PLASMA COMPONENTS

PLASMA COMPONENTS
X-SERIES END BLOCKS I Y-SERIES END BLOCKS I MAGNET BARSPLANAR MAGNETRON BODIES I MAGNETRON LIDS I LIONVA PROCOS 2 I VA PROCESSMASTER I VA TRIM & SHIM TOOLPROVEN COMPONENTS.
EXCELLENT RESULTS.
FOR YOU.

OUTNOW!

Our components are now free
to explore new horizons.

WITH YOU.

Simulation-Driven Product Development
Vacuum System Dynamics
for Complex Deposition Machines
Matlab/SIMSCAPE
The conceptual design of complex and dynamic vacuum systems isextremely demanding. VON ARDENNE has accepted this challenge
and has developed a MATLAB/Simscape library to model and simulate
vacuum dynamics either for single compartments or overall simulations
for complex vacuum deposition machines.VON ARDENNE has more than
40 years of experience in vacuum deposition and outstanding expertisein multiscale simulation to feature highly optimized system performanceand to ensure best process quality originated from component design.
We accelerate product development and upgrades by reducing theengineering effort with cutting-edge modelling and simulation for productplanning for your individual process solution and feasibility studies for
upgrading running systems.

Low-Pressure Gas Flow for Best Gas Distributions

Plasma Process and Magnetic Field
for Excellent Film Growth

DSMC – Direct Simulation Monte Carlo
The simulation of low-pressure gas distributions in process cambers requires special numerical methods and a highly computational effort. The
DSMC method is applied already in the construction and design phase at

What are you looking for in a supplier of components and processsolutions? Experience? Reliability? A proven track record?
VON ARDENNE equipment is used in over 50 countries. We haveestablished an installed base of hundreds of coating systems worldwide,
ranging from small tools to equipment for large-area coating applications.
Every day, our customers are facing the challenge of staying in a leading
position. Why do they choose VON ARDENNE Process Solutions as theirpartner? Consider our keys to success:Field Experience – Our technical team is comprised of engineers who
have been there, in the field, delivering results. Not only does this mean
we know what it takes to get the job done, in many cases we have done
it before.
Simulation & Modeling – For new applications, we can guide theprocess design with extensive simulation and modeling capabilities.
From mechanical stress, to thermal modeling, to magnetic field modeling,
to charged particle motion, our team can simulate your process before
we begin to ensure the highest chance of success.
Sampling Capability – VON ARDENNE has over 20 machines that aresuitable for sampling. From small cluster tools to large in-line systems,
we can use demonstration runs to further assure you that your process
will deliver the results you need once installed.
In-House Assembly & Quality Control – VON ARDENNE builds all ofour products in our facility in Germany. We conduct the most demanding
quality and functional tests in the industry before shipping our products
to you. We meet or exceed most of our competitor’s specifications fortechnical performance and reliability.

PICMC – Particle in Cell Method

VON ARDENNE in order to achieve the best gas distributions.

Cutting-edge thin-film technology is characterized by film homogeneity,high target utilization, film-optimized process design and other technological requirements. At VON ARDENNE, plasma and magnetic field simulations are used to analyze and improve the decisive physical process
responsible for the film growth.

Optical Simulation
for Outstanding Film Properties

Finite Element Simulations
for Best Coating Results

Ray Tracing and Thin-Film Properties

Mechanical, Thermal, CFD, Multi-Physics

Optical simulations are widely used to achieve the most efficient designfor VON ARDENNE equipment with flash-lamp based annealing andpatterning technology. Furthermore, the parameters of thin films are
optimized using simulation methods so that the overall optical properties
meet the requirements.

FE simulations for the analysis and optimization of different physicalprocesses in combination with many years of experience are essential
prerequisites for VON ARDENNE coating systems to meet the high quality
requirements of our customers.

Process Knowhow – By combining our hardware and process control
solutions, we can deliver the highest performing processes to the mostdemanding specifications. Whether you are looking for the best material
properties, high rates, uniformity, utilization, or all of the above we candeliver a process that meets your requirements.
Technology Knowhow – Beyond the local coating processes,
VON ARDENNE offers state-of-the-art machine control solutions. From
optical inspection to automated process adjustment, we add the final
pieces of technology to make not only your local process run, but tomake your machine perform – to deliver a product as you need it, when
you need it.
Worldwide Competence Centers – A truly global organization,
VON ARDENNE’s subsidiaries can provide integration and startup support,
service, and training. When you need it, help is always close at hand.
VON ARDENNE is more than a component supplier, we are a solution
provider. Let us put our experience to work for you.
Mission – Our mission is to create value by bringing our industry leading
technology and process experience to our customers.
We want to achieve that by offering state-of-the-art hardware solutions
with best-in-class performance specifications and reliability. Furthermore,
we offer advanced process control hardware and software solutions tocontrol processes of single sources or in complex layer stacks settings.
It is our aim to deliver an excellent process result according to yourspecifications and timeline. And we are confident that we can offer you
what you are looking for in a supplier.

X-SERIES END BLOCKS - XC-S

X-SERIES END BLOCKS - XC-L

Components for Rotatable Magnetrons

Components for Rotatable Magnetrons

The XC-S End Block is a compact, internal drop-in end block for low- to
medium-power sputter systems. Typical applications for this type of end
block are architectural glass, photovoltaics, web and display coating andcoatings for automotive applications.

Our XC-S End Block is available for upgrades and retrofits for all
coating systems, regardless of the manufacturer. It also covers a wide
range of specifications.

The new X-Series End Block XC-L is a drop-in end block formid- to high-power applications such as architectural glass, thin-film
photovoltaics, anti-reflective or TCO coatings.

Furthermore, this end block is easy to maintain and always up to date interms of seal systems and current transmission.

The X-Series is available for upgrades and retrofits for all coating systems,
regardless of the manufacturer, and covers a wide range of specifications.

XC-S

XC-L

 TECHNICAL DATA XC-S TECHNICAL DATA XC-L

Subject to change without notice due to technical improvement.

Mounting position
Max. current AC/DC
Max. power
Max. target lengthHelium leak rate
Rotation speedSafe operation weight load The new, state-of-of-the-art design of the XC-L enables easy
maintenance and is always up to date in terms of seal systems andcurrent transmission.

horizontal and verticalup to 200 A (60 kHz) / 225 A
up to 100 kW (DC/60 kHz AC)
2500 mm< 1x10 -6 mbar*I/s
3 min-1 to 60 min-1≤ 370 kg horizontal mounting
vertical mounting on request

Subject to change without notice due to technical improvement.

The dimensions and interfaces of the XC-S End Blockare compatible with all common process lids in the field
and are therefore suited as components for
new coating machines and for retrofits.

Mounting position
Max. current AC/DC
Max. power
Max. target length
Rotation speedSafe operation weight load horizontal and vertical
Up to 450 A (DC/80kHz AC)
Up to 200 kW (DC/80 kHz AC)
4000 mm
3 min-1 to 60 min-1≤ 500 kg horizontal mounting
vertical mounting on request

The dimensions and interfaces of the XC-L End Blockare compatible to all common magnetrons in the field
and are therefore suited for retrofits.

X-SERIES END BLOCKS: XC-S & XC-L
Components for Rotatable Magnetrons

Efficient Wear & Spare Part Concept

Condition-Based MaintenanceDue to the modular setup, easy accessibility and robust design, only asmall number of wear and spare parts must be handled:

Regular service (< 15min / end block)ĵ Basic maintenance in less than 15 minutes, advanced maintenancein less than than 30 minutes

ĵ Water and vacuum sealing cartridges for regular service

ĵ 1 year+ interval (depending on process set up and rotation speed)ĵ Carbon brushes and sealings for advanced service

Advanced service (< 30min / end blockĵ No dismounting requiredĵ Carbon brush exchange can be done individuallyĵ includes water and vacuum rotary sealingĵ Flexible target holder

ĵ Low chance of human error for seal systems
ĵ Compensates unbalanced target

ĵ For regular and advanced service, the end block remains installed, noneed for additional end block maintenance areas near production tools

ĵ Additionally brushes and/or sealing counter surface can be replaced
if neededĵ Reduce forces on bearingĵ Always up to date with best seal systems

ĵ Bearings and further critical parts designed as permanent or “neverneeds maintenance”

ĵ 5 years+ , interval depending on the target weightĵ Interchangeable seal systemĵ Multiple shielding options

ĵ Perfect fit for each process setup

ĵ Seal counter surface and sealing designed as plug and play: interchangeable parts to keep seal systems always up to date

Quality Controlĵ Encapsuled areas and double redundant seal systems

ĵ Separation of functions to ensure durability

ĵ Smart readyĵ Prepared to achieve maximum control

Proven Tool Kit

ĵ Immediate vacuum checkĵ Direct check of vacuum seal to support process fault isolation

A small but comprehensive tool kit is available for fast and convenientservice actions:

VON ARDENNE ensures the highest level of quality standards for all end
blocks. Three special test stations are used for long-time tests and quality
control while manufacturing in terms of vacuum integrity. Additional test
stations guarantee safe operation for high-power applications and hightemperature conditions.

ĵ Contains every tool (incl. standard tools e.g. screwdriver) for a standardized service -> no need for an additional basic tool kit

Test stations: static vacuum and water integrity, rotating vacuum andwater integrity, complete functional tests at process power and target load

 FEATURES

 BENEFITSĵ Compact single-sided design

ĵ Less installation space and fewer seals necessary

ĵ Cartridge design for all wear parts

 MECHANICAL INTERFACE XC-S

ĵ includes water and vacuum rotary sealingĵ Each tool kit is tested while assembling end blocks for the customer.

401ĵ One toolkit equips one technician for one end block.

117

ĵ Condition based maintenanceĵ Advanced service (< 30 min / end block)
145

Ø164

147 (min)Ø 164 (std)Ø 184 with shield)

165 std(130 min)22 (std)(32 with shield)

210 (min)210 (std)
130 (min)392 (std)

24 (std)141

ĵ Regular service (< 15 min / end block)Ø 164(Ø 184
with shield)

Ø 116
(std)

 MECHANICAL INTERFACE XC-L

End Block XC-S & XC-L - Wear parts

End block rotation test station
up to 6 end blocks simultanously

458

Modular Setup XC-S & XC-L

22

ĵ Exchange of single parts for easy adaption of other components (e.g. inline adjustable magnet bars,...)

Ø164

165 std(130 min)Ø 164 (std)Ø 184 with shield)

210 (min)215 (std)
205 (min)ĵ All spare parts available separately

210 (std) *)376 (std)108

89 (std)*) depending on thermal shielding

236

Ø 164
(Ø 184
with shield)

Ø 116
(std)

X-SERIES END BLOCK XC-S

X-SERIES END BLOCK XC-L

Y-SERIES END BLOCKS: YC-L
Components for Rotatable Magnetrons

The YC-L is available for upgrades and retrofits for all coating systems,
regardless of the manufacturer, and covers a wide range of specifications.

The Y-SERIES END BLOCK YC-L are used for applications where
externally mounted end blocks are required. The basic concept is a single
sided design where all media connections and drive assemblies are
installed in one end block.
They are suited for roll-to-roll coating systems and carrier-based coating
systems. Horizontal and vertical glass coating systems can be also beequipped with them.

 FEATURES

 BENEFITSĵ Compact single sided design

ĵ Less installation space, less seals necessary

ĵ Cartridge design for all wear parts

ĵ Basic maintenance in less than 15min, advanced maintenance inless than 30min
ĵ No dismounting requiredĵ Low chance of human error for seal system replacement

ĵ Flexible target support

ĵ Compensates unbalanced targetĵ Reduce forces on bearingĵ Interchangeable and redundant seal systems

ĵ Always up to date with best seal systems
ĵ Separation of functions to ensure durability

Condition-Based Maintenance

Modular Setup

Regular service (< 15min / end block)ĵ Includes water and vacuum rotary sealingĵ All spare parts available separately

ĵ 1 year+ interval (depending on process set up)

ĵ Exchange of single parts for easy adaption of other components(e.g. inline adjustable magnet bars,..)advanced service (< 30min / end block)ĵ Includes water and vacuum rotary sealingĵ Additionally brushes and/or sealing counter surface can be replaced
if neededĵ 5 years+ , interval depending on the target weight

Efficient Wear & Part Concept
Due to the modular setup, easy accessibility and robust design, only asmall number of wear and spare parts must be handled:ĵ Water and vacuum sealing cartridges for regular service
ĵ Brushes and sealings for advanced service
ĵ Carbon brush exchange can be done individuallyĵ For regular and advanced service, the end block remains installed, noneed for additional end block maintenance areas near production toolsĵ Bearings and further critical parts designed as permanent or “neverneeds maintenance”
ĵ Seal counter surface and sealing designed as plug and play: interchangeable parts to keep seal systems always up to date

Quality Control

 MECHANICAL INTERFACEVON ARDENNE ensures highest level of quality standards for all end
blocks. A special test station with four vacuum chambers is used for longtime tests and quality control while manufacturing in terms of vacuum
integrity. Additional test stations guarantee safe operation for high power
applications and high temperature conditions.

 TECHNICAL DATA

182
typically 282

Subject to change without notice due to technical improvement.

214
typically 404

58
145

Mounting position
Max. current AC/DC
Max. power
Max. target length
Rotation speedSafe operation weight load 130 (min)163

212 (min)

Ø164

182

118

horizontal and vertical
350 A (DC/80kHz AC)
160 kW (DC/80 kHz AC)
4000 mm
3 min-1 to 60 min-1≤ 500 kg horizontal mounting
vertical mounting on request

The Y-Series end blocks are suited for retrofits on all common coating systems in
the field using side-mounted end blocks as their dimensions and interfaces arecompatible.

Test station
up to six end block pairs can be tested simultanaously

MAGNET BARS
Components for Rotatable Magnetrons

Best Quality Control on the Market
ĵ In-house quality control of magnets - only magnets meeting very
demanding specifications are used for assembly of magnetic systems
ĵ Our magnetic systems are assembled by skilled workers.

ĵ High sensitivity magnetic measurement during assembly [11 sensor
simultaneous measurement for fast and complete 2D magnetic fieldscan]ĵ Re-assembly of magnetic systems if needed, until uniformity spec isfulfilled

2D magnetic field measurement for magnet bars with
11 sensors to ensure excellent magnetic field uniformity

Automated inhouse QC of magnets

TiO2
Tickness Deviation from Average

4%
2%
0%
-2%
-4%
-300

200

700

1200

1700

95 nm TiO2 layer without gas trimming; thickness deviation ± 0.9%

VON ARDENNE magnet bars are state of the art in technology. We haveinstalled more than 2000 magnet bars in all fields of coating application.

2200

2700

3200

95 nm TiO2 layer with gas trimming;
thickness deviation ± 0.35%

Application example RVA 30: resulting layer uniformities
large-area coating

3D magnetic field simulation of magnet bar RVA 50

In the development of our magnet bars, we focus on target erosion, layer
uniformity, process stability and application-depending field strengths.
They are available in a wide range of strengths and lengths and areinspected in our in-house facilities for quality control.

 TECHNICAL DATA
Subject to change without notice due to technical improvement.

RVA 30

RVA 50

RVA 70

RVA 100

Max. magnetic-field flux density
at target surface (Ø 152 mm) typ./max.

27 / 29 mT
270 / 290 Gauss

52 / 55 mT
520 / 550 Gauss

68 / 72 mT
680 / 720 Gauss

112 / 118 mT1120 / 1180 Gauss

Target utilization> 80 % withdog bone targets> 85 % withstraight targets> 85 % withstraight targets> 85 % withstraight targets

Application

Architectural glass,web coating/display, AR

Architectural glass,photovoltaics,
web coating/display, AR,
special applications

Architectural glass,photovoltaics,
web coating/display, AR,
special applications

ITO,
photovoltaics,
web coating/display,special applications

LengthUp to 4000 mm

Up to 4000 mm

Up to 4000 mm

Up to 4000 mm

Typical target materials

Sn, Zn, ZnSn, Si, TxO,…

Sn, Zn, ZnSn, Si, TxO,
Cu, Al, Ag, In,..

CuGa, AZO,
Si, metals,…

ITOĵ Maximum process power (only limited by target material or bonding)

Magnetic field uniformity≤ ± 1.25 %≤ ± 1.25 %≤ ± 1.25 %≤ ± 1.25 %ĵ Optimum solutions and support of process requirements

Resulting layer uniformity, down to≤ ± 0.5 %≤ ± 0.5 %≤ ± 0.5 %≤ ± 0.5 % FEATURES

 BENEFITSĵ Optimum layer uniformity

ĵ Excellent magnetic field uniformity

ĵ High target utilization

ĵ Optimized race track return design and different end caps

ĵ Uniform layer properties over the full substrate widthĵ Variation of sputter angle between ± 15° and ± 60°

ĵ Optimal setting for your technology regardingĵ Available with inverted magnet arrangement

ĵ

uniformity

ĵ Optimized cooling conceptĵ

sputter rateĵ Technological experienceĵprocess voltage

ĵ Use with any end blocks

ĵenergy impact on substrate

ĵ Reduced process voltage

PLANAR MAGNETRON BODIES
Components for Planar Magnetrons

We offer state-of-the-art planar magnetrons for high-end technology
applications. Our components are developed and manufactured 100
percent by VON ARDENNE.
Their performance has been industry-proven in depositing blocker andabsorber layers for high-end triple Low-E coatings on glass coating
systems but also in PV coating systems, in roll-to-roll web coaters andcoating systems for display and other special applications.

We have sold more than 350 planar magnetrons for a wide range ofdifferent applications. They are available for retrofits and as adaption
for new coating lines. Furthermore, we can provide them as complete
process lids with and without direct pumping.
Hot target clamping is available (e.g. for ITO) for process evaluations for
NiCr, Cr, Ag and others.

Best Quality Control on the Market
ĵ In-house quality control of magnets - only magnets meeting our demanding specifications are used for assembly of magnetic systems
ĵ Our magnetic systems are assembled by skilled workers.

ĵ High sensitivity magnetic measurement during assembly [3 sensor
simultaneous measurement for fast and complete 2D magnetic fieldscan]ĵ Re-assembly of magnetic systems if needed, until uniformity spec isfulfilled

The product family consists of three different types of magnetrons: thewide single magnetron WSM, the High-Utilization Planar Magnetron HUWSM and the Planar XT for planar applications on wide areas and SSM
and HU-SSM for smaller areas.

Automated inhouse QC of magnets

2D magnetic field measurement for planar bodies with 3 sensors toensure excellent magnetic field uniformity

Planar XT
Tickness Deviation from Average

4%
2%
0%
-2%
-4%
-300

200

700

1200

1700

19 nm Ag without gas trimming
tickness deviation ± 0.9 % FEATURES

 BENEFITSSTANDARD WSM & SSM BODY

2200

2700

3200

95 nm nm AG with gas trimming
tickness deviation ± 0.45 %Application ex.
Planar XT: resulting layer uniformities large-area coating

3D magnetic field simulation HU-WSM bodyerosion profileĵ Common planar type in last years

ĵ Stable operation

ĵ Simple target design

ĵ Good layer uniformity

ĵ Target utilization 30 % for WSM(e.g. 4500 kWh for 30 mm Ag)

 TECHNICAL DATAĵ Coating uniformity of < ± 1.0 %HIGH-UTILIZATION PLANAR HU-WSM & HU-SSM BODYĵ Target life time 6000 kWh for 30 mm Ag

ĵ Longer target lifetime

ĵ Target utilization ≈ 35 % to 40 % for HU-WSM

ĵ Higher target utilization

ĵ Coating uniformity of < ± 1.0 %;with targets close to end of lifetime < ± 1.5 %ĵ Stable performance over whole target life time

PLANAR XT BODY

erosion profile

Subject to change without notice due to technical improvement.

WSM & SSM

erosion profile

HU-WSM & HU-SSM

PLANAR XT

Target materials

Ag, NiCr, Cr, Ti,
Ag (limited by cooling
all common DC target materials and target design)

Ag, NiCr, Cr, Ti,
all common DC target materials

Target life [kWh/m] for 30 mm Ag target

1096 kWh/m for WSM> 1550 kWh/m for HU-WSM> 1680 kWh/mĵ Target lifetime potentially > 7000 kWh for Ag

ĵ High-performance in layer uniformity over whole target life timeTarget utilization for 30 mm clamped Ag target

up to 30 % for WSM> 35 % for HU-WSM> 40 %

ĵ Target utilization > 40 %

ĵ Long target life timeĵ Coating uniformity for planar cathodes(down to ≈ ± 0.5 %)ĵ Highest target utilization

Magnetic field strength
at given target thickness

14 mT at 22 mm

15 mT at 30 mm
13 mT at 35 mm

20 mT at 30 mm

ĵ Simple target design

Max. process power> 16 kW/m

8 kW/m> 16 kW/mALL

Proven magnetic field uniformity≤ ± 1.25 %≤ ± 1.25 %≤ ± 1.25 %Resulting layer uniformity, down to≤ ± 0.8 %≤ ± 0.6 %≤ ± 0.5 %ĵ Sealed cooling channel

ĵ Simple and easy to manufacture target designs

ĵ Magnets are not exposed to water, no water seals are broken during target exchange.

LION®

MAGNETRON LIDS

Linear Ion Source

VON ARDENNE components are also available as a package: as drop-in
magnetron lids or side-mounted process units for a wide range of applications. Thanks to many years of experience gained from designing and installing advanced sputtering equipment, we can offer a complete portfolioof solutions from AC to DC processes, planar to rotatable applications andeven magnetrons with integrated turbopumps.

We also offer customized solutions for retrofits on coating systems alreadyin the field. This enables customers to continue their process development
and to acquire state-of-the-art equipment.

Magnet Bar and Magnet Systems
All magnet bars and magnet systems are similar in mechanical design andthereby interchangeable. Furhtermore, our magnet bars and systems arevery flexible in order to fit the specified application.

VON ARDENNE offers complete technology solutions based on our deep
knowledge in engineering advanced sputtering equipment and our handson experience from application development. We provide high-quality
customized components to meet the application requirements of ourcustomers. These components are suitable for the wide scope of DC or AC
processes ranging from 10 to 180 kW with a variety of magnet designs andoffers a fully integrated gas inlet system for your magnetron equipment.

The VON ARDENNE Linear Ion Source LION® is a component that issuitable for pre-treatment and surface modification. It helps removehydrocarbons and works with argon and, if necessary, with additional
oxygen.

The main applications for the LION® are large-area glass coating andmetal strip coating. It is available as a remote mounted version with an
adjustable incidence angle or as a flange mount version.

The ion beam of the LION® is strongly focused and highly energetic.
Therefore, it is an ideal device for inline coating systems that requirephysical etching. Due to its simple and robust design, the ion source iseasily scalable.

A stronger field provides lower process voltage, which makes it preferable
for metallic processes. A weaker field, on the other hand, incrases thecoating uniformity and reduces drop-off at the substrate edges.
VON ARDENNE offers superior uniformities with all available magnetrons.

VON ARDENNE sputtering equipment is available for all coating systems in
the field, be it VON ARDENNE coating systems or third-party equipment, asa proven solution for a wide range of specific applications.

LION® and glass substrate - etch rate SiO2: 5 nm*m/min

LION® 1470 etch power as function of gas type and flow
LION 1470 source characteristics
8
7

2kV Argon

Power [kW]6
5

3kV Argon

4

3kV Qxygen

3

2kV Qxygen

210

 FEATURES

 BENEFITSĵ Field-proven technology know-how in all fields of application

ĵ State-of-the-art design concepts to fit your requirements

ĵ Directly pumped process lid design available

ĵ Saves installation floor space or decouples different processes

ĵ Wide range of planar & rotary cathode design for different applications

ĵ Process set-ups from DC via pulsed DC, AC to bipolar and RFĵ Single or multi segmented gas inlet designs as nozzle or binary channel

ĵ Gas inlet design as good as your process needs

ĵ Multiple anode solutions and magnetron designs for hot process conditions in horizontal, vertical and R2R coating applications

ĵ No limitations in application-dependent setups

ĵ Tool box with different magnetic field designs and end block types

0

50

100
150
Gas flow [sccm]

 FEATURES

 BENEFITSĵ Simple - robust and scalable design

ĵ Campaign time up to four weeks

ĵ Highly energetic and strongly focussed beam

ĵ Excellent etching uniformity

ĵ Pre-treatment of different substrate materials

ĵ Easy customization

200

250

ĵ Optimal combination of proven techniques & technologies for yourprocess TECHNICAL DATA TECHNICAL DATA

Subject to change without notice due to technical improvement.

Subject to change without notice due to technical improvement.

MAGNET SYSTEM FOR PLANAR MAGNETRONSMAGNET BAR FOR ROTATABLE MAGNETRONS

WSM & SSM

HU WSM & HU SSM

Planar XT

RVA30

RVA50

RVA70

RVA100Magnetic field strength atstandard target thickness

14 mT
140 Gauss

13 mT
130 Gauss

20 mT
200 Gauss

30 mT
300 Gauss

50 mT
500 Gauss

70 mT
700 Gauss

100 mT
1000 Gauss

Standard target thickness

22 mm

35 mm

30 mm

specifications for 152 mm OD targets

LION450
Length body (scales in 150 mm steps)
Effective etch widthPower (max./typ.) in focussed Ar-operation
Power (max./typ.) in focussed O2-operation
Operating voltage (max./typ.)
Operating pressure (max/typ.)
Gas typeGas flow Ar (max.)

420 mm
300 mm
1.2 / 0.8 kW
1.8 / 1.2 kW
5 kV / < 3 kV
2E-3 mbar /< 1E-3 mbar
Ar / O2
30 sccm

LION3450
Length body (scales in 150 mm steps)
Effective etch widthPower (max./typ.) in focussed Ar-operation
Power (max./typ.) in focussed O2-operation
Operating voltage (max./typ.)
Operating pressure (max/typ.)
Gas typeGas flow Ar (max.)

3420 mm3300 mm
10 / 6.3 kW
14 / 9.8 kW
5 kV / < 3 kV
2E-3 mbar /< 1E-3 mbar
Ar / O2
240 sccm

VA PROCOS 2
Process Control System for Reactive Sputtering

VA PROCOS 2 is a modular process control system that is speciallydesigned for the stabilization of reactive sputter processes in the criticaltransition mode.

Since 1980, VON ARDENNE has been in a leading position in reactive
sputtering processes. Furthermore, we have provided and optimized our
process control system VA PROCOS for many years.

 APPLICATION EXAMPLE

It is suitable for process characterization by optical emission lines,
cathode voltage, oxygen partial pressure, combinations thereof and/or
further PLC signals. Furthermore, it can be used for the stabilization of
the plasma discharge and thus of the product properties by adjusting the
supply of one or more reactive gases.

Our current VA PROCOS 2 controls the reactive sputtering of compound
layers and reliably stabilizes the working points in the crucial transition
region. The system controls one or more reactive gas inlets (e.g.
oxynitrides).

Higher sputtering rate

New film properties New applications

VA PROCOS 2 BASE UNIT
ĵ Main controller for monitoring or process control application with
4 or 8 general purpose I/O channels;
ĵ Profinet interface, optional Profibus and I/O link for digital MFC

SiO2 deposition rate
[nm*m/min] More productivity

Layer properties ZAOReduced arcing/nodules
 Longer campaign times

transparent

WITHOUT

WITH

30

> 95

or

conductive

transparent & conductive

Target SiO2

VA PROCOS 2 EXTENDER
ĵ Unit to extend BASE with 4 or 8 general purpose I/Os
ĵ Multiple units can be interconnected via profinet

VA PROCOS 2 SOFTWAREĵ Monitor (trending) and process control
ĵ Can be easily configured

 TECHNICAL DATA

Subject to change without notice due to technical improvement.

OPTICAL INTENSITYMEASURING SYSTEM MS601

MF/DC VOLTAGE
MEASURING UNIT SE04

O2-LAMBDA PROBE

OxygenWavelength

Voltage

Wavelength range
185 nm to 900 nm
Vacuum connection
DN 40 ISO KF
Casingtemperature stabilized with water coolingPower supply
24 V DC / 150 mA
Collimators
approx. (1 x 1.7) m2, e.g. (6 x 9) 6“ wafersMax. ambient temperature of fiber optic 
300 °C

Measurement range
2000 V
Peak input voltage
6000 V
Attenuation1:1000
Output voltage
0 V to 10 V
CasingIP67

ZrO2 sensor length 
Vacuum connection 
Analog gain 
Output voltage 
Casing 

250 mm (other lengths on request)
DN 25 ISO KF
10x
0 V to 10 V
IP67

 FEATURES

 BENEFITSĵ PEM control, impedance control, Lambda control, balanace/IMBALĵ Stabilization of process, reduction of loss and longer campaign times

ĵ Higher sputtering rateĵ Optimized layer and stoichiometry uniformity

ĵ Specialized processing for ARC event detection and handlingĵ Stable measurments and control for low intensity plasmaĵ Choice of working pointĵ Increased productivity

ĵ Automatic on-line balancing

ĵ Less energy consumption (less power for same deposition rate)ĵ Thermal stabilized photomultiplier for PEM

ĵ Process adapted and ready to use configuration

ĵ Unified analog I/O port for all sensors and actors

ĵ Flexible configuration of hardwareĵ IP67, robust cases, EMI shieldedĵ Designed for operation in an industrial environment

VA PROCESSMASTER

VA TRIM & SHIM TOOL

Process control in large-area coating is usually a non-automated task.
It requires permanent monitoring of online measurements by humanoperators to detect deviations from a given reference spectrum. Suchdeviations result from different sources. Typically, the operator must
decide which process parameters need to be adjusted. The operator’s
experience is crucial to achieve fast and reproducible results.

The VON ARDENNE Online Trimming and Shimming Module is a webbased application that enables the quick optimization of the thickness
uniformity („% range“) of a single thin layer.
After entering a measured thickness profile and the current trim gas settings, it proposes new trim gas settings that lead to improved uniformity.
In the same manner, the magnet bar adjustment („shimming“) for optimal
settings can be calculated.

The VA PROCESSMASTER is the tool for automated process setting
and control for all layer systems. It follows a novel approach in processcontrol and leads to best results without operator interaction. It also
allows for a fully-automated drift compensation of the sputtering process
and improves product quality. In a further step, this tool enables ourcustomers to create complex recipes for attractive products. The tool also
helps increase the productivity of a coating system, as it enables a fasteradjustment to a new recipe.

Trimming and Shimming
Trimming means the adjustment of gas flows at each individual gas inlet
segment of the magnetron in order to achieve the most uniform layer
thickness at any position of the glass pane.

Procedure
Initially, a sample coating of a single layer is made under the current conditions. The measured color data is imported from the ex-situ measuringsystem into the trimming and shimming software. In the next step, thecurrent trimming gas settings/shimming values are typed in.
First, the application calculates the layer thickness profile based on themeasured spectra. Then, new trimming gas settings/shimming values for
improved thickness uniformity are calculated. This data is entered into thevisualization. Subsequently, a new sample coating is made and the thickness is measured again to confirm the improvement.
This procedure only needs to be repeated if the result is not satisfactory.
Generally, it takes two to three iterations to obtain the best result.

This adjustment can be carried out while the coater is operating using
the VON ARDENNE Ex-Situ Measuring System and visualization together
with the Trimming & Shimming Module. Trimming adjustment is usually
the first choice to improve the thickness uniformity.
COATING 1

INSPECTION

COATING n

INSPECTIONInsituExsituautomated measurement

Shimming is the adjustment of the magnetic system of rotatable magnetrons in order to improve the thickness uniformity locally on the glass
substrate.

AUTOMATED PRODUCTION

Interface

Plant control (PLC)

Interface
optical model

automatedadjustments

automated analysis
Controllers


MAGNETIC FIELDSETTINGSGAS INLETSETTINGS

layer thickness &uniformity

POWER
SETTINGS FEATURES

 BENEFITSDefined and predictableĵ Increased yield & reduced cost of quality & claim management by

ĵ Process correction follows best-practice algorithm, not individual
operator experience

M Improved quality by stabilized sputter process, reduced product variation and out-of-spec losses

Permanent action and 24/7 operation

M Larger product portfolio with more profitable products

ĵ Process deviations minimized instead of waiting for threshold violation
ĵ No „sawtooth“ curves upon startup

M More output by accelerated product recipe changes in order togain production up-time

Full overview

M Stable operating points over long periods

ĵ Simultaneous control of all magnetrons

M Very high homogeneity of individual layers and layer stacks(color)ĵ Simultaneous mean value control of layer thickness and uniformity

ĵ Simplified operation
ĵ Larger product portfolio with more profitable products

 FEATURES

 BENEFITSĵ Tuning of each layer to reach best uniformity
ĵ Startup tuning of homogeneity after target changeĵ Enables applications with strict uniformity requirements, like double or triple Low-E

ĵ Pit-stop correction of long-term deviation of thickness profileĵ Increases product quality
ĵ Reduces time neededOUR STRENGTHS
IN-HOUSE TECHNOLOGY &APPLICATION CENTER

PROFESSIONAL SIMULATION SUPPORTWe offer professional simulation technology to ensure bestprocess quality with regards to plasma, heat and cooling.
Furthermore, our simulation tools help demonstrate, develop
and improve layer properties and define or optimize processes,
details and the performance of our systems.

ĵ Sample coatings of customer applications
ĵ Development of customized layer stacks
ĵ Product & process verification and optimization
ĵ Testing of new technologies and components

GLOBAL PROJECT EXPERIENCECOMPREHENSIVE SERVICE PORTFOLIOVON ARDENNE equipment is used in over 50 countries.

ĵ VON ARDENNE service hubs around the world
ĵ On-site service

We have established an installed base of hundredsof coating systems worldwide, ranging from small tools
to equipment for large-area coating applications forseveral markets.

ĵ Remote access by our technology department
ĵ Regular technical and technological trainings
ĵ Spare & wear part warehouse close to customers
ĵ Lifecycle extension of wear parts

CLOSE PARTNERSHIPUPGRADES & RETROFITSVON ARDENNE has a network of partners foreven more profound R&D work and to identify futuretechnologies. It consists of:

As soon as your business is growing, your VON ARDENNE
equipment will grow accordingly - thanks to its modular design
and the upgrades we provide. We will also supply you with thenecessary technology upgrades if you decide to change yourapplications.

ĵ Fraunhofer Institutes such as IPMS, FEP, IST and ISE
ĵ Institutes of the Helmholtz Association (Jülich, Berlin)
ĵ Universities (Kiel, Dresden, Sheffield)

Furthermore, when your equipment is ageing, we will retrofit
your systems with new components, no matter if they are
VON ARDENNE or third-party machines.

ĵ Companies such as FAP GmbH, scia Systems GmbHPRODUCT
TOPICSPRODUCTINDEXCOMPONENTS
vonardenne.com

WHO WE ARE & WHAT WE DO
VON ARDENNE develops and manufactures industrial equipment for vacuum
coatings on materials such as glass, wafers, metal strip and polymer films. These
coatings give the surfaces new functional properties and can be between one
nanometer and a few micrometers thin, depending on the application.

We supply our customers with technologically sophisticated vacuum
coating systems, extensive expertise and global service. The key
components are developed and manufactured by VON ARDENNE itself.
Systems and components made by VON ARDENNE make a valuable
contribution to protecting the environment. They are vital for
manufacturing products which help to use less energy or to generateenergy from renewable resources.

Our customers use these materials to make high-quality products such asarchitectural glass, displays for smartphones and touchscreens, solar modules andheat protection window film for automotive glass.

SALES
CONTACTSSERVICE
CONTACTSWORLDWIDE SALES AND SERVICEVON ARDENNE GmbH (headquarters) I Am Hahnweg 8 I 01328 DRESDEN I GERMANY
Sales: +49 (0) 351 2637 189 I sales@vonardenne.com
Service: +49 (0) 351 2637 9400 I support@vonardenne.com
VON ARDENNE Vacuum Equipment (Shanghai) Co., Ltd. I+86 21 3769 0555 I

VON ARDENNE Malaysia Sdn. Bhd. I+60 4403 7363 I sales-vama@vonardenne.com; support-vama@vonardenne.com+60 4408 0080 I

VON ARDENNE Japan Co., Ltd. I Tokyo office I+81 3 6435 1700 I

VON ARDENNE North America, Inc. I Ohio office I
VON ARDENNE Vietnam Co., Ltd. I+86 21 6173 0200 I sales-vave@vonardenne.com; support-vave@vonardenne.com+81 3 6435 1699 I sales-vajp@vonardenne.com; support-vajp@vonardenne.com+1 419 386 2789 I+1 419 873 6661 I sales-vana@vonardenne.com; support-vana@vonardenne.com+84 966 29 29 50 I sales-vavn@vonardenne.com; support-vavn@vonardenne.com

VON ARDENNE India Pvt. Ltd.. I sales-VAID@vonardenne.com; support-vaid@vonardenne.com
Pictures: VON ARDENNE Corporate Archive, VON ARDENNE Family Archive, shutterstock.com. © All rights reserved.

ENGLISH 03/2023