Office Action 2: Final Rejection (2024-08-15)
Rejection types: 103 - Obviousness

CLAIMS:
AMENDMENTS TO THE CLAIMS

1\. (Currently Amended) A support unit for supporting a substrate, the support unit comprising:a support plate SVG {EMBED HERE} 0.110.74SVG {EMBED HERE} 0.1433.503-a-SVG {EMBED HERE} 0.1030.737 and which includes an electrostatic electrode providing electrostatic force to the substrate;
a heater provided inside the support plate and configured to heat the substrate;
an insulating plate provided under the support plate as an insulating substance; and
a bimetal member disposed inside the support plate and configured to compensate for bending of the support plate due to heat,
wherein the bimetal member includes,:a pin provided to be \[\[in\]\] contactable with a bottom surface of the substrate that is placed on the support plate;
a first member configured to support the pin; and
a second member provided to surround the first member, and
the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member.

2\. (Original) The support unit of claim 1, wherein a movement direction of the pin according to the difference in the amount of thermal deformation between the first member and the second member is a direction opposite to a direction in which the support plate is bent according to a difference in the amount of thermal deformation between the support plate and the insulating plate in a region in which the bimetal member is provided.

3\. (Original) The support unit of claim 1, wherein a thermal deformation rate of the first member is different from a thermal deformation rate of the second member.

4\. (Original) The support unit of claim 3, wherein the thermal deformation rate of the first member is larger than the thermal deformation rate of the second member.

5\. (Original) The support unit of claim 1, wherein a volume of each of the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate.

6\. (Original) The support unit of claim 1, wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate.

7\. (Original) The support unit of claim 1, wherein a plurality of bimetal members is provided, andeach of the bimetal members is disposed in a hollow hole formed inside the support plate.
8\. (Currently Amended) The support unit of claim 7, wherein the support plate includes:adielectricplateon--SVG {EMBED HERE} 0.1071.29asSVG {EMBED HERE} 0.1431.25oSVG {EMBED HERE} 0.1370.89SVG {EMBED HERE} 0.1030.737 and which includes the electrostatic electrode therein and is provided as a

dielectric substance; anda lower plate disposed under the dielectric plate and provided with a cooling flow path therein, and
the bimetal member is disposed in the hollow hole formed inside the dielectric plate.
9\. (Currently Amended) A support unit for supporting a substrate, the support unit comprising:a first plate SVG {EMBED HERE} 0.0630.13w,,SVG {EMBED HERE} 0.1071.163aeSVG {EMBED HERE} 0.1432.743.a heater provided inside the first plate SVG {EMBED HERE} 0.141.103to heat the substrate;a second plate provided under the first plate.SVG {EMBED HERE} 0.142.42a different material SVG {EMBED HERE} 0.110.72\_a material of the first plate; and
a bimetal member disposed inside the first plate and configured to compensate for bending of the first plate,
wherein the bimetal member includes.
\_\_\_a pin provided to be \[\[in\]\] contactable with a bottom surface of the substrate that is placed on the first plate;
\_\_\_a first member configured to support the pin; and
\_\_\_\_a second member provided to surround the first member, and
the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member.

10\. (Original) The support unit of claim 9, wherein a movement direction of the pin according to the difference in the amount of thermal deformation between the first member and the second member is a direction opposite to a direction in which the

first plate is bent according to a difference in the amount of thermal deformation between the first plate and the second plate in a region in which the bimetal member is provided.

11\. (Original) The support unit of claim 9, wherein a thermal deformation rate of the first member is different from a thermal deformation rate of the second member.
12\. (Currently Amended) The support unit of claim \[\[12\]\] wherein the thermal deformation rate of the first member is larger than the thermal deformation rate of the second member.SVG {EMBED HERE} 0.1370.227

13\. (Original) The support unit of claim 9, wherein a volume of each of the first member and the second member is determined according to a difference in the amount of thermal deformation between the first plate and the second plate.

14\. (Original) The support unit of claim 9, wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the first plate and the second plate.

15\. (Currently Amended) The support unit of claim 9, wherein the amount of thermal deformation of the first plate is larger than the amount of thermal deformation of the second plate.

16\. (Original) The support unit of claim 9, wherein the first plate includes a

dielectric substance, and the second plate includes an insulating substance.
17\. (Currently Amended) A substrate treating apparatus, comprising:adielectricplatenSVG {EMBED HERE} 0.1070.433-SVG {EMBED HERE} 0.0970.567+-SVG {EMBED HERE} 0.142.40.SVG {EMBED HERE} 0.1030.737 and which includes an electrostatic electrode therein and is provided as a dielectric substance;
a lower plate disposed under the dielectric plate and provided with a cooling flow path therein;a heater provided inside the dielectric plate SVG {EMBED HERE} 0.1371.173to heat the substrate;
an insulating plate provided under the lower plate as an insulating substance;
and a bimetal member disposed inside the dielectric plate and configured to compensate for bending of the dielectric plate due to heat,wherein the bimetal member includes.a pin provided to be contactable with a bottom surface of the substrate that is placed on the dielectric plate;
afirst member configured to support the pin; and
a second member provided to surround the first member, and
the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member.

18\. (Original) The substrate treating apparatus of claim 17, wherein a movement direction of the pin according to the difference in the amount of thermal deformation between the first member and the second member is a direction opposite to a direction

in which the dielectric plate is bent according to a difference in the amount of thermal deformation between the dielectric plate, the lower plate, and the insulating plate in a region in which the bimetal member is provided.

19\. (Original) The substrate treating apparatus of claim 17, wherein the amount of thermal deformation of the first member is larger than the amount of thermal deformation of the second member.

20\. (Original) The substrate treating apparatus of claim 17, wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the dielectric plate, the lower plate, and the insulating plate.

OFFICE ACTION:
Detailed Correspondence
Notice of Pre-AIA  or AIA  Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Response to Amendment
Applicants’ submission of amendment of the Specification and replacement drawing, filed on 08/07/2024, is acknowledged. Applicants’ submission, filed on 08/07/2024, in response to claims 1-20 rejection from the non-final office action (05/09/2024), by amending claims 1, 8-9, 12, 15, and 17 is entered and will be addressed below.
Specification
The disclosure is objected to because of the following informalities: “The dielectric plate 200” at the top of page 10 should be “The dielectric plate 220”.
Applicants’ submitted Specification amendment wrongly refers to page 19, line 1.
Appropriate correction is required.
Claim Interpretations
The “a support plate on which a substrate is placed’ of claim 1, Applicants’ Fig. 2 shows the substrate W is above the support plate 210 and indirectly supported by the support plate 210 (directly supported by pin 1100) and will be examined accordingly.
Claim 16 recites “wherein the first plate includes a dielectric substance, and the second plate includes an insulating substance”, it is note that a dielectric substance is an insulating substance. Any minute difference in the first plate and the second plate is considered read into the claim.
It is also well-known that the bending of thermal expansion is between two adjacent layer that are connecting to each other (see also Applicants’ Fig. 8, bending due to thermal expansion difference between the dielectric plate 220 and the lower plate 230). As the lower plate 230 being a conductive material (with cooling channels), having a much larger thermal expansion difference than the dielectric/insulating substance. The examiner notices that the lower plate 230 and the dielectric plate 220 are lumped into the support plate 210 in claim 1. In claims 9-16, the lower plate is never mentioned. Therefore, it can be considered as either part of the dielectric plate 220 or part of the insulating plate 250.
The following limitations are considered a determination process for making the apparatus:
The “wherein a volume of each of the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate” of claim 5,
the “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate“ of claim 6,
the “wherein a volume of each of the first member and the second member is determined according to a difference in the amount of thermal deformation between the first plate and the second plate” of claim 13,
the “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the first plate and the second plate” of claim 14,
the “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the dielectric plate, the lower plate. and the insulating plate” of claim 20,
the determination/decision before making the apparatus is not part of the structure of the apparatus.
Claim Rejections - 35 USC § 103
The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action.
Claims 1-20 are rejected under 35 U.S.C. 103 as being unpatentable over Hara et al. (JP H06333810, from IDS, hereafter ‘810), in view of Matyushkin et al. (US 20080017104, hereafter ‘104). (US 20110292562 is evidenced for ESC deformation due to thermal expansion difference).
‘810 teaches some limitations of:
Claim 1: A drop out preventing member 18 is incorporated in a substrate mounting stand 4 along a hole 10 provided to the substrate mounting stand 4 (abstract, includes the claimed “A support unit for supporting a substrate, the support unit comprising: a support plate configured to support a substrate”);
a metal substrate mounting table 4 is arranged on the upper surface of the surface heating heater 2, and a heater pressing plate 6 is arranged on the lower surface thereof (middle of page 2, description applicable to the invention of ‘810, includes the claimed “a heater provided inside the support plate and configured to heat the substrate”);
the retaining member 18 made of bimetal in which two materials 28 and 30 having different thermal expansion coefficients are bonded to each other is attached to the built-in space 24 provided in the substrate mounting table 4 (middle of page 5), the retaining member is deformed as the temperature rises and extends downward from the head (Fig. 8, middle of page 3, above [0015], includes the claimed “and a bimetal member disposed inside the support plate and configured to compensate for bending of the support plate due to heat”),
the proximity pins 12 functioning as substrate supporting members for supporting the substrate W in the holes 10 are respectively detachable (middle of page 2, includes the claimed “wherein the bimetal member includes: a pin provided to be in contactable with a bottom surface of the substrate that is placed on the support plate”; the two metal materials 28 and 30 is the claimed “a first member configured to support the pin; and a second member provided to surround the first member”),
at a high temperature, as shown in FIG. 8, when a part of the retaining member 18 is adjusted so as to contact the body portion 16 of the proximity pin 12 so as to tighten the proximity pin 12, the retaining member 18 causes the proxy to move (lower portion of page 5, includes the claimed “and the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member”, as the temperature continue to rise, the thermal expansion difference is capable of moving the proximity pin 12 up and down).
‘810 does not teach the other limitations of:
Claim 1: (a support plate configured to support a substrate), and which includes an electrostatic electrode providing electrostatic force to the substrate.
an insulating plate provided under the support plate as an insulating substance.
‘810 is silent on the wafer chucking mechanism and the material of the pressing plate 6.
‘104 is an analogous art in the field of SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL (title), A substrate processing chamber comprises an electrostatic chuck comprising a ceramic puck having a substrate receiving surface and an opposing backside surface (abstract), including lift pins ([0052]). ‘104 teaches that The substrate 25 is held in the chamber 106 on a receiving surface 26 of a substrate support comprising an electrostatic chuck 20 which in turn rests on a base 91. The electrostatic chuck 20 comprises a ceramic puck 24 having a substrate receiving surface 26 which is the top surface of the puck 24, and serves to hold a substrate 25, as shown in FIGS. 1 and 2 ([0020]), The electrode 36 embedded in the ceramic puck 24 is used to generate an electrostatic force to retain a substrate placed on the substrate receiving surface 26 ([0022]), The base 91 comprises a metal body 92 ([0032], 2nd sentence, notice that the ceramic puck 24 and metal body 92 interface has a mismatch in thermal expansion). Note also the unlabeled layer between the metal body and the grounded chamber has to be an insulator to prevent short circuit as various power lines for electrode and heater passing through this layer.
Before the effective filing dates of the claimed invention, it would have been obvious to a person having ordinary skill in the art to have adopted an electrostatic chuck with an insulation plate in Fig. 1 of ‘104 as the mounting table 4 of ‘810, for its suitability for holding a substrate with predictable result. The selection of something based on its known suitability for its intended use has been held to support a prima facie case of obviousness. MPEP 2144.07. The combination is shown in illustration below.
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162
431
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[AltContent: arrow][AltContent: textbox (First/
dielectric
plate)][AltContent: arrow][AltContent: textbox (Insulating
plate)][AltContent: arrow][AltContent: textbox (second
metal
plate)][AltContent: arrow][AltContent: arrow][AltContent: textbox (Bimetal
member)]
‘810 also teaches some limitations of:
Claim 9: A drop out preventing member 18 is incorporated in a substrate mounting stand 4 along a hole 10 provided to the substrate mounting stand 4 (abstract, includes the claimed “A support unit for supporting a substrate, the support unit comprising: a first plate configured to support the substrate”);
a metal substrate mounting table 4 is arranged on the upper surface of the surface heating heater 2, and a heater pressing plate 6 is arranged on the lower surface thereof (middle of page 2, description applicable to the invention of ‘810, includes the claimed “a heater provided inside the first plate and configured to heat the substrate; a second plate provided under the first plate”);
the retaining member 18 made of bimetal in which two materials 28 and 30 having different thermal expansion coefficients are bonded to each other is attached to the built-in space 24 provided in the substrate mounting table 4 (middle of page 5), the retaining member is deformed as the temperature rises and extends downward from the head (middle of page 3, above [0015], includes the claimed “and a bimetal member disposed inside the first plate and configured to compensate for bending of the first plate”),
the proximity pins 12 functioning as substrate supporting members for supporting the substrate W in the holes 10 are respectively detachable (middle of page 2, includes the claimed “wherein the bimetal member includes: a pin provided to be in contactable with a bottom surface of the substrate that is placed on the first plate”); the two metal materials 28 and 30 is the claimed “a first member configured to support the pin; and a second member provided to surround the first member”),
at a high temperature, as shown in FIG. 8, when a part of the retaining member 18 is adjusted so as to contact the body portion 16 of the proximity pin 12 so as to tighten the proximity pin 12, the retaining member 18 causes the proxy to move (lower portion of page 5, includes the claimed “and the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member”, as the temperature continue to rise, the thermal expansion difference is capable of moving the proximity pin 12 up and down).
‘810 does not teach the other limitations of:
Claim 9: a second plate provided under the first plate, the second plate comprising a different material from a material of the first plate.
‘104 teaches the base 91 comprises a metal body 92 ([0032], 2nd sentence) as discussed above.
Before the effective filing dates of the claimed invention, it would have been obvious to a person having ordinary skill in the art to have adopted an electrostatic chuck in Fig. 1 of ‘104 that has a metal body 92 below the ceramic puck 24 as the mounting table 4 of ‘810, for its suitability for holding a substrate with predictable result. The selection of something based on its known suitability for its intended use has been held to support a prima facie case of obviousness. MPEP 2144.07.
‘810 also teaches some limitations of:
Claim 17: The present invention relates to a heat treatment apparatus for heating a substrate such as a rectangular glass substrate for liquid crystal or a semiconductor wafer ([0001], includes the claimed “A substrate treating apparatus, comprising”):
a metal substrate mounting table 4 is arranged on the upper surface of the surface heating heater 2, and a heater pressing plate 6 is arranged on the lower surface thereof (middle of page 2, description applicable to the invention of ‘810, includes the claimed “a heater provided and configured to heat the substrate”);
A drop out preventing member 18 is incorporated in a substrate mounting stand 4 along a hole 10 provided to the substrate mounting stand 4 (abstract), the retaining member 18 made of bimetal in which two materials 28 and 30 having different thermal expansion coefficients are bonded to each other is attached to the built-in space 24 provided in the substrate mounting table 4 (middle of page 5), the retaining member is deformed as the temperature rises and extends downward from the head (middle of page 3, above [0015], includes the claimed “a bimetal member configured to compensate for bending of the dielectric plate due to heat”),
the proximity pins 12 functioning as substrate supporting members for supporting the substrate W in the holes 10 are respectively detachable (middle of page 2, includes the claimed “wherein the bimetal member includes: a pin provided to be in contactable with a bottom surface of the substrate”; the two metal materials 28 and 30 is the claimed “a first member configured to support the pin; and a second member provided to surround the first member”),
at a high temperature, as shown in FIG. 8, when a part of the retaining member 18 is adjusted so as to contact the body portion 16 of the proximity pin 12 so as to tighten the proximity pin 12, the retaining member 18 causes the proxy to move (lower portion of page 5, includes the claimed “and the pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member”, as the temperature continue to rise, the thermal expansion difference is capable of moving the proximity pin 12 up and down).
‘810 does not teach the other limitations of:
Claim 17: a dielectric plate configured to support the substrate, and which includes an electrostatic electrode therein and is provided as a dielectric substance;
a lower plate disposed under the dielectric plate and provided with a cooling flow path therein;
(a heater provided inside) the dielectric plate (and configured to heat the substrate);
an insulating plate provided under the lower plate as an insulating substance;
(a bimetal member disposed) inside the dielectric plate (and configured to compensate for bending of the dielectric plate due to heat),
(wherein the bimetal member includes: a pin provided to be contactable with a bottom surface of the substrate) that is placed on the dielectric plate;
‘104 is an analogous art as discussed above.
Before the effective filing dates of the claimed invention, it would have been obvious to a person having ordinary skill in the art to have adopted an electrostatic chuck in Fig. 1 of ‘104 as the mounting table 4 of ‘810, for its suitability for holding a substrate with predictable result. The selection of something based on its known suitability for its intended use has been held to support a prima facie case of obviousness. MPEP 2144.07.
‘810 further teaches the limitations of:
Claims 3 and 11: the retaining member 18 made of bimetal in which two materials 28 and 30 having different thermal expansion coefficients are bonded to each other is attached to the built-in space 24 provided in the substrate mounting table 4 (middle of page 5, includes the claimed “wherein a thermal deformation rate of the first member is different from a thermal deformation rate of the second member”).
Claims 4, 12, and 19: The retaining member 18 is made of a material having a coefficient of thermal expansion higher than that of the material of the substrate mounting table 4 (3rd complete paragraph of page 4, a supporting evidence), at a high temperature, as shown in FIG. 8, when a part of the retaining member 18 is adjusted so as to contact the body portion 16 of the proximity pin 12 so as to tighten the proximity pin 12, the retaining member 18 causes the proxy to move (lower portion of page 5, therefore, the material 30 has to have a higher thermal expansion to tighten the proximity pin, includes the claimed “wherein the thermal deformation rate of the first member is larger than the thermal deformation rate of the second member”).
Claims 5-6, 13-14, and 20: the determination process is not part of the apparatus, see claim interpretation above (the claimed “wherein a volume of each of the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate” of claims 5/13 and “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the support plate and the insulating plate” of claims 6/14 and “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the dielectric plate, the lower plate. and the insulating plate” of claim 20). Furthermore, claims 5-6 do not include the specific relationship between the relationship between the volume of the two members and the difference in thermal deformation between the support plate and the insulating plate. A determination that no relationship between these two quantities is also a determination.
Claim 7: In the above embodiment, one retaining member 18 is arranged in each hole 10 to prevent the proximity pin 12 from coming out of the hole 10. As shown, one retaining member 18 may be arranged for every three holes 10 (bottom of page 5, before [0029], includes the claimed “wherein a plurality of bimetal members is provided, and each of the bimetal members is disposed in a hollow hole formed inside the support plate”).
The combination of ‘810 and ‘104 teaches the limitations of:
Claims 2, 10, and 18: As shown in the illustration above, Fig. 1 of ‘104 having the dielectric- metal-insulating structure same as Applicants’ FIG. 2, along with the thermal expansion relationship discussed in claim 4 above, the combination would have the property of “wherein a movement direction of the pin according to the difference in the amount of thermal deformation between the first member and the second member is a direction opposite to a direction in which the support plate is bent according to a difference in the amount of thermal deformation between the support plate and the insulating plate in a region in which the bimetal member is provided” of claims 2 and 10 and “wherein the difference in the amount of thermal deformation between the first member and the second member is determined according to a difference in the amount of thermal deformation between the dielectric plate, the lower plate. and the insulating plate” of claim 20.
Claim 8: The electrostatic chuck 20 comprises a ceramic puck 24 having a substrate receiving surface 26 which is the top surface of the puck 24, and serves to hold a substrate 25, as shown in FIGS. 1 and 2 (‘104, [0020]), The electrode 36 embedded in the ceramic puck 24 is used to generate an electrostatic force to retain a substrate placed on the substrate receiving surface 26, and optionally, to capacitively couple energy to the plasma formed in the chamber 106 ([0022], includes the claimed “wherein the support plate includes: a dielectric plate configured to support the substrate, and which includes the electrostatic electrode therein and is provided as a dielectric substance”);
The base 91 has a coolant channel 110 ([0033], includes the claimed “and a lower plate disposed under the dielectric plate and provided with a cooling flow path therein”),
In the above embodiment, one retaining member 18 is arranged in each hole 10 to prevent the proximity pin 12 from coming out of the hole 10. As shown, one retaining member 18 may be arranged for every three holes 10, (‘810, bottom of page 5, before [0029], in the combination, the holes has to be in the imported ceramic puck 24 from ‘104, includes the claimed “and the bimetal member is disposed in the hollow hole formed inside the dielectric plate”).
Claim 15: by considering the base 91 and the ceramic puck 24 as the “plate”, it reads into the claimed “wherein the amount of thermal deformation of the first plate is larger than the amount of thermal deformation of the second plate”.
Claim 16: the illustration above also shows that “wherein the first plate includes a dielectric substance, and the second plate includes an insulating substance”.
In case Applicants argue that ‘104 only teaches thermal expansion stresses that cause cracking ([0038]) but does not teach bending or deformation in regarding to claims 2, 10, and 18, and 5-6, 13-14, and 20. US 20110292562 is cited thermal expansion mismatch resulting bending or deformation (Figs. 3A-3B, [0004]).
Response to Arguments
Applicant's arguments filed 08/07/2024 have been fully considered but they are not persuasive.
In regarding drawing objection, see lower portion of page 11, Applicants’ replacement drawing overcomes the objection.
In regarding to objection of the Specification, see the bottom of page 11, Applicants’ amendment of the Specification includes an error.
In regarding to 112(b) rejection, see the upper part of page 12, Applicants’ amendment overcomes the rejection.
In regarding to 103 rejection over ‘810 in view of ‘104, Applicants argue that “at a high temperature, as shown in FIG. 8, when a part of the retaining member 18 is adjusted so as to contact the body portion 16 of the proximity pin 12 so as to tighten the proximity pin 12, the retaining member 18 causes the proxy to move” is not proximity pin is moving because the proximity pin 12 is secured in place, see page 13.
This argument is found not persuasive.
The difference in thermal expansion of two material 28 and 30 intrinsically will move the pin 12 due to change of temperature. ‘562 is cited as evidence in previous OC already. See also ‘432 in the conclusion.
The examiner invites Applicants to point out what component is proxy? Applicants might want to provide their own English translation of ‘810 to show that proxy is a different component than the proximity pin 12. Furthermore, that the proximity pin is unmovable even during temperature change.
Secured in place (Applicants’ own word) does not exclude movement due to temperature change. Likewise, Applicants’ own bimetal member 1000 is secured in place (Fig. 2) but it moves due to thermal expansion to compensate the thermal expansion of the support plate.
Conclusion
The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. US 20110076432 is cited for bimetal moves in response to a temperature change ([0008]).
US 5914568 is cited for distortion due to thermal stress (Fig. 1, col. 1, lines 40-42).
THIS ACTION IS MADE FINAL.  Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action.  In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any extension fee pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action.  In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.

APPLICANT REBUTTAL: REMARKS
Claims 1-20 are currently pending in the present application, with claims 1, 9, and 17 being written in independent form. Claims 1, 9, and 17 have been amended. Claims 2, 10, and 18 are cancelled without prejudice or disclaimer. Support for the amendments may be found, for instance, in paragraph [0063], of the published specification. Thus, no new matter has been introduced into the claims.
Drawings
The Office Action indicates that the drawings have been accepted by the Examiner.
Objection to the Specification
The specification stands objected to because of informalities. This objection has been rendered moot by the present amendments. Accordingly, Applicants request the Examiner to reconsider and withdraw this objection.
Claim Interpretation
On pages 3-5 of the Office Action, the Examiner sets forth interpretations of claims 1, 5, 6, 9-16 and 20. Applicant acknowledges the interpretations without express agreement or disagreement with regard to the interpretations.
Claim Rejection under 35 U.S.C.
§
Claims 1-20 stand rejected under 35 U.S.C. § 103 as being unpatentable over JP H06333810 ("'810"), in view of U.S. 20080017104 ("'104"). (US 2011029562 is evidenced for ESC deformation due to thermal expansion difference.).
Applicants traverse this rejection for the reasons below.
To establish a prima facie case of obviousness, all claim limitations must be taught or suggested by the cited art. See, In re Royka, 490 F.2d 981,985,180 USPQ 580, 583 (CCPA, 1974; see also, In re Vaeck, 947 F. 2d 488, 20 USPQ2d 1438 (Fed. Cir. 1991). There must be some articulated reasoning with
some rational
underpinning to support the legal conclusion of obviousness. In re Kahn, 441 F.3d 977, 988, 78 USPQ2d 1329, 1336 (Fed. Cir. 2006).
Without acquiescing to the rejections, claim 1 has been amended to recite, in part, "the bimetal member includes...a first member configured to support the pin,
the
pin coupled to an upper surface of the first member,"
and
"wherein a movement direction of the pin according to the difference in the amount of thermal deformation between the first member and the second member is a direction opposite to a direction in which the support plate is bent according to a difference in the amount of thermal deformation between the support plate and the insulating plate in a region in which the bimetal member is provided."
With regard to claim 1, the Examiner asserts that "the two metal materials 28 and 30 [of '810] are respectively the claimed 'a first member configured to support the pin; and a second member provided to surround the first member."' (Office Action, pages 5-6). However, '810 discloses that "the proximity pin 12 mounted in the hole 10...can be attached and detached" and only at a high temperature is "a part of the retaining member 18 [] adjusted so as to contact the body portion 16 of the proximity pin 12." ('810, middle of page 5 with reference to a fifth embodiment). Accordingly, '810 fails to disclose or teach "the pin coupled to an upper surface of the first member," as recited in amended claim 1. '104 fails to cure the deficiencies of '810.
Further, with regard to claim 2, the subject matter of which is incorporated into claim 1, Applicants do not agree that Fig. 1 of '104 has the dielectric-metal-insulating structure same as Applicants' FIG. 2, but particularly that Fig. 1 of '104 in combination with the thermal expansion relationship "discussed in claim 4" (i.e., the retaining member 18 and the proximity pin 12 of '810) (see Office Action, page 15) teaches the limitations of claim 2.
Conclusory statements alone are insufficient to support a rejection of obviousness; instead, the finding must be supported by a reasoned explanation with explicit reasoning and an articulated rationale. See in re Nuvasive, 842 F. 3d 1376, 1382-83. ("Our precedent dictates that the PTAB must make a finding of a motivation to combine when it is disputed. See, e.g., Lee, 277 F.3d at 1343-45; see also KSR, 550 U.S. at 418, 127 S.Ct. 1727 (stating that the PTAB's motivation to combine "analysis should be made explicit" (citation omitted)). Although identifying a motivation to combine "need not become [a] rigid and mandatory formula[]," KSR, 550 U.S. at 419, 127 S.Ct. 1727, the PTAB must articulate a reason why a PHOSITA would combine the prior art references."). The Examiner fails to provide any specific reason why a personal having ordinary skill in the art would have had any incentive to combine the cited references in the specific manner required by claim 2, for example.
The presently amended claims recite that "a pin is provided to move up or move down according to a difference in the amount of thermal deformation between the first member and the second member, wherein a movement direction of the pin...is a direction opposite to a direction in which the support plate is bent," '810 limits the movement of the pins to prevent them from coming off the support. Therefore, '810 teaches an opposing action with respect to the pins, in comparison to the claimed
invention. Accordingly, there would be no motivation to derive the pin behavior of the present application from '810.
For at least the reasons above, a prima facie case of obviousness cannot be established with regard to claim 1. A prima facie case of obviousness cannot be established with regard to claims 9 and 17 for at least analogous reasons. Consequently, a prima facie case of obviousness cannot be established with regard to claims 3-8, 11-16, and 19-20, at least by virtue of their respective dependencies from claims 1, 9, and 17. Accordingly, Applicants request the Examiner to reconsider and withdraw the above reaction.
CONCLUSION

NEXT OFFICE ACTION: Notice of Pre-AIA  or AIA  Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Continued Examination Under 37 CFR 1.114
A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection.  Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114.  Applicant's submission filed on 12/12/2024 has been entered.
Response to Amendment
Applicants’ submission of amendment of the Specification and replacement drawing, filed on 10/15/2024, is acknowledged. Applicants’ submission, filed on 10/15/2024, in response to claims 1-20 rejection from the final office action (08/15/2024), by amending claims 1, 9, and 17 and cancelling claims 2, 10, and 18 is entered and will be addressed below.
Examiner’s amendment
An examiner’s amendment to the record appears below. Should the changes and/or additions be unacceptable to applicant, an amendment may be filed as provided by 37 CFR 1.312. To ensure consideration of such an amendment, it MUST be submitted no later than the payment of the issue fee.
Claims 1, 9, and 17 have been amended as following –
Claim 1, line 13, before “first member” has been inserted with --  circular shaped  --.
Claim 1, line 15, before “second member” has been inserted with -- ring shaped  --.
Claim 1, line 15, before “the first member” has been inserted with -- the circumference of  --.
Claim 9, line 12, before “first member” has been inserted with --  circular shaped  --.
Claim 9, line 14, before “second member” has been inserted with -- ring shaped  --.
Claim 9, line 14, before “the first member” has been inserted with -- the circumference of  --.
Claim 17, line 15, before “first member” has been inserted with --  circular shaped  --.
Claim 17, line 17, before “second member” has been inserted with -- ring shaped  --.
Claim 17, line 17, before “the first member” has been inserted with -- the circumference of  --.
Authorization for this examiner’s amendment was given in a telephone interview with attorney Ryan Cribbs on 01/21/2025.
Allowable Subject Matter
Claims 1, 3-9, 11-17, and 19-20 are allowed.
The following is a statement of reasons for the indication of allowable subject matter: Applicants’ IDS KR 20200052568, teaches a pin couple to the upper surface of a first member (Figs. 1 and 4). The prior of record, JP H06333810, teaches the bimetal materials 28 and 30, with material 28 at the bottom of the material 30 but does not teach the material 28 surrounding the circumference of circular shape material 30. US 20080017104 and 20110292562 does not remedy this deficiency. The prior arts, alone or in combination, does not fairly teaches the limitations of:
“a circular shaped first member configured to support the pin, the pin coupled to an upper surface of the first member; and
a ring shaped second member provided to surround the circumference of the first member” in the context of claim 1, 9, and 17, respectively.
Conclusion

CITED REFERENCE SUMMARIES: Ref US20110076432A1: [content unavailable]
Ref US20080017104: Claims:
1. A substrate support assembly capable of holding and heating a substrate in a process chamber, the assembly comprising: 
(a) a ceramic puck comprising a substrate receiving surface and an opposing backside surface, the ceramic puck comprising (i) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface, and (ii) a heater embedded in the ceramic puck to heat the substrate;  (b) a coolant base comprising a coolant channel to circulate coolant therethrough, the channel comprising an inlet and terminus;  (c) a compliant layer bonding the ceramic puck to the coolant base, the compliant layer comprising at least one of (i) silicon having embedded aluminum fibers, or (ii) acrylic having an embedded wire mesh.
2. A support assembly according to claim 1 wherein the inlet and terminus of the coolant channel are adjacent to one another and the coolant channel loops back upon itself.
3. A support assembly according to claim 2 wherein the opposing backside surface of the ceramic puck comprises a plurality of spaced apart mesas, with first mesas adjacent to the inlet of the coolant channel and second mesas that being distal from the inlet of the coolant channel, and wherein: 
(i) the first mesas are spaced apart a first distance that is smaller than a second distance between the second mesas; or  (ii) the first mesas have a first contact area that is larger than a second contact area of the second mesas.
4. A support assembly according to claim 1 wherein the ceramic puck comprises a thickness of less than about 7 mm.
5. A support assembly according to claim 1 wherein the ceramic puck comprises a thickness of from about 4 to about 7 mm.
6. A support assembly according to claim 1 wherein the ceramic puck is composed of aluminum oxide.
7. A support assembly according to claim 6 wherein the electrodes and heater comprise tungsten or molybdenum.
8. A support assembly according to claim 1 where the heater comprises first and second coils that are radially spaced apart and concentric about one another, the first coil located at a peripheral portion of the ceramic puck and the second coil located at a central portion of the ceramic puck, and the first and second coils comprise a total resistance of less than 10 Ohms.
9. A support assembly according to claim 1 wherein the heater comprises a resistance of about 8.5 ohms.
10. A support assembly according to claim 1 wherein the heater comprises a coil having first loops spaced apart a first distance and second loops spaced apart a second distance that is greater than the first distance.
11. A support assembly according to claim 10 wherein the second loops are positioned about a lift pin hole in the ceramic.
12. An electrostatic chuck capable of holding and heating a substrate in a process chamber, the electrostatic chuck comprising: 
(a) a ceramic puck comprising a substrate receiving surface and an opposing backside surface, the ceramic puck comprising a thickness that is less than about 7 mm;  (b) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface, and  (c) a heater embedded in the ceramic puck to heat a substrate received on the substrate receiving surface.
13. An chuck according to claim 12 wherein the ceramic puck comprises a thickness of from about 4 to about 7 mm.
14. An chuck according to claim 12 wherein: 
(i) the ceramic puck is composed of aluminum oxide; and  (ii) the electrode and heater are composed of tungsten or molybdenum.
15. An chuck according to claim 1 wherein the opposing backside surface of the ceramic puck comprises a plurality of spaced apart mesas, with a first group of mesas and a second group of mesas, and wherein: 
(i) the first mesas are spaced apart a first distance that is smaller than a second distance between the second mesas; or  (ii) the first mesas have a first contact dimension that is larger than a second contact dimension of the second mesas.
16. A compliant layer for bonding a ceramic puck comprising an electrode and a heater to a coolant base comprising a coolant channel to circulate coolant therethrough, the compliant layer comprising at least one of: 
(a) silicon having embedded aluminum fibers, or  (b) acrylic having an embedded wire mesh.
17. A substrate processing apparatus comprising: 
(a) a process chamber comprising a substrate support mounted therein, the substrate support comprising: 
(i) a ceramic puck with an electrode and a heater; 
(ii) a base below the ceramic puck, the base comprising coolant channels; and 
(iii) a chiller to maintain a coolant at a preset temperature, the coolant provided to the channels of the base; 
 (b) a gas distributor to provide a process gas to the process chamber;  (c) a gas energizer to energize the process gas; and  (d) a gas exhaust port through which to exhaust the process gas from the chamber; and  (e) a controller comprising temperature control instruction sets that include code to (i) increase a coolant temperature in the chiller to a higher level prior to ramping up the power level applied to the heater in the ceramic puck, or (ii) decrease a coolant temperature in the chiller to a lower level prior to ramping down the power level applied to the heater in the ceramic puck, whereby the temperature of the substrate can be ramped up or down at a faster rate.
18. An apparatus according to claim 17 wherein the temperature control instruction sets include code to change a coolant temperature in the chiller to a higher level at least about 1 second before ramping up or ramping down the power level applied to the heater in the ceramic puck.
19. An apparatus according to claim 17 wherein the temperature control instruction sets include code to change the coolant temperature by at least about 10° C.
20. An apparatus according to claim 17 wherein the ceramic puck is bonded to the base by a compliant layer comprising at least one of (i) silicon having embedded aluminum fibers, or (ii) acrylic having an embedded wire mesh.
Ref US20110292562: Claims:
1. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:
a backing plate for providing structural support and rigidity to the electrostatic clamp, wherein the backing plate has a first coefficient of thermal expansion associated therewith; and a clamping plate having a clamping surface configured to contact the workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith, wherein the clamping plate is bonded to the backing plate, and wherein the first coefficient of thermal expansion and second coefficient of thermal expansion are minimized, with a maximum difference determined by the geometry of the electrostatic clamp.
2. The electrostatic clamp of claim 1, wherein the backing plate comprises a metal, therein defining a metallic backing plate, and wherein the clamping plate comprises a ceramic material, therein defining a ceramic clamping plate.
3. The electrostatic clamp of claim 2, wherein the metallic backing plate is comprised of titanium, and wherein the ceramic clamping plate is comprised of aluminum nitride.
4. The electrostatic clamp of claim 2, wherein the metallic backing plate is comprised of titanium, and wherein the ceramic clamping plate is comprised of aluminum oxide.
5. The electrostatic clamp of claim 1, wherein the backing plate is comprised of silicon carbide, and wherein the ceramic clamping plate is comprised of aluminum nitride.
6. The electrostatic clamp of claim 1, wherein the backing plate comprises one or more coolant channels configured to circulate a coolant fluid therethrough, therein controlling a temperature of the electrostatic clamp.
7. A method for manufacturing an electrostatic clamp, the method comprising:
selecting a metallic backing plate material having a first coefficient of thermal expansion; selecting a ceramic clamping plate material having a second coefficient of thermal expansion, wherein the first coefficient of thermal expansion and second coefficient of thermal expansion are minimized, with a maximum difference determined by the geometry of the electrostatic clamp; and bonding, attaching, or growing the ceramic clamping plate on to the backing plate.
8. The method of claim 7, wherein the selection of the metallic backing plate material and the ceramic clamping plate material is based on a predetermined temperature range in which the electrostatic clamp is configured to operate.
9. The method of claim 7, wherein the first coefficient of thermal expansion and second coefficient of thermal expansion vary by no greater than factor of three.
10. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:
a backing plate for providing structural support and rigidity to the electrostatic clamp, the backing plate having a first coefficient of thermal expansion associated therewith; a clamping plate for providing a clamping surface to selectively contact the workpiece, the clamping plate having a second coefficient of thermal expansion associated therewith, wherein the clamping plate is bonded, attached or grown on to the backing plate, and wherein a difference between the first coefficient of thermal expansion and second coefficient of thermal expansion is minimized with a maximum difference determined by the geometry of the electrostatic clamp.
11. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:
a metallic backing plate having a first coefficient of thermal expansion associated therewith, wherein the backing plate provides structural support and rigidity to the electrostatic clamp; and a ceramic clamping plate having a clamping surface configured to contact the workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith, and wherein the clamping plate is bonded to the backing plate, wherein the first coefficient of thermal expansion and second coefficient of thermal expansion vary by no greater than a factor of three.
12. The electrostatic clamp of claim 11, wherein the metallic backing plate is comprised of titanium and the ceramic clamping plate is comprised of aluminum nitride.
13. The electrostatic clamp of claim 11, wherein the metallic backing plate is comprised of silicon carbide, and the ceramic clamping plate is comprised of aluminum nitride.
14. The electrostatic clamp of claim 11, wherein the metallic backing plate is comprised of titanium, and wherein the ceramic clamping plate is comprised of aluminum oxide.
15. A method for manufacturing an electrostatic clamp, the method comprising:
selecting a backing plate metallic material having a first coefficient of thermal expansion; selecting a clamping plate ceramic material having a second coefficient of thermal expansion, wherein the first coefficient of thermal expansion and second coefficient of thermal expansion vary by no greater than a factor of three; and bonding, attaching, or growing the ceramic clamping plate on to the backing plate.
16. The method of claim 15, wherein the selection of the backing plate metallic material and the clamping plate ceramic material is based on a predetermined temperature range.
Ref US20110076432: Claims:
1. A thermoplastic resin container for which completion of a retort processing can be confirmed, characterized in that the thermoplastic resin container is made from a thermoplastic resin by two-stage blow molding and has a retort processing completion confirming part formed by a whitened part, which is produced by heating in a retort processing after a stretching processing.
2. The thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 1, characterized in that the retort processing completion confirming part formed by the whitened part is formed on a bottom part of the container.
3. The thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 2, characterized in that the retort processing completion confirming part formed by the whitened part is formed in a circular shape at a center part of the bottom part of the container.
4. The thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 1, characterized in that the retort processing completion confirming part formed by the whitened part is formed at a base part of a nozzle of the container.
5. The thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 1, characterized in that the thermoplastic resin is polyester resin.
6. The thermoplastic resin container for which completion of a retort processing can be confirmed according claim 1, characterized in that the thermoplastic resin container is a retort-processing-ready polyester resin container capable of being subjected to retort sterilization at 105 degrees C. or higher for 1 to 50 minutes.
7. A thermoplastic resin container, characterized in that the thermoplastic resin container is formed by forming an intermediate body by stretch blow molding of a preform made of a thermoplastic resin, heating the intermediate body to cause heat shrinkage, and then performing secondary stretch blow molding of the intermediate body in such a manner that a transparent or translucent part that is not stretched or is insufficiently stretched rapidly cooled is formed at a part of the intermediate body.
8. A method for producing a thermoplastic resin container for which completion of a retort processing can be confirmed, characterized in that an intermediate body is formed by stretch blow molding of a preform made of a thermoplastic resin, the intermediate body is heated to cause heat shrinkage, the container is formed by performing secondary stretch blow molding of the intermediate body in such a manner that a transparent or translucent part that is not stretched or is insufficiently stretched rapidly cooled is formed at a part of the intermediate body, a content is packed and sealed in the container, and then, the part that is not stretched or is insufficiently stretched is turned into a whitened part by heating in a retort processing to form a retort processing completion confirming part.
9. The method for producing a thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 8, characterized in that the intermediate body is formed by biaxial stretch blow molding of the preform made of a thermoplastic resin in such a manner that the part that is not stretched or is insufficiently stretched is formed at a bottom of the intermediate body, the intermediate body is heated to cause heat shrinkage, the container is formed by performing secondary stretch blow molding of the intermediate body by longitudinally stretching the intermediate body with a stretching rod whose bottom surface of the tip end is cooled so that the part that is not stretched or is insufficiently stretched rapidly cooled is formed at a center part of a bottom part of the container, the content is packed and sealed in the container, and then, the part that is not stretched or is insufficiently stretched is turned into the whitened part by heating in the retort processing to form the retort processing completion confirming part.
10. The method for producing a thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 9, characterized in that the intermediate body is formed by biaxial stretch blow molding of the preform made of a thermoplastic resin in such a manner that the part that is not stretched or is insufficiently stretched is formed at the bottom of the intermediate body, the intermediate body is heated to cause heat shrinkage, the container is formed by performing secondary stretch blow molding of the intermediate body by holding the bottom of the intermediate body between the stretching rod whose bottom surface of the tip end is cooled and a supporting pin whose upper surface is cooled so that the part that is not stretched or is insufficiently stretched rapidly cooled is formed at the center part of the bottom part of the container, the content is packed and sealed in the container, and then, the part that is not stretched or is insufficiently stretched is turned into the whitened part by heating in the retort processing to form the retort processing completion confirming part.
11. The method for producing a thermoplastic resin container for which completion of a retort processing can be confirmed according to claim 8, characterized in that the intermediate body is formed by biaxial stretch blow molding of the preform made of a thermoplastic resin in such a manner that the part that is not stretched or is insufficiently stretched is formed at a base part of a nozzle, the intermediate body is heated to cause heat shrinkage, secondary stretch blow molding of the intermediate body is performed by rapidly cooling the thick part that is not stretched or is insufficiently stretched formed at the base part of the nozzle by holding the part between cooled parts of a blow mold, the content is packed and sealed in the container, and then, the part that is not stretched or is insufficiently stretched is turned into the whitened part by heating in the retort processing to form the retort processing completion confirming part.
12. A heat-resistant thermoplastic resin container that is formed by two-stage blow molding and for which completion of a retort processing can be confirmed after a food or drink is packed in the container, characterized in that a retort processing completion confirming part is formed on the container by turning a part that is not stretched or is insufficiently stretched into a whitened part by heating in the retort processing performed after a content is packed and sealed in the container.
Ref JPH06333810: Claims:
【特許請求の範囲】[Claims] 【請求項１】 加熱源と、 前記加熱源上に配置され、その上面側に複数の孔を有する基板載置台と、 前記基板載置台に設けられた各孔に着脱自在であり、前記孔に装着された状態で、その頭部が前記基板搭載台の上面から突出し、熱処理対象となる基板を前記基板載置台から所定間隔だけ離れた上方位置で支持する基板支持部材と、 各孔の少なくとも一部に沿うように前記基板載置台に組み込まれ、温度上昇に伴って変形し、その一部が前記孔に装着された前記基板支持部材に接触して前記基板支持部材の動きを規制する抜け止め部材とを備えたことを特徴とする熱処理装置。1. A heating source, a substrate mounting table disposed on the heating source and having a plurality of holes on its upper surface side, and detachable to each hole provided in the substrate mounting table. In a mounted state, its head protrudes from the upper surface of the substrate mounting table and supports a substrate to be heat-treated at an upper position separated from the substrate mounting table by a predetermined distance, and at least one of the holes. A retainer that is incorporated in the substrate mounting table so as to follow the portion, deforms with a rise in temperature, and a part of the deformation contacts the substrate supporting member mounted in the hole to regulate the movement of the substrate supporting member. A heat treatment apparatus comprising: a member. 【請求項２】 前記抜け止め部材が、前記基板載置台を構成する材料の熱膨張率よりも大きな熱膨張率を有する材料からなる請求項１記載の熱処理装置。2. The heat treatment apparatus according to claim 1, wherein the retaining member is made of a material having a coefficient of thermal expansion larger than that of a material forming the substrate mounting table. 【請求項３】 前記抜け止め部材が、形状記憶材料からなり、加熱状態で前記基板支持部材と接触する形状に仕上げられた請求項１記載の熱処理装置。3. The heat treatment apparatus according to claim 1, wherein the retaining member is made of a shape memory material and is finished in a shape to be in contact with the substrate supporting member in a heated state. 【請求項４】 前記基板支持部材は、前記頭部から下方に伸び、前記孔に挿通自在な形状に仕上げられた胴部を備えており、温度上昇とともに前記抜け止め部材が変形して、前記胴部を締め付ける請求項１記載の熱処理装置。4. The su
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