecond ion emission from transparent dielectrics, Henyk M., Costache F., Reif J., Brandenburg
University of Technology (Germany)[A055]
Ultrafast laser ablation of dielectrics employing temporally shaped femtosecond pulses, Stoian R.,
Boyle M., Thoss A., Rosenfeld A., Korn G., Hertel I.V., Max-Born Institute; Ashkensai D., Laser undmedizin Technologie GmbH (Germany), Cambell E.E.B., Goteborg University and Chalmers University ofTechnology (Sweden)[A035]
Laser-induced expansion, melting and ablation mechanisms of organic materials (Invited Paper),
Masuhara Hiroshi, Osaka University (Japan)[A102]

Coffee Break (3:10pm-3:30pm)
Session 3A: Ultrafast Laser Processing (2) --- Conference Hall (7th Floor)
Chair: Masuhara Hiroshi, Osaka University (Japan)
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17:20

Micromachining and laser processing with ultrashort laser pulses (Invited Paper), Mazur Eric, Harvard
University (USA)[A103]• Precision drilling of metals and ceramics with short and ultrashort pulsed solid-state lasers, ChristianFöhl, Breitling D., Jasper K., Radtke J., Dausinger F., University of Stuttgart (Germany)[A087]• Morphological characterization of various kinds of materials in femtosecond-laser micromachining,
Kawahara Kousuke, Kurogi Yasunobu, Matsuo Naoyuki, Yokotani Atsushi, Kurosawa Kou, University ofMiyazaki; Sawada Hiroshi, NEC Machinery Corporation (Japan)[A062]• Ultra-short pulsed laser recrystallization of crystalline silicon, Cho Taeyouli, Hwang David J.,
Grigoropoulos Costas P., University of California (USA)[A079]
Coffee Break (5:00pm-5:20pm)
Rump Session: (5:20pm – 7:20pm) ---Conference Hall (7th Floor)
Chair: Dunsky Corey, Electro Scientific Industries (USA)
Hoving Willem, Philips Electronics Nederland B.V. (Netherlands)
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Present status and future prospects of laser precision microfabrication in Japan, Washio Kunihiko,
NEC (Japan)
Present status and future prospects of laser precision microfabrication about former USSR states,
Veiko Vadim P., SPIFMO (Russia)
Overview presentation of Europe’s micromachining activities seems to be appropriate, Ostendorf
Andreas, Laser Zentrum Hannover e.V. (Germany)
Present status and future prospects of laser precision microfabrication on government supported
programs, Helvajian Henry, Aerospace Corp. (USA)
Industrial LD application for materials processing – present status and future prospect, BachmannFriedrich, Rofin-Sinal Laser (Germany)
LPM technology to be developed in future, Miyamoto Isamu, Osaka University (Japan)

LPM2001 Oral Program

Wednesday, May 16 (B)
10:00
10:10

Opening Remarks (10:00am-10:10am) --- Conference Hall (7th Floor)
Miyamoto Isamu
Session 1A: Overview --- Conference Hall (7th Floor)
Chair: Sugioka Koji, RIKEN (Institute of physical and Chemical research) (Japan)• Laser microprocessing in data storage industry (Invited Paper), Chong Tow Chong, DSI (Singapore)[A101]• Femtosecond pulses for medicine and production technology - Overview of a German national project(Invited Paper), Dausinger Friedrich, University of Stuttgart (Germany)[A086]• Review on recent progress of laser precision microfabrication in China (Invited Paper), Cheng Zhao Gu,
Xu Guoliang, Zhao Quanzhong, Chinese Academy of Sciences (China)[A068]• History and future prospect of excimer lasers (Invited Paper), Basting Dirk, Lambda Physik (Germany)[A110]
Lunch (12:00pm-1:40pm)

13:40

Session 2B: Systems and Optics (1) --- Training Room (6th Floor)
Chair: Gower Malcom C., Exitec (UK)• Novel ultrafast fiber laser systems and their applications (Invited paper), Endert Heinrich, IMRA (USA)[A108]• Femtosecond pulsed laser sub-micromachining system, Ngoi K.A., Venkatakrishnan K., Tan B.,
Nanyang Technological University (Singapore)[A032]• High-reliable high-power 266-nm all-solid-state UV laser, Kojima Tetsuo, Konnno Sususmu, Fujikawa
Shuichi, Seguchi Masaaki, Takenaka Yushi, Yasui Koji, Mitsubishi Electric Corporation (Japan)[A092]• Recent developments in precision micromachining using pulsed UV DPSS lasers, Chang Andrew,
Somerville Paul, Hannon Terry, Coherent Photonics Group (USA)[A097]
Coffee Break (3:10pm-3:30pm)

15:30

17:20

Session 3B: Systems and Optics (2) --- Training Room (6th Floor)
Chair: Jitsuno Takahisa, ILE Osaka University (Japan)• 12 Watts of UV at 355nm, Dafydd Thomas, Spectra Physics Inc. (USA)[A143]• 300 W XeCl excimer laser for large area TFT laser annealing, Fechner Burkhard, Lambda Physik Japan
Co., Ltd. (Japan), Fiebig Michael, Lambda Physik AG, Oesterlin Peter, MicroLas Lasersystem
GmbH(Germany), Kobayashi Naoyuki,The Japan Steel Works (Japan)[A051]• In-situ measurements of VUV optical material under F2 laser irradiation, Sumitani Akira, Itakura
Yasuo, Yoshida Fumika, Kawasa Youichi, Komatsu Ltd.; Wakabayashi Osamu, Mizoguchi Hakaru,
Gigaphoton Inc. (Japan)[A095]• What engineers should know about lasers, Witt Manfred, Zugo Technology Pte Ltd. (Singapore)[A019]
Coffee Break (4:50pm-5:20pm)
Rump Session: (5:20pm – 7:20pm) ---Conference Hall (7th Floor)
Chair: Dunsky Corey, Electro Scientific Industries (USA)
Hoving Willem, Philips Electronics Nederland B.V. (Netherlands)• Present status and future prospects of laser precision microfabrication in Japan, Washio Kunihiko,
NEC (Japan)• Present status and future prospects of laser precision microfabrication about former USSR states,
Veiko Vadim P., SPIFMO (Russia)• Overview presentation of Europe’s micromachining activities seems to be appropriate, Ostendorf
Andreas, Laser Zentrum Hannover e.V. (Germany)• Present status and future prospects of laser precision microfabrication on government supported
programs, Helvajian Henry, Aerospace Corp. (USA)• Industrial LD application for materials processing – present status and future prospect, BachmannFriedrich, Rofin-Sinal Laser (Germany)• LPM technology to be developed in future, Miyamoto Isamu, Osaka University (Japan)

LPM2001 Oral Program

Thursday, May 17 (A)

9:00

Session 4A: Optics Fabrication --- Conference Hall (7th Floor)
Chair: Gillner Arnold, Fraunhofer-Institut für Lasertechnik (Germany)• Laser shaping of diamond for IR diffractive optical elements (Invited Paper), Konov Vitali, Kokonenko
Vitali, Pimenov Sergei, Prokhorov Alexander, General Physics Institute, Moscow, Pavelyev Vladimir,
Soifer Victor, Institute of Image Processing Systems, Samara (Russia)[A071]• Laser ablative shaping of microoptics for laser diode and optical fiber, Jitsuno Takahisa, Institute ofLaser Engineering, Osaka University; Tokumura K., Nalux Co. Ltd.; Tamamura H., Sony/Tektronix Co.
(Japan)[A070]• Laser ablation based technique for flexible fabrication of microlenses in polymer materials, Naessens
Kris, Van Daele Peter, Baets Roel, Universiteit Gent / IMEC (Belgium)[A067]• Holographic optical element for laser soldering Nakahara Sumio, Kansai University (Japan)[A100]

Coffee Break (10:30am-10:50am)
10:50

Session 5A: Microfabrication and Microstructuring --- Conference Hall (7th Floor)
Chair: Helvajian Henry, The Aerospace Corporation (USA)• Laser micro-fabrications: from present to future applications (Invited Paper), Lim Gnian Cher, Gintic(Singapore)[A088]• Generation of periodic microstructures with femtosecond laser pulses, Tönshoff H.K., Ostendorf A.,
Egbert A., Korte F., Bauer T., Laser Zentrum Hannover e.V. (Germany)[A122]• Progressive growth of tungsten microcones using nanosecond pulsed-Nd:YAG laser irradiation invarious atmospheres, Kawakami Yujii, Ozawa Eiichi, Vacuum Metallurgical Co., Ltd. (Japan)[A029]• Effects of inter-pulse and intra-pulse shaping during laser percussion drilling, Low David, Li L.,
University of Manchester Institute of Science and Technology (UMIST) (UK)[A034]
Lunch (12:20pm-1:30pm)

13:30
14:30

1:30pm-2:30pm: Poster Presentation
Session 6A: Advanced Microfabrication Technology --- Conference Hall (7th Floor)
Chair: Holmes Andrew, University of London (UK)
• Laser processes for manufacturing micro devices in chemistry and biotechnology (Invited Paper),Gillner Arnold, Fraunhofer-Institute fűer lasertechnik (Germany)[A109]• Laser ablation patterning of dielectric layer stacks for 193nm mask fabrication, Ihlemann Jurgen,
Rubahn Katharina, Laser-Laboratorium Gottingen; Thielsch Roland, Fraunhofer Institute (Germany) [A061]• Precision machining of innovative materials using 157 nm excimer laser radiation, Ostendorf Andreas,
Laserzentrum Hannover; Stamm Uwe, Lambda Physik AG (Germany)[A096]• Characterization of fused silica ablation by F2-KrF excimer laser multiwavelength excitation process,Obata Kotaro, Sugioka Koji, Akane Toshimitsu, Midorikawa Katsumi, RIKEN (The institute of physical andchemical research), Aoki Naoko, Toyoda Koichi, Science University of Tokyo (Japan)[A084]• Laser writing of nano-structure on silicon (100) surfaces with particle enhanced optical irradiation,
Lu Y.F., Zhang L., Song W.D., Zheng Y.W., Luk’yanchuk B.S, National University of Singapore, Data
Storage Institute (Singapore)[A005]• GaN micro machining by short wavelength pulsed laser irradiation, Akane Toshimitsu, Sugioka Koji,
Midorikawa Katsumi, RIKEN (The Institute of Physical and Chemical Research), Obata Kotaro, Aoki
Naoko, Toyoda Koichi, Science University of Tokyo (Japan)[A089]
Transport to Cruise (4:40pm-5:00pm)

17:00
Cruise Excursion (5:00pm-8:00pm)

LPM2001 Oral Program

Thursday, May 17 (B)
9:00

Session 4B: Fundamental Aspects (1) --- Training Room (6th Floor)
Chairs: Liu DaMing, Data Storage Institute (Singapore)• Particle on the surface: Basic physical problems related to laser cleaning (Invited Paper), Luk`yanchuk
B.S., Zheng Y.W., Lu Y.F., DSI (Singapore)[A033]•
Microstructures formed on silicon wafer by CO2 Laser irradiation, Wang Weijie, Lu Yong Feng, An
Chenwu, Hong Minghui, DSI (Singapore)[A040]• Dynamical observation of laser-induced damages made in inside of transparent materials, Ito Yoshiro,
Kiyoku Satoshi, Ogura Tsutomu, Department of Mechanical Engineering, Nagaoka University ofTechnology; Mohri Naotake, Department of Precision Engineering, The University of Tokyo (Japan) [A081]• Observation of temporary degeneration of material transmittance under strong laser irradiation, An
C.W, Ler K.L, Yuan Y, Goh Y.W, Hong M.H and Lu Y.F, DSI (Singapore)[A043]
Coffee Break (10:30am-10:50am)

10:50

Session 5B: Fundamental Aspects(2) --- Training Room (6th Floor)
Chairs: Veiko Vadim P., St. Petersburg Institute of fine Mechanics and Optics (Russia)• Fundamentals of particle adhesion and removal from surfaces (Invited Paper), Rajiv K. Singh,
University of Florida (USA)[A128]• Scattering of evaporated particles in ultrashort-pulse laser ablation, Ohmura Etsuji, Osaka University(Japan)[A111]• The fundamental aspect of microscale laser bending, Xu XianFan, School of Mechanical Eng., Purdue
University (USA)[A085]• Laser induced rear ablation of metal thin films, Sano Tomokazu, Nakayama Takayuki, Yamada
Hirokazu, Miyamoto Isamu, Osaka University (Japan)[A118]
Lunch (12:20pm-1:30pm)

13:30
14:30

1:30pm-2:30 pm: Poster Presentation
Session 6B: Pulsed Laser Deposition --- Training Room (6th Floor)
Chair: Okada Tatsuo, Kyushu University (Japan)• Pulsed-laser deposition of carbon and nitride materials (Invited Paper), Ren Zhong Min, Lu Y.F., Huang
S.M., He Z.F., Hong M.H., Chong T.C., Data Storage Institute, National University of Singapore(Singapore)[A012]• Pulsed laser deposition of ceramics and diamond like carbon on PMMA for tribological application,
Schlaghecken G., Perera Y., Kreutz E.W., Poprawe R., Lehrstuhl für Lasertechnik (Germany)[A064]• Pulsed laser deposition of VN films on Si; T-the optical stregnth of films in UV region, Nanai L., Nagy
T., Univ. of Szeged (Hungary); Fernandez G., Luches A., Univ. of Lecce (Italy)[A120]•
Growth of (110) and (001)-oriented PZT thin films on amorphous SiO2 by pulsed laser deposition,
Zhao Jing, Lu Li, Thompson C.V, National University of Singapore; Lu Y.F, Song W.D, Data Storage
Institute (Singapore)[A021]••

Pulsed laser deposition of nanocrystalline ZnSe:N thin film, Xu Ning, Fudan University (China) [A028]
Fabrication of Ce:YIG film with different composition by pulsed-laser deposition, Nakata Yoshiki,
Tashiro Yuko, Okada Tatsuo, Maeda Mitsuo, Higuchi Sadao, Ueda Kiyotaka, Kyushu University (Japan)[A065]

Transport to Cruise (4:40pm-5:00pm)
17:00

Cruise Excursion (5:00pm-8:00pm)

LPM2001 Oral Program

Friday, May 18 (A)
9:00

Session 7A: Microsystems and Microelements --- Conference Hall (7th Floor)
Chair: Konov Vitali I, General Physics Institute, Moscow (Russia)• Laser processes for MEMS manufacture (Invited paper), Holmes Andrew, Imperial College, University of
London (UK)
[A104]• Laser beam adjustment of thin metal plates, Frank Meyer-Pittroff, University of Erlangen-Nuremberg(Germany)[A013]• Laser micromachining of micropumps, Mai Tuan Anh, Gintic Institute of Manufacturing Technology(Singapore)[A058]• Laser volumetric patterning for embedded interface processing in a photostructurable Glass/Ceramicmaterial, Hansen W., Fuqua P., Helvajian H., The Aerospace Corporation (USA)[A123]
Coffee Break (10:30am-10:50am)

10:50

Session 8A: Industrial Applications (1) --- Conference Hall (7th Floor)
Chair: Sepold Gerd, University of Blemen (Germany)• Ultra line-narrowed F2 laser for microlithography (Invited Paper), Ariga Tatsuya, Watanabe Hidenori,
Kumazaki Takahito, Kitatochi Naoki, Sasano Kotaro, Ueno Yoshifumi, Nishisaka Toshihiro, Nohdomi
Ryoichi, Hotta Kazuaki, Mizoguchi Hakaru, Nakao Kiyoharu, Association of Super-Advanced Electronics
Technologies (ASET) (Japan)[A117]• High-resolution 157nm imaging for lithography and micromachining applications, Gower Malcolm,
Cashmore Julian, Whitfield Mike, Grünewald Philipp, Exitech Ltd. (UK)[A074]• Developments in laser welding of plastics using high power diode lasers, Hoult Tony, Apter Merrill,
Chang Andrew, Coherent Photonics Group (USA)[A098]• Polymer welding with lasers: chances and hurdles, Bachmann Friedrich, Rofin-Sinar Laser GmbH
(Germany)[A057]
Lunch (12:20pm-1:20pm)

13:20
14:20

1:20pm-2:20pm: Poster Presentation
Session 9A: Industrial Applications (2) --- Conference Hall (7th Floor)
Chair: Washio Kunihiko, NEC Corporation (Japan)• High-speed microvia formation with UV YAG lasers (Invited Paper), Dunsky Corey, Matsumoto Hisashi,
Simenson Glenn, Electro Scientific Industries (USA)[A072]• High accuracy laser mask repair technology using ps UV solid state laser (Invited Paper), Morishige
Yukio, NEC (Japan)[A106]• The study of BGA singulation with a pulsed Nd:YAG laser, Kwangyeol Baek, Kyoungcheol Lee, Cheon
Lee, Inha university (Korea)[A036]• A study of glass cutting by laser, Kang, Hyoung-Shik, Hong, Soon-Kug, Oh, Seok-Chang, Choi, JongYoon, Song, Min-Gyu, LG Production Engineering Research Center (Korea)[A030]
Coffee Break (4:00pm-4:20pm)

16:20

18:00

Session 10A: Industrial Applications (3) --- Conference Hall (7th Floor)
Chair: Dausinger Friedrich, University of Stuttgart (Germany)• Excimer laser crystallized poly-Si TFTs on plastic substrates (Invited Paper), Gosain Dharam Pal,
Frontier Science Laboratories, Yokohama Research Centre, Sony Corporation (Japan)[A073]• Precise laser-assisted 3D- microstructuring on metals and alloys (Invited Paper), G. Sepold, Univ.
Blemen (Germany)[A124]• Comparison of micro drilling strategies for ceramics using frequency convertible Nd:YAG and
Excimer lasers, Tönshoff H.K., Ostendorf A., Körber K., Meyer K., Laser Zentrum Hannover e.V.
(Germany)[A076]• Laser adjustment, a novel technique to obtain fast, sub-micron accuracy in mass production, Willem
Hoving, Philips Electronics Nederland B.V. (Netherlands)[A121]
th
Closing Remarks (6:00pm-6:10pm) --- Conference Hall (7 Floor)
Lu YongFengLPM2001 Oral Program

Friday, May 18 (B)
9:00

10:40

Session 7B: Laser Cleaning Workshop --- Training Room (6th Floor)
Chair: Fotakis C., FORTH-IESL (Greece)・ Physical principles of Steam Laser Cleaning (Invited Paper), Paul Leiderer, Konstanz University(Germany)[A142]
This talk of Prof. P. Leiderer will replace the talk of Prof. A.C. Tam who had left us early this year.
・ The emergence of laser cleaning for hi-tech industrial applications (Invited Paper), Tam A.C., IBM
Almaden research center (USA)[A125]・ Laser induced surface cleaning from diamond particles (Invited Paper), Konov V.I., RAS; Kononenko
V.V., Lomonosov A.M., Mihalevich V.G., Pimenov S.M., Zhuk K.A., General Physics Institute Moscow(Russia)[A138]
・ Wavelength dependence of laser cleaning for field emitter arrays (Invited Paper), Takai Mikio, Suzuki
Naoki, Yavas Oguz, (Japan)[A126]
Coffee Break (10:30am-10:40am)
Session 8B: Laser Cleaning Workshop --- Training Room (6th Floor)
Chairs: Takai M., (Japan)
Lu YongFeng, Data Storage Institute, National University of Singapore (Singapore)・ Laser technology of artworks and antiquities: Fundamental aspects and prospects (Invited Paper),Fotakis C., Georgiou S., Zafiropulos V., Heraklion, FORTH-IESL (Greece)[A107]・ Laser cleaning of silicon wafers – mechanisms and efficiencies (Invited Paper), Mosbacher M., Münzer
H.-J., Dobler V., Bertsch M., Dubbers O., Mühlberger T., Schrems G., Boneberg J., Bäuerle D., Solis J.,
Oltra R., Leiderer P., Runge B.U., (Germany); (Austria); (Spain); (France)[A127]
・ Dry laser cleaning threshold fluence – How can it be measured accurately? (Invited Paper), Fernandes
Alanna, Kane Deborah, Physics Department, Macquarie University (Australia)[A069]
・ Liquid-assisted laser cleaning with pulsed ultraviolet, visible and near-IR radiation (Invited Paper),
Grigoropoulos Costas P., University of California (USA)[A129]
Lunch (12:40pm-1:20pm)

13:20
14:20

15:20

16:30

1:20pm-2:20pm: Poster Presentation
Session 9B: Laser Cleaning Workshop --- Training Room (6th Floor)
Chair: Arnold Nikita, Johannes Kepler Uni. Linz (Austria)
・ Nonlinear surface waves, application to laser cleaning (Invited Paper), Mikhalevich Vladislav G.,(Russia)[A130]
・ Peculiarities of steam laser cleaning (Invited Paper), Veiko Vadim P., SPIFMO (Russia)[A131]
Session 10B: Laser Cleaning Workshop --- Training Room (6th Floor)
Chair: C. P. Grigoropoulos, University of California (USA)・ A perspective on dry laser cleaning for semiconductor manufacturing (Invited Paper), Vereecke G, Röhr
E, VanHoneymissen J.A.B, Heyns M.M, IMEC (Belgium)[A133]・ A study on parameter optimization, discoloration of pigments and yellowing effect in laser cleaning
applications (Invited Paper), Zafiropulos V., Manousaki A., (Greece); Luk`yanchuk B., DSI (Singapore)[A132]
Coffee Break (4:20pm-4:30pm)
Session 11B: Modification --- Training Room (6th Floor)
Chair: Hong MingHui, Data Storage Institute (Singapore)• High resolution laser flash photography for probing the solidification of the new double laser
recrystalization process, Minghong Lee, Seungjae Moon, and Costas P. Grigoropoulos, University ofCalifornia, (USA); Hatano Mutsuko, Hitachi Laboratory, Hitachi Ltd., (Japan)[A004]• Synthesis of pure C40 TiSi2 for Si wafer fabrication, Chen S.Y., Shen Zexiang, NUS; See A.K., Chan
L.H., Chartered Semiconductor Manufacturing Ltd., (Singapore)[A080]• Application of photosensitive GeO2-B2O3-SiO2 thin films to optical waveguide, Nishiyama Hiroaki,
Miyamoto Isamu, Osaka University; Nishii Junji, Kintaka Kenji, Osaka National Research Institute(Japan)[A090]• Domain change of liquid crystals caused by infrared laser irradiation using free electron laser system,
Shimizu Yo, Mononobe Hirosato, Osaka National Research Institute, AIST-MITI; Heya Manabu, Awazu
Kunio, Institute of Free Electron Laser, Graduate School of Engineering, Osaka University (Japan) [A052]

Break (5:50pm-6:00pm)
18:00

Closing Remarks (6:00pm-6:10pm) --- Conference Hall (7th Floor)
Lu YongFeng