Ԙታᣉ⺖㗴⇟ภ㧦㧞㧜㧜㧢㧮㧜㧝㧝㧥ԙታᣉ⺖㗴ฬ㧦‫ޟ‬࿕૕㉄ൻ‛ᒻΆᢱ㔚ᳰ࠮࡞ߩ⊒㔚ᤨᱷ⇐ᔕജ᷹ቯ‫ޠ‬Ԛታ㛎⽿છ⠪ᚲዻᯏ㑐෸߮᳁ฬ㧦᧲੩ࠟࠬᩣᑼળ␠໡ຠ㐿⊒ㇱ  ⍫ടㇱਭቁԛ૶↪ࡆ࡯ࡓ࡜ࠗࡦ㧦㧮㧸㧜㧥㨄㨁Ԝታ㛎⚿ᨐ㧦㧝㧚✜⸒
SOFC ታ↪ൻߩ⺖㗴ߩ৻ߟߦ‫ޔ‬REDOX ࠨࠗࠢ࡞ߦኻߔࠆࠕࡁ࡯࠼⠴ᕈߩ໧㗴߇޽ࠆ‫ޕ‬ㅢᏱ as-grown ߩ⁁ᘒߢࠕࡁ࡯࠼ਛ Ni ߪ㉄ൻߐࠇߡ߅ࠅ‫⊒ޔ‬㔚೨ߦㆶరߔࠆߎߣߦࠃࠅ㔚ᳰ㔚ᭂߣߒߡᯏ⢻ߔࠆ‫ޕ‬ೋ࿁ߩㆶరߦኻߒߡߪ㔚ᳰ߇ഠൻߔࠆߎߣߪߥ޿߇‫৻ޔ‬ᣤㆶరߐࠇߚࠕࡁ࡯࠼߇ౣ߮㉄ൻߐࠇࠆ႐ว‫ ߜࠊߥߔޔ‬Ni ߇ NiO ߦᄌൻߔࠆ႐วߦߪᵈᗧࠍⷐߔࠆ‫ޕ‬Fig. 1 ߦ␜ߔࠃ߁ߦ‫ޔ‬Ni ߦᲧߒߡ NiO ߪ‫ޔ‬ᩰሶቯᢙߦߒߡ⚂㧞㧜㧑⒟ᐲᄢ߈ߊ‫ޔ‬Ni ߩ㉄ൻߦ઻߁⤘ᒛߦࠃࠅ‫ޔ‬㔚⸃⾰ߣࠕࡁ࡯࠼ߩ⇇㕙ߦ೸㔌߇⊒↢ߒߚࠅ‫ޔ‬㔚ᳰߦࠢ࡜࠶ࠢ߇౉ߞߚࠅߔࠆ╬ߩ໧㗴߇⿠ߎࠆ႐ว߇޽ࠆ‫ ߡߒ߁ߎޕ‬REDOX ࠨࠗࠢ࡞ࠍ➅ࠅ㄰ߔߎߣߦࠃࠅ‫ޔ‬㔚ᳰ߇ഠൻߒߡⴕߊෂ㒾߇޽ࠆ‫⃻ޕ‬࿷ߩߣߎࠈ‫ࠕޔ‬ࡁ࡯࠼ߩౣ㉄ൻࠍ㒐ߋߎߣߪ‫ࡓ࠹ࠬࠪޔ‬ㆇォ਄ߩࠪ࡯ࠤࡦࠬߣߒߡᔅ㗇ߢ޽ࠅ‫⿠ޔ‬േᤨ‫ޔ‬ㆇォᤨ‫ߡߒߘޔ‬஗ᱛᤨߦ߅޿ߡ‫߇࠼࡯ࡁࠕޔ‬ౣ㉄ൻߐࠇߥ޿ࠃ߁ߥᵈᗧᷓ޿ㆇォᣇᴺ߇ขࠄࠇߡ޿ࠆ‫ޔߒ߆ߒޕ‬ታ↪਄ߩㆇォࠍ⠨߃ࠆߣ‫ޔ‬✕ᕆ஗ᱛᤨߥߤߩ⇣Ᏹᤨߦ޿߆ߦኻಣߔࠆ߆ߣ޿߁໧㗴߽޽ࠅ‫ ߩ࠼࡯ࡁࠕޔ‬REDOX ໧㗴ߪ‫ޔ‬SOFC ߩㆇォᣇᴺ෸߮ߘߩ⸳஻ߦ⪺ߒߊ೙⚂ࠍട߃ࠆߎߣߦߥࠆ‫ޔߢߎߘޕ‬REDOX ⠴ᕈࠍᜬߟࠕࡁ࡯࠼ߩ㐿⊒߇ᦸ߹ࠇࠆ߇‫ޔ‬REDOXߦኻߔࠆ㔚ᳰഠൻߩࡔࠞ࠾࠭ࡓ⥄૕ߐ߶ߤ⥄᣿ߢߪߥ޿‫੹ޕ‬࿁‫ޔ‬㑆ធ⊛ߥᣇᴺߢߪ޽ࠆ߇‫ޔ‬㔚⸃⾰ㇱಽߩᱷ⇐ᄌൻࠍ᷹ቯߔࠆߎߣߦࠃࠅ‫ޔ‬REDOX ᤨߩࠕࡁ࡯࠼ߩᯏ᪾⊛᜼േࠍ⺞ᩏߒߚ‫ޕ‬ታ㓙ߦ㔚ᳰࠍ⊒㔚ⅣႺਅߦ⟎߈‫ޔ‬㔚⸃⾰ㇱಽߩᱷ⇐ᔕജࠍߘߩ႐ⷰኤߒ‫㉄ߩ࠼࡯ࡁࠕޔ‬ൻㆶరߦ઻߁ᱷ⇐ᔕജߩᄌൻࠍ᷹ቯߔࠆߎߣߦࠃࠅ‫ߩ࠼࡯ࡁࠕޔ‬ᯏ᪾⊛᜼േࠍផ᷹ߒߚ‫ޕ‬

Fig. 1. Comparison of the structure for Ni and NiO.
Table 1. A list of the measurement conditions.
᡼኿శ࡜ࠗࡦశḮX ✢ࠛࡀ࡞ࠡ࡯
ࡕࡁࠢࡠ⚿᥏
᷹ቯᴺࠬ࡝࠶࠻᏷࠰࡯࡜࡯ࠬ࡝࠶࠻ࠕ࠽࡜ࠗࠩ࡯
᷹ቯ࿁᛬㕙㧞㧚᷹ቯᣇᴺ㔚⸃⾰ㇱಽߩᱷ⇐ᔕജߩ᷹ቯߪ‫ޔ‬㨄✢ᔕജ᷹ቯᴺࠍ↪޿ߡⴕߞߚ‫✢ޕ‬Ḯߪ SPring8 ߩ᡼኿శࠍ೑↪ߒߚ‫ޕ‬᷹ቯ᧦ઙࠍ Table㧝ߦ␜ߔ‫ޕ‬᷹ቯߦ૶↪ߒߚ࿁᛬ࡇ࡯ࠢߪ‫ߢࠢ࡯ࡇ࡞ࠣࡦࠪޔ‬ᒝᐲߩᒝ޿㧔㧡㧟㧝㧕㕙ߩࡇ࡯ࠢߢ޽ࠆ‫ޕ‬X ✢ࠛࡀ࡞ࠡ࡯ߪ‫ޔ‬CuKD✢ߩᵄ㐳ߣหߓ‫ޔ‬8.05 keV ࠍ૶↪ߒߚ‫ޕ‬᡼኿శߪන⦡ᕈ߇ᒝߊ‫⹜ޔ‬ᢱ⚿᥏☸ߩਇဋ৻ᕈߩᓇ㗀ࠍฃߌ߿ߔ޿ߚ߼‫౉ޔ‬኿శߦr1qߩំേࠍ߆ߌࠆߎߣߦࠃࠅ⚿᥏ਇဋ৻ߩᓇ㗀ࠍシᷫߒߡ޿ࠆ‫ޕ‬BL09XU⌀ⓨኽᱛࠕࡦࠫࡘ࡟࡯࠲
8.05 keV
Si 311ਗ௑ᴺ1㨪5 mm  0.5 mm
ߥߒߥߒ(531)㕙

䋭㩷㪉㪍㩷䋭䌘✢䌘✢ⓨ᳇⽶⩄ེ㔚ᳰΆᢱ㓸㔚᧚䉝䊦䊚䊅䉝䊦䊚䊅䊍䊷䉺䊷䉰䊮䊒䊦䉴䊁䊷䉳

Fig. 2. Configuration of the measurements.

Fig. 3. Photo image of the sample stage.

REDOX ߩᓇ㗀ߩ᷹ቯߪ‫ޔ‬Fig. 2 ߩࠃ߁ߥᴦౕࠍ૞⵾ߒ‫ߦࠫ࡯࠹ࠬ࡞ࡊࡦࠨߩ࠲࡯ࡔࠝ࠾ࠧޔ‬ᴦౕࠍขࠅઃߌߡታ
ᣉߒߚ‫ޕ‬ᴦౕࠍ⸳⟎ߒߚ౮⌀ࠍ Fig. 3 ߦ␜ߔ‫⹜߼ߓ߆ࠄ޽ߢ࡯࠲࡯ࡅޕ‬ᢱࠍ᣹᷷ߒ‫⊒ޔ‬㔚᷷ᐲߦߡΆᢱᭂߦଏ⛎ߔࠆࠟࠬߩ⚵ᚑࠍࠬ࠹࠶ࡊ⁁ߦᄌൻߐߖ‫ࠢ࡯ࡇޔ‬૏⟎ߩᤨ㑆ᄌൻࠍ᷹ቯߒߚ‫ޕ‬ㅢᏱߩ sin2\ᴺߢߪ‫ޔ‬᡼኿శࠍ೑↪ߒߡ߽৻࿁ߩᔕജ᷹ቯߦ⚂㧝ᤨ㑆⒟ᐲ߆߆ߞߡߒ߹߁‫ޔߢߎߘޕ‬sin2\ߩ㧞ὐᴺߦࠃࠅᔕജ୯ߩᤨ㑆ᄌൻࠍㅊߞ
ߚ‫౉ޕ‬኿ⷺߪ\=0q
෸߮=45qߩ㧞ߟߢ޽ࠆ‫⹜ޕ‬ᢱߪ⚂ 1 cm ⷺߩΆᢱᭂᡰᜬဳ㔚ᳰࠍ૶↪ߒߚ‫߮ࠃ߅࠼࡯ࡁࠕޕ‬㔚⸃⾰ߩෘߺߪߘࠇߙࠇ⚂ 2 mm ෸߮ 30 Pm ߢ޽ࠆ‫ޕ‬㧟㧚⚿ᨐ෸߮⠨ኤ߹ߕ‫ޔ‬REDOX ߦኻߔࠆᔕജᄌൻࠍ᷹ቯߔࠆ೨ߦ‫ޔ‬㔚⸃⾰ㇱಽߩᱷ⇐ᔕജߩ᷷ᐲଐሽࠍ᷹ቯߒߚ‫ޕ‬㔚⸃⾰ㇱಽߩᱷ⇐ᔕജߩ⿠Ḯߪ㔚⸃⾰ߣࠕࡁ࡯࠼ߩ⤘ᒛ᜼േߩࡒࠬࡑ࠶࠴ߢ޽ࠆ‫ޕ‬㔚⸃⾰ࠃࠅ߽ࠕࡁ࡯࠼ߩᣇ߇ᾲ⤘ᒛଥᢙ߇ᄢ߈޿ߚ߼‫ޔ‬㧝㧠㧜㧜͠ߢ౒὾⚿ߐߖߚ㔚ᳰࠍቶ᷷߹ߢ㒠᷷ߔࠆߣ‫ߩ࠼࡯ࡁࠕޔ‬ᣇ߇㔚⸃⾰ࠃࠅࠃࠅ෼❗ߒ‫ޔ‬㔚⸃⾰ㇱಽߦᄢ߈ߥ࿶❗ᔕജ߇⊒↢ߔࠆ‫ޕ‬ᓥߞߡ‫ޔ‬ㅒߦ‫ޔ‬ቶ᷷ࠃࠅ᣹᷷ߒߡⴕߊߣ‫ޔ‬ᱷ⇐ᔕജ߇ᷫዋߔࠆߎߣ߇੍᷹ߐࠇ
ࠆ‫ޕ‬Fig. 4 ߦ‫ޔ‬ቶ᷷߆ࠄ㧣㧡㧜͠߹ߢߩ‫ޔ‬ฦ᷷ᐲߦ߅ߌࠆ sin2\ᴺ᷹ቯߩ⚿ᨐࠍ␜ߔ‫ߩ\ޕ‬Ⴧടߦ઻޿‫ࠢ࡯ࡇޔ‬૏⟎߇ૐⷺ஥ߦࠪࡈ࠻ߒߡ޿ࠆ߇‫ߪࠇߎޔ‬ᱷ⇐ᔕജ߇࿶❗ᔕജߢ޽ࠆߎߣࠍ␜ߔ‫ߩ\ޕ‬Ⴧടߦ઻߁ࡇ࡯ࠢ૏⟎ߩࠪࡈ࠻㊂ߪ᷷ᐲ਄᣹ߣߣ߽ߦᷫዋߒߡ߅ࠅ‫ޔ‬࿶❗ᔕജ߇ᷫዋߒߡ޿ࠆߎߣ߇ࠊ߆ࠆ‫ޕ‬ฦ᷷ᐲߦ߅ߌࠆ᷹ቯ
⚿ᨐࠍၮߦ d sin2\✢࿑ࠍ૞ᚑߒߚ⚿ᨐࠍ Fig. 5 ߦ‫ ߦᦝޔ‬Fig. 5 ߩฦ᷷ᐲߦ߅ߌࠆࡊࡠ࠶࠻ߩ൨㈩୯ࠃࠅ⸘▚ߒߚᱷ⇐ᔕജ୯ࠍ Fig. 6 ߦ␜ߔ‫ޕ‬ᱷ⇐ᔕജߪ᷷ᐲ਄᣹ߣଏߦᷫዋߒߡ޿ߊ߇‫ߩߘޔ‬ᄌൻߪ✢ᒻߥන⺞ᄌൻߦߪߥߞߡ޿ߥ޿‫᦭ޕ‬㒢ⷐ⚛ᴺߦࠃࠆᢙ୯⸃ᨆࠍ↪޿ߡᱷ⇐ᔕജߩ᷷ᐲଐሽࠍ⸘▚ߔࠆߣ‫ߩߎޔ‬᷷ᐲၞߢߪ‫ޔ‬ᔕജߪ᷷ᐲߦଐሽߒߡ߶߷⋥✢⊛ߦᄌൻߔࠆ⚿ᨐߣߥࠆ‫ᧄޕ‬᷹ቯ⚿ᨐߪ‫⤘ޔ‬ᒛଥᢙߩ᷷ᐲᄌൻ߇ᄢ߈޿߆‫ޔ‬߽ߒߊߪᒢᕈቯᢙߩ᷷ᐲଐሽ߇ᄢ߈޿ߣ޿߁ߎߣࠍ⴫ߒߡ޿ࠆ‫ޔ߽ߡߒߦࠇߕ޿ޕ‬㧣㧡㧜͠ߦ߅޿ߡߪ‫ޔ‬ᱷ⇐ᔕജߪ㧝㧜㧜 MPa ⒟ᐲ߹ߢᷫዋߒߡ޿ࠆ‫ޕ‬
REDOX ߦኻߔࠆᱷ⇐ᔕജߩᄌൻߪ‫ޔ‬㔚ᳰࠍ㧣㧡㧜͠ߦ଻ᜬߒߚ⁁ᘒߢ‫ߦ࠼࡯ࡁࠕޔ‬ㅢ᳇ߔࠆࠟࠬࠍࠬ࠹࠶ࡊߢᄌൻߐߖ‫ࠬࠟޔ‬ᄌൻߦ⿠࿃ߔࠆᔕജߩᤨ㑆ᄌൻࠍ᷹ቯߒߚ‫౉ޕ‬኿ⷺࠍ\=0q෸߮=45qߢ੤੕ߦᄌൻߐߖ‫ࠇߙࠇߘޔ‬ߩⷺᐲߦ߅ߌࠆ࿁᛬ࡇ࡯ࠢߩᤨ㑆ᄌൻࠍ᷹ቯߒߚ‫ޕ‬Fig. 7 ߦ\=0q෸߮=45q㧞ߟߩ౉኿᧦ઙߦኻߔࠆ࿁᛬ࡇ࡯ࠢߩ૏⟎ߩᤨ㑆ᄌൻߩ᭽ሶࠍ␜ߔ‫㉄ޕ‬ൻࠕࡁ࡯࠼ࠍ಴⊒ὐߣߒ‫ޔ‬ଏ⛎ࠟࠬࠍ㧠㧑H㧞/N㧞ࠟࠬߦࠬ࠹࠶ࡊ⁁ߦᄌൻߐߖ‫ߘޔ‬ߩᤨὐࠍ࠯ࡠὐߣߒߡᤨ㑆ᄌൻࠍㅊߞߡ޿ࠆ‫ޕ‬ㆶరᕈࠟࠬߩᛩ౉ߣหᤨߦࠕࡁ࡯࠼ߩㆶర߇ᆎ߹ࠅ‫=\ޔ‬0q෸߮=45qߦኻߔࠆࡇ࡯ࠢߣ߽ߦ㜞ⷺ஥ߦࠪࡈ࠻ߒߡ޿ߊ‫ޕ‬㔚⸃⾰ߪၮᧄ⊛ߦㆶరᕈࠟࠬߦኻߒߡਇᵴᕈߢ޽ࠆߚ߼‫ࡇߩߎޔ‬࡯ࠢ૏⟎ߩࠪࡈ࠻ߪࠕࡁ࡯࠼ᄌᒻߦ઻߁శゲࠕ࡜ࠗࠕࡦࠬߩߕࠇߦࠃࠅ⿠ߎߞߡ޿ࠆ߽ߩߣ⠨߃ࠄࠇࠆ‫ߢߎߎޕ‬㊀ⷐߥߩߪ‫=\ޔ‬0q෸߮=45qߘࠇߙࠇߦኻߔࠆࡇ࡯ࠢ૏⟎ߩᏅߢ޽ࠆ‫ޕ‬ㆶరᤨ㑆ߩ⚻ㆊߣߣ߽ߦࡇ࡯ࠢ૏⟎Ꮕ߇᣿ࠄ߆ߦᷫዋߒߡ޿ࠆߎߣ߇ಽ߆ࠆ‫ޔߪࠇߎޕ‬㔚⸃⾰ߦ⊒↢ߒߡ޿ࠆ࿶❗ᔕജ߇ᷫዋߒߡ޿ࠆߎߣࠍ␜ߒߡ޿ࠆ‫ޕ‬㧞ὐ
ᴺߢㅢᏱߩ sin2\ᴺ߶ߤߦߪ♖ᐲߪ಴ߥ޿߽ߩߩ‫=\ޔ‬0q෸߮=45qߦኻߔࠆ࿁᛬ࡇ࡯ࠢ૏⟎ߩᏅࠃࠅ൨㈩ࠍ᳞߼‫ޔ‬ᔕജ୯ࠍផ▚ߒߡ⚻ㆊᤨ㑆ߦኻߒߡࡊࡠ࠶࠻ߔࠆߣ Fig. 8 ߩࠃ߁ߦߥࠆ‫ޕ‬ㆶర㐿ᆎߣߣ߽ߦᕆỗߦᔕജ߇ᷫዋߒ‫⚂ޔ‬䋭㩷㪉㪎㩷䋭㧞㧜ಽ⚻ㆊᓟߦߪ߶߷㧠㧜 MPa ⒟ᐲߢ⪭ߜ⌕߈‫ߩߘޔ‬ᓟ‫ޔ‬ᓢ‫ߦޘ‬ᷫዋߒߡ޿ߊ‫⚂ޕ‬㧝㧞㧜ಽ⚻ㆊᓟߦࠟࠬߩᵹ㊂ࠍჇടߐߖࠆߣ‫ߦᦝޔ‬ᔕജߪᷫዋߔࠆ‫ޕ‬೨⸥ߩࠃ߁ߦ‫ߩ࠼࡯ࡁࠕޔ‬ㆶరߦࠃࠅࠕࡁ࡯࠼ࡏ࡝ࡘ࡯ࡓ߇ᷫዋߔࠆߎߣ߇੍᷹ߐࠇ‫ޔ‬ᓥߞߡ‫ޔ‬ㆶరߦ઻޿‫ޔ‬㔚⸃⾰ߩᱷ⇐ᔕജߪჇടߔࠆߣ੍ᗐߐࠇߚ߇‫ޔ‬ታ㛎⚿ᨐߪߘߩㅒߩ⃻⽎ࠍ␜ߒߡ޿ࠆ‫ߩߎޕ‬ℂ↱ߢ޽ࠆ߇‫ޔ‬ㆶరߦࠃࠅࠕࡁ࡯࠼ㇱಽߩࡗࡦࠣ₸߇ᷫዋߒ‫⚿ߩߘޔ‬ᨐߣߒߡᔕജ߇ᷫዋߒߚ߽ߩߣ⠨߃ࠄࠇࠆ‫ޕ‬ㅒߦ‫㉄࠼࡯ࡁࠕޔ‬ൻࡕ࡯࠼ߦ߅ߌࠆᱷ⇐ᔕജᄌൻߢ޽ࠆ߇‫ޔ‬㕖Ᏹߦⶄ㔀ߥᔕജᄌൻࠍ␜ߒ‫ޔ‬࿶❗ᔕജࠍჇടߐߖࠆࠃ߁ߥ⚿ᨐߦߥࠆ‫⃻ޕ‬࿷ߩߣߎࠈ‫ߪ㉼⸃ߩ޿߹ࠆ߰ߩߎޔ‬࿎㔍ߢ޽ࠅ‫੹ޔ‬ᓟߩ⺖㗴ߣߔࠆ‫ޕ‬
3

Intensity (arb.unit)

200x10150

Intensity (arb.unit)

R.T.

3

400x10sin2\=0.5
0.4
0.3
0.2
0.1
0.0

100

50

123.4

123.6

123.8

124.0

sin2\=0.6
0.5
0.4
0.3
0.2
0.1
0200͠

300

200

100

124.2

123.8

124.0

2T(deg)

124.2

124.4

2T(deg)3

sin2\=0.6
0.5
0.4
0.3
0.2
0.1
0400͠

20015010050

124.0

124.5

125.03

sin2\=0.5
0.4
0.3
0.2
0.1
0.0750͠

150x10Intensity (arb.unit)

Intensity (arb.unit)

250x10

124.6

100

50

122.6

125.5

122.8

123.0

123.2

2T(deg)
2T(deg)
Fig. 4. Shifts of diffraction peak with \ measured at various temperature from R.T. to 750͠.
͠͠
͠
͠
͠

600

Stress (MPa)

d㧔Έ㧕

0.876

0.874

0.872

500
400
300
200
100

0.870

0
0.0

0.1

0.2

0.3

2

0.4

0.5

0.6

0.7

400

600

800

1000

Temperature (͠)

sin \Fig. 5. d-sin2\ plot of (531) peak measured
at various temperature.

Fig. 6. Temperature dependence of themeasured stress.
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3
\=0 (t=0 min)\=0.5 (t=0 min)\=0 (t=9 min)\=0.5 (t=9 min)\=0 (t=18 min)\=0.5 (t=18 min)\=0 (t=27 min)\=0.5 (t=27 min)

10080
60
40

at 750㷄ㆶర㐿ᆎ

80Stress (MPa)Intensity (arb.unit)

120x10N2/H2=0.5 L/min

60
40
20

20
0122.6

122.8

123.0

123.2

N2/H2=2 L/min

0123.402T(deg)

20406080100120140

Elapsed time (min)Fig. 8. Transient change of the stress.

Fig. 7. Transient change of the (531) peakposition.

㧠㧚⚿⺰SOFC ࠮࡞ߩ⊒㔚ⅣႺਅߦ߅ߌࠆࠕࡁ࡯࠼ㇱಽ REDOX ࠨࠗࠢ࡞ߦኻߒ‫ޔ‬REDOX ᤨߩഠൻ᜼േࠍ⸃᣿ߔࠆߚ߼ߦ‫ޔ‬SPring8 ߩ᡼኿శࠍ೑↪ߒߡ‫ޔ‬㔚⸃⾰ߩᱷ⇐ᔕജᄌൻߩ in-situ ᷹ቯࠍⴕߞߚ‫㉄ޕ‬ൻࠕࡁ࡯࠼ࠍ㧣㧡㧜͠ߢㆶర‫ޔ‬ㆶరࠕࡁ࡯࠼ࠍ㧣㧡㧜͠ߢౣ㉄ൻߒ‫ߩᤨߩߘޔ‬ᱷ⇐ᔕജߩᤨ㑆ᄌൻࠍ᷹ቯߒߚ‫ޕ‬᷹ቯߩ⚿ᨐ‫ޔ‬ㅢᏱࠕࡁ࡯࠼ߩ㉄ൻㆶరߦ઻߁⤘ᒛ‫ޔ‬෼❗᜼േߩℂ⸃ߦ෻ߔࠆࠃ߁ߥᔕജᄌൻࠍ␜ߔߎߣ߇ಽ߆ߞߚ‫ޕ‬⻢ㄉᧄ⎇ⓥߪ㧜㧢ᐕᐲ SPring8 ᚢ⇛ᵴ↪ࡊࡠࠣ࡜ࡓߩਅታᣉߒߚ߽ߩߢߔ‫ޕ‬᷹ቯߦ޽ߚࠅߏදജ޿ߚߛ߈߹ߒߚ㜞ノᐲశ⑼ቇ⎇ⓥ࠮ࡦ࠲࡯ߩଐ↰⧐ථඳ჻ߦᷓߊᗵ⻢޿ߚߒ߹ߔ‫ޕ‬䋭㩷㪉㪐㩷䋭