Office Action 2: Notice of Allowance (2025-03-12)

CLAIMS:
Listing of Claims:

AMENDMENT TO THE CLAIMSThis listing of claims will replace all prior versions, and listings, of claims in the application:

1\. (Original) An electrostatic chuck, comprising:a ceramic dielectric substrate having a first major surface configured to have a process object placed thereon and a second major surface opposite to the first major surface;
a base plate having an upper surface and a lower surface, the upper surface being at the ceramic dielectric substrate side, the lower surface being opposite to the upper surface, the base plate supporting the ceramic dielectric substrate; and
a heater unit which heats the ceramic dielectric substrate,
the heater unit including a first heater element and a second heater element,
the first heater element being located between the first major surface and the upper surface,
the second heater element being located between the first major surface and the first heater element or between the first heater element and the upper surface,
the first heater element including a plurality of zones,
the plurality of zones of the first heater element including a first zone,
the first zone including a first heater line emitting heat by allowing a current to flow, and
a first power feeding portion and a second power feeding portion feeding power to the first heater line,
the first heater line including a plurality of extension portions extending along a first direction, the plurality of extension portions being arranged in a second direction perpendicular to the first direction, and
a plurality of protruding portions provided in the plurality of extension portions, the plurality of protruding portions protruding in the second direction,
the plurality of extension portions including a first extension portion and a second extension portion,

the plurality of protruding portions including a first protruding portion provided in the first extension portion, and
a second protruding portion provided in the second extension portion,
the first protruding portion protruding toward the second protruding portion, the second protruding portion protruding toward the first protruding portion,
the first zone including a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other,
the second heater element including a plurality of zones,
the plurality of zones of the second heater element including a second zone,
the second zone including a second heater line emitting heat by allowing a current to flow, and
a third power feeding portion and a fourth power feeding portion feeding power to the second heater line,
the second zone including a central region positioned at a center of the second zone when viewed along a Z- direction perpendicular to the first major surface, and
an outer peripheral region positioned outside the central region,
the first facing region being located at a position where the first facing region overlaps the central region in the Z-direction.
2\. (Currently Amended) The electrostatic chuck according to claim 1, wherein the plurality of zones of the first heater element is divided in a radial direction, and
the first direction is a circumferential direction.
3\. (Currently Amended) The electrostatic chuck according to claim 1, wherein the plurality of zones of the first heater element is divided in a radial direction, and
the first direction is the radial direction.
4\. (Currently Amended) The electrostatic chuck according to claim 1, wherein the plurality of extension portions further includes a third extension portion positioned between the first extension portion and the second extension portion in the second direction, and

the third extension portion is located at a position where the third extension portion does not overlap the first and second protruding portions in the second direction.
5\. (Currently Amended) The electrostatic chuck according to claim 1, wherein the plurality of protruding portions further includes a third protruding portion provided in the first extension portion,
the third protruding portion protrudes toward the second protruding portion, and
the third protruding portion is disposed so as to face the second protruding portion and to be adjacent to the second protruding portion.

6\. (Original) An electrostatic chuck, comprising:a ceramic dielectric substrate having a first major surface configured to have a process object placed thereon and a second major surface opposite to the first major surface;
a base plate having an upper surface and a lower surface, the upper surface being at the ceramic dielectric substrate side, the lower surface being opposite to the upper surface, the base plate supporting the ceramic dielectric substrate; and
a heater unit which heats the ceramic dielectric substrate,
the heater unit including a first heater element,
the first heater element being located between the first major surface and the upper surface,
the first heater element including a plurality of zones,
the plurality of zones of the first heater element including a first zone,
the first zone including a first heater line emitting heat by allowing a current to flow, and
a first power feeding portion and a second power feeding portion feeding power to the first heater line,
the first heater line including a plurality of extension portions extending along a first direction, the plurality of extension portions being arranged in a second direction perpendicular to the first direction, and
a plurality of protruding portions provided in the plurality of extension portions, the plurality of protruding portions protruding in the second direction,

the plurality of extension portions including a first extension portion and a second extension portion,
the plurality of protruding portions including a first protruding portion provided in the first extension portion, and
a second protruding portion provided in the second extension portion,
the first protruding portion protruding toward the second protruding portion, the second protruding portion protruding toward the first protruding portion,
the first zone including a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other,
the first zone including a central region positioned at a center of the first zone when viewed along a Z- direction perpendicular to the first major surface, and
an outer peripheral region positioned outside the central region when viewed along the Z-direction,
the first facing region being located in the central region.
7\. (Currently Amended) The electrostatic chuck according to claim 6, wherein the plurality of zones of the first heater element is divided in a radial direction, and
the first direction is a circumferential direction.
8\. (Currently Amended) The electrostatic chuck according to claim 6, wherein the plurality of zones of the first heater element is divided in a radial direction, and
the first direction is the radial direction.
9\. (Currently Amended) The electrostatic chuck according to claim 6, wherein the plurality of extension portions further includes a third extension portion positioned between the first extension portion and the second extension portion in the second direction, and
the third extension portion is located at a position where the third extension portion does not overlap the first and second protruding portions in the second direction.
10\. (Currently Amended) The electrostatic chuck according to claim 6, wherein

the plurality of protruding portions further includes a third protruding portion provided in the first extension portion,
the third protruding portion protrudes toward the second protruding portion, and
the third protruding portion is disposed so as to face the second protruding portion and to be adjacent to the second protruding portion.

11\. (Currently Amended) The electrostatic chuck according to claim 6, wherein the base plate further includes a coolant flow path for allowing a cooling medium to flow,the heater unit further includes:
a bypass layer that is a power feeding path to the first heater element; and
a first power feeding terminal and a second power feeding terminal electrically connected to the bypass layer,
the first power feeding portion is located at a position where the first power feeding portion does not overlap the first power feeding terminal in a Z-direction perpendicular to the first major surface,
the first power feeding portion is electrically connected to the first power feeding terminal via the bypass layer,
the second power feeding portion is located at a position where the second power feeding portion does not overlap the second power feeding terminal in the Z-direction,
the second power feeding portion is electrically connected to the second power feeding terminal via the bypass layer, and
the first facing region is located at a position where the first facing region overlaps at least one of the first power feeding terminal or the second power feeding terminal in the Z- direction.

12\. (Currently Amended) The electrostatic chuck according to claim 11, wherein the plurality of zones of the first heater element is divided in a radial direction, andthe first direction is a circumferential direction.

13\. (Currently Amended) The electrostatic chuck according to claim 11, wherein the plurality of zones of the first heater element is divided in a radial direction, and

the first direction is the radial direction.

14\. (Currently Amended) The electrostatic chuck according to claim 11, wherein the plurality of extension portions further includes a third extension portion positioned between the first extension portion and the second extension portion in the second direction, andthe third extension portion is located at a position where the third extension portion does not overlap the first and second protruding portions in the second direction.

15\. (Currently Amended) The electrostatic chuck according to claim 11, wherein the plurality of protruding portions further includes a third protruding portion provided in the first extension portion,the third protruding portion protrudes toward the second protruding portion, and
the third protruding portion is disposed so as to face the second protruding portion and to be adjacent to the second protruding portion.

16\. (Currently Amended) An electrostatic chuck, comprising:a ceramic dielectric substrate having a first major surface configured to have a process object placed thereon and a second major surface opposite to the first major surface;
a base plate having an upper surface, a lower surface, and a coolant flow path, the upper surface being at the ceramic dielectric substrate side, the lower surface being opposite to the upper surface, the coolant flow path allowing a cooling medium to flow, the base plate supporting the ceramic dielectric substrate; and
a heater unit which heats the ceramic dielectric substrate,
the heater unit including a first heater element,
a second heater element,
a bypass layer that is a power feeding path to the first and second heater elements, and a first power feeding terminal, a second power feeding terminal, a third power feeding terminal, and a fourth power feeding terminal electrically connected to the bypass layer,

the first heater element being located between the first major surface and the upper surface,
the second heater element being located between the first major surface and the first heater element or between the first heater element and the upper surface,
the first heater element including a plurality of zones,
the plurality of zones of the first heater element including a first zone,
the first zone including a first heater line emitting heat by allowing a current to flow, and
a first power feeding portion and a second power feeding portion feeding power to the first heater line,
the first power feeding portion being located at a position where the first power feeding portion does not overlap the first power feeding terminal in a Z-direction perpendicular to the first major surface,
the first power feeding portion being electrically connected to the first power feeding terminal via the bypass layer,
the second power feeding portion being located at a position where the second power feeding portion does not overlap the second power feeding terminal in the Z-direction,
the second power feeding portion being electrically connected to the second power feeding terminal via the bypass layer,
the second heater element including a plurality of zones,
the plurality of zones of the second heater element including a second zone,
the second zone including a second heater line emitting heat by allowing a current to flow, and
a third power feeding portion and a fourth power feeding portion feeding power to the second heater line,
the third power feeding portion being located at a position where the third power feeding portion does not overlap the third power feeding terminal in the Z-direction,
the third power feeding portion being electrically connected to the third power feeding terminal via the bypass layer,
the fourth power feeding portion being located at a position where the fourth power feeding portion does not overlap the fourth power feeding terminal in the Z-direction,

the fourth power feeding portion being electrically connected to the fourth power feeding terminal via the bypass layer,
at least one of the third power feeding terminal or the fourth power feeding terminal being located at a position where the at least one of the third power feeding terminal or the fourth power feeding terminal overlaps a virtual line segment in the Z-direction,
the virtual line segment being a straight line connecting a center of the first power feeding portion and a center of the second power feeding portion at a shortest distance.

17\. (Currently Amended) The electrostatic chuck according to claim 16, wherein at least one of a center of the third power feeding terminal or a center of the fourth power feeding terminal is located at a position where the at least one of the center of the third power feeding terminal or the center of the fourth power feeding terminal overlaps the virtual line segment.

18\. (Currently Amended) The electrostatic chuck according to claim 16, wherein the first zone includes a central region positioned at a center of the first zone when viewed along the Z- direction, andan outer peripheral region positioned outside the central region when viewed along the Z-direction, and
at least one of the first power feeding portion or the second power feeding portion is located in the central region.

19\. (Currently Amended) The electrostatic chuck according to claim 16, wherein the first zone includes an outer circumference edge of the first heater element,the first zone includes:
an inner circumference portion positioned radially inward of a center line of a radial direction, the center line of the radial direction bisecting the first zone in the radial direction; and
an outer circumference portion positioned radially outward of the center line of the radial direction, the outer circumference portion including the outer circumference edge, and

Docket No.: HAA-199-A at least one of the first power feeding portion or the second power feeding portion is located in the inner circumference portion.

OFFICE ACTION:
DETAILED ACTION
Notice of Pre-AIA  or AIA  Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Claims 1-19 are allowed.
Response to Arguments
Applicant’s arguments, see Remarks, filed 02/25/2025, with respect to independent claim 16 have been fully considered and are persuasive.  The previous rejection of claim 16 has been withdrawn. Applicant’s amendments overcome the prior art of record.
REASONS FOR ALLOWANCE
Claims 1-19 are allowed.
The following is an examiner’s statement of reasons for allowance:
Regarding claim 16, Uefuji (US 20180286732 A1) teaches an electrostatic chuck (e.g. electrostatic chuck 10) (fig.2B), comprising:
a ceramic dielectric substrate (i.e. ceramic dielectric substrate 100) (fig.2B) having a first major surface (i.e. first major surface 101) (fig.2B) configured to have a process object (i.e. processing object W) (fig.2A) placed thereon (e.g. W is placed on 101) (figs.2A and 2B) and a second major surface (i.e. second major surface 102) (fig.2B) opposite to the first major surface (e.g. 101 and 102 are opposite surfaces of 100) (fig.2B);
a base plate (i.e. base plate 300) (fig.2B) having an upper surface (e.g. surface of 300 adjacent to 200) (fig.2B), a lower surface (i.e. lower surface 303) (fig.2B), and a coolant flow path (i.e. passageway 301) (fig.2A), the upper surface being at the ceramic dielectric substrate side (e.g. upper surface of 300 is on the side of 100) (fig.2B), the lower surface being opposite to the upper surface (e.g. upper surface of 300 is opposite 303) (figs.2A and 2B), the coolant flow path allowing a cooling medium to flow ([0102], a cooling medium is caused to flow into the passageway 301), the base plate supporting the ceramic dielectric substrate ([0101], The base plate 300 is provided on the second major surface 102 side of the ceramic dielectric substrate 100 and supports the ceramic dielectric substrate 100); and
a heater unit (i.e. heater plate 200) (fig.2B and 5) which heats the ceramic dielectric substrate ([0099], heat that is transferred to the ceramic dielectric substrate 100 by the heater plate 200),
the heater unit including
a first heater element (e.g. first heater element 230a) (fig.5),
a second heater element (e.g. second heater element 230b) (fig.5),
a bypass layer (i.e. bypass layer 250) (fig.5) that is a power feeding path to the first and second heater elements ([0132], electrical coupling between the first heater element 230 a and the bypass layer 250 and the electrical coupling between the second heater element 230 b and the bypass layer 250), and
a first power feeding terminal (e.g. one of the 8 power supply terminals 280) (fig.5), a second power feeding terminal (e.g. one of the 8 power supply terminals 280) (fig.5), a third power feeding terminal (e.g. one of the 8 power supply terminals 280) (fig.5), and a fourth power feeding terminal (e.g. one of the 8 power supply terminals 280) (fig.5) electrically connected to the bypass layer ([0137], The power supply terminal 280 is electrically coupled to the bypass layer 250),
the first heater element being located between the first major surface and the upper surface (e.g. 230a is located between 101 and upper surface of 300) (figs.2B and 5),
the second heater element being located between the first major surface and the first heater element or between the first heater element and the upper surface (e.g. 230b is located between 230a and upper surface of 300),
the first heater element including a plurality of zones (e.g. zones like region B3) (fig.7A),
the plurality of zones of the first heater element including
a first zone (e.g. zone comprising 230a) (fig.7B), the first zone including a first heater line (e.g. first heater line 239a) (fig.7B) emitting heat by allowing a current to flow ([0153], The length of the first heater element 230 a is the length of the path in which the current flows from the portion Ain where the current enters the first heater element 230 a to the portion Aout where the current exits from the first heater element 230 a), and
a first power feeding portion (e.g. portion of 230a where C4 is input) (fig.5) and a second power feeding portion (e.g. portion of 230a where C6 is output) (fig.5) feeding power to the first heater line ([0139], current flows from the power supply terminals 280 toward the bypass layer 250. As illustrated by arrow C3 and arrow C4),
the first power feeding portion being located at a position (e.g. position on 230a where C4 flows in) (fig.5) where the first power feeding portion does not overlap the first power feeding terminal in a Z-direction perpendicular to the first major surface (e.g. position of 280 where C1 originates does not overlap with position on 230a where C4 is input) (fig.5), the first power feeding portion being electrically connected to the first power feeding terminal via the bypass layer (e.g. connection as established by current flow from C1-C9) (fig.5),
the second power feeding portion being located at a position (e.g. position on 230a where C6 flows out) (fig.5) where the second power feeding portion does not overlap the second power feeding terminal in the Z-direction (e.g. position of 280 where C9 exits does not overlap with position on 230a where C6 is output) (fig.5), the second power feeding portion being electrically connected to the second power feeding terminal via the bypass layer (e.g. connection as established by current flow from C1-C9) (fig.5),
the second heater element including a plurality of zones (e.g. zones like region B3) (fig.7A),
the plurality of zones of the second heater element including
a second zone (e.g. zone comprising 230b) (fig.7B), the second zone including
a second heater line (e.g. first heater line 239b) (fig.7B) emitting heat by allowing a current to flow ([0157], the electrical resistance of the second heater element 230 b is the electrical resistance between the portion Bin where the current enters the second heater element 230 b and the portion Bout where the current exits from the second heater element 230 b), and
a third power feeding portion (e.g. portion of 230b where C4 is input) (fig.5) and a fourth power feeding portion (e.g. portion of 230b where C6 is output) (fig.5) feeding power to the second heater line ([0139], current flows from the power supply terminals 280 toward the bypass layer 250. As illustrated by arrow C3 and arrow C4),
the third power feeding portion being located at a position (e.g. position on 230a where C4 flows in) (fig.5) where the third power feeding portion does not overlap the third power feeding terminal in the Z-direction (e.g. position of 280 where C11 originates does not overlap with position on 230b where C4 is input) (fig.5), the third power feeding portion being electrically connected to the third power feeding terminal via the bypass layer (e.g. connection as established by current flow from C11-C19) (fig.5),
the fourth power feeding portion being located at a position (e.g. position on 230b where C6 flows out) (fig.5) where the fourth power feeding portion does not overlap the fourth power feeding terminal in the Z-direction (e.g. position of 280 where C19 exits does not overlap with position on 230b where C6 is output) (fig.5), the fourth power feeding portion being electrically connected to the fourth power feeding terminal via the bypass layer (e.g. connection as established by current flow from C11-C19) (fig.5),
at least one of the third power feeding terminal or the fourth power feeding terminal being located at a position (e.g. position of 280 where C19 exits) (fig.5) where the at least one of the third power feeding terminal or the fourth power feeding terminal overlaps (e.g. draw a virtual line from 280 where C19 exits towards 230b. An overlap can be seen in the position of 280) (fig.5) a virtual line segment (e.g. virtual line between the Bin and Bout positions) (fig.5) in the Z-direction (e.g. overlap is in up-down direction) (fig.5), the virtual line segment connecting a center of the first power feeding portion (e.g. center of portion of 230b where Bin occurs) (fig.5) and a center of the second power feeding portion (e.g. center of portion of 230b where Bout occurs) (fig.5).
Uefuji does not teach, the virtual line segment being a straight line connecting a center of the first power feeding portion and a center of the second power feeding portion at a shortest distance.
Prior art Vellanki (US 20230010049 A1) fig.4, Miwa (US 20210090930 A1) fig.5, Miwa2 (US 20210007183 A1) fig.6, Kanno (US 20060291132 A1) fig.3 and Kim (US 10224228 B2) fig.6 are found to be the closest prior art.
However, none of the prior art, taken singly or in combination, teach “the virtual line segment being a straight line connecting a center of the first power feeding portion and a center of the second power feeding portion at a shortest distance.”
Claims 17-19 are allowed, as they depend on allowed claim 16.
Regarding claim 1, Uefuji (US20180286732A1) substantially teach the claim limitations as indicated in claim 16. Uefuji does not teach, the first heater line including a plurality of extension portions extending along a first direction, the plurality of extension portions being arranged in a second direction perpendicular to the first direction, and a plurality of protruding portions provided in the plurality of extension portions, the plurality of protruding portions protruding in the second direction, the plurality of extension portions including a first extension portion and a second extension portion, the plurality of protruding portions including a first protruding portion provided in the first extension portion, and a second protruding portion provided in the second extension portion, the first protruding portion protruding toward the second protruding portion, the second protruding portion protruding toward the first protruding portion, the first zone including a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other.
Prior art Vellanki (US 20230010049 A1) fig.4, Miwa (US 20210090930 A1) fig.5, Miwa2 (US 20210007183 A1) fig.6, Kanno (US 20060291132 A1) fig.3 and Kim (US 10224228 B2) fig.6 are found to be the closest prior art.
However, none of the prior art, taken singly or in combination, teach “the first heater line including a plurality of extension portions extending along a first direction, the plurality of extension portions being arranged in a second direction perpendicular to the first direction, and a plurality of protruding portions provided in the plurality of extension portions, the plurality of protruding portions protruding in the second direction, the plurality of extension portions including a first extension portion and a second extension portion, the plurality of protruding portions including a first protruding portion provided in the first extension portion, and a second protruding portion provided in the second extension portion, the first protruding portion protruding toward the second protruding portion, the second protruding portion protruding toward the first protruding portion, the first zone including a first facing region in which the first protruding portion and the second protruding portion are disposed so as to face and be adjacent to each other”.
Regarding claims 2-5, they are allowed as they depend on allowed claim 1.
Regarding claim 6, it is allowed for the same reasons as indicated in claim 1.
Regarding claims 7-15, they are allowed as they depend on allowed claim 6.
Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee.  Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.”
Conclusion

APPLICANT REBUTTAL: REMARKS
Claims 1-19 are pending in the current application, of which claims 1, 6 and 16 are
independent. Claims 2-5 and 7-19 are amended by the present Amendment-A. No new matter is
introduced by this Amendment-A.
The above-identified Office Action has been reviewed, the references carefully
considered, and the Examiner's comments carefully weighed. In view thereof, the present Amendment-A is submitted. It is contended that by the present Amendment-A, all bases of objections and rejection set forth in the Office Action have been traversed and overcome. Accordingly, reconsideration and withdrawal of the rejection is respectfully requested.
Applicant thanks the Examiner for carefully reviewing the present application, including the claims, and for specifically acknowledging that the drawings filed with the application are accepted and that all certified copies of the priority documents have been received by the US
PTO.
While this paper is believed to completely address all pending rejections, Applicant
reserves the right to set forth other reasons supporting the patentability of the claims, including reasons supporting the separate patentability of dependent claims not explicitly addressed herein, in future papers. Further, as Applicant's remarks with respect to the Examiner's rejections are believed to be sufficient to overcome any rejections, Applicant's silence as to assertions by the Examiner in the Office Action is not a concession by Applicant that such assertions are accurate, and Applicant reserves the right to analyze and dispute such assertions in the future.
Allowable Sub
j
ect Matter
Applicant thanks the Examiner for allowing claims 1-15 and for indicating that dependent claim 17 is objected to because it depends from a rejected base claim, but that it would be allowable if rewritten in independent form, including the limitations of the base claim and any intervening claims.
While applicant has not rewritten claim 17 in independent form, applicant has amended independent claim 16 from which claim 17 depends in a manner which is believed to render claim 16 allowable, while claim 17 remains dependent from claim 16.
Amendments to the Claims
The Title is amended to be more clearly descriptive of the claimed invention.
Claims 2-5, 7-15 and 17-19 have been amended by changing the preamble language "The chuck" to --- The
electrostatic
chuck --- for consistency, and to overcome the Examiner's objection to these claims.
Independent claim 16 has been amended to by changing the last paragraph thereof to read
--- the virtual line segment
being a straight line
connecting a center of the first power feeding portion and a center of the second power feeding portion
at a shortest distance
---.
Also, the paragraph bridging pages 71 and 72 of the Specification is amended to provide an express antecedent basis for the amended language of claim 16.
The amended language is fully supported by the original disclosure, including FIGS. 17 and 18 and the discussion in the specification of the virtual line in these drawings. See the annotated version of FIG. 17 below.
segment VLS is aFIG. 17
straight line.
The virtual line segment VLS connects first and second power feeding portions at the shortest distance.
Support for the above amendments may be found in the specification, claims, abstract, and drawings of the specification of the application, as originally filed. No subject matter has been disclaimed or abandoned and the amendment of certain claims is not to be construed as a dedication to the public of any of the subject matter of the claims as previously presented. Applicant respectfully submits that no new matter has been entered through these amendments, and entry of the amendment is respectfully requested.
Title Objection
At item 5 of the Office Action the Examiner objects to the Title as not being sufficiently descriptive of the claimed invention, and requires the Title to be amended to be clearly indicative of the claimed invention.
Applicant's Response
Applicant has amended the Title herein to be clearly indicative of the claimed invention, and correspondingly it is respectfully requested that the objection be reconsidered and withdrawn.
Claim Objections
At item 6 of the Office Action the Examiner objects to claims 2-5, 7-15 and 17-19 because the preamble language of these claims, including "The chuck" should be changed to --- The
electrostatic
chuck --- for consistency with the preambles of the independent claims, and the Examiner requires the these changes to be made.
Applicant's Response
Applicant has amended the preamble language of claims 2-5, 7-15 and 17-19 to --- The
electrostatic
chuck ---, and correspondingly it is respectfully requested that the objection be reconsidered and withdrawn.
Rej
ections under 35 U.S.C.
2(a
)/(a)(2
)
At item of the Office Action the Examiner rejects claims 16, 18 and 19 under 35 U.S.C. §§102(a)(1)/(a)(2) as being anticipated by Uefuji et al. US 2018/0286732 AL. It is the Examiner's position that Uefuji discloses all of the features required by the rejected claims, and the Examiner refers to specific components, Figs. and paragraphs of Uefuji's disclosure which the Examiner deems to read on each of the claimed features.
Applicant's Response
Upon careful consideration of the rejection and the disclosure of the Uefuji reference, and in light of the above modifications to claim 16, applicant respectfully submits that the rejection is overcome because claim 16 now defines subject matter which is not disclosed or reasonably suggested by the Uefuji reference.
For example, the last paragraph of claim 16 is amended herein to now recite --- the
virtual line segment
being a straight line
connecting a center of the first power feeding portion and a center of the second power feeding portion
at a shortest distance
---, which is supported by the structure of the exemplary 4th and 5* embodiments of the present invention as shown in FIGS. 17 and 18.
This arrangement is advantageous for reasons discussed at pages 70-76 of the application as filed. For example, it is discussed that the temperature unevenness can be canceled by providing the third power feeding terminal 283 and the fourth power feeding terminal 284, i.e., the hotspots, between the first power feeding portion 831 and the second power feeding portion 832, i.e., the cool spots. Accordingly, the uniformity of the in-plane temperature distribution of the process object W can be increased while suppressing complex temperature control.
The electrostatic chuck structure disclosed in the Uefuji reference does not include or
reasonably suggest such structure of the present claim 16. In Fig. 5 of Uefuji, "Ain" and "Aout" of the first heater element 230a corresponds to "the first power feeding portion" and "the second power feeding portion" of the present application, as understood by persons skilled in the art.
That is, the virtual line segment in Uefuji is shown below.
virtual line segment
ding terminal
fourth power feeding terminal
As also reflected in Fig. 5 of Uefuji, persons skill in the art will understand that two of the power supply terminals 280, i.e., "power supply terminal 280 connecting the second heater element 230b" and "power supply terminal 280 connecting the second heater element 230b" correspond to "the third power feeding terminal" and "the fourth power feeding terminal" of the present application.
From Fig. 5 of Uefuji, such persons will also recognize that such "power supply terminal 280 connecting the second heater element 230b" and "power supply terminal 280 connecting the second heater element 230b" do not overlap a virtual line segment between "Ain" and "Aout". That is, Uefuji does not disclose or reasonably suggest the presently claimed features that " at
least one of the third power feeding terminal or the fourth power feeding terminal being located at a position where the at least one of the third power feeding terminal or the fourth power feeding terminal overlaps a virtual line segment in the Z-direction, the virtual line segment connecting a center of the first power feeding portion and a center of the second power feeding portion in a straight line at the shortest distance."
Based on the foregoing, Applicant respectfully submits that the rejection of claims 16, 18 and 19 based on the Uefuji reference is overcome in relation to present claims 16, 18 and 19. Correspondingly, withdrawal of the rejection and a timely notice of allowance are respectfully requested.
Other Matters
The additional references cited by the Examiner, which are listed on the Form PTO-892 included with the Office Action have been considered by the applicant, but it is respectfully submitted that each of the present claims patentably distinguishes over all of the references of record, whether considered singly or in combination.
Conclusion


CITED REFERENCE SUMMARIES: Ref US20180286732A1: Claims:
An electrostatic chuck, comprising: a ceramic dielectric substrate having a first major surface where a processing object is placed; an electrode layer provided in the ceramic dielectric substrate; a base plate supporting the ceramic dielectric substrate; and a heater plate provided between the base plate and the first major surface, the heater plate including a first heater element emitting heat due to a current flowing, and a second heater element emitting heat due to a current flowing, when viewed along a direction perpendicular to the first major surface, bends of the first heater element being more than bends of the second heater element, and the first heater element including a portion positioned at a gap of the second heater element.
a ceramic dielectric substrate having a first major surface where a processing object is placed;
an electrode layer provided in the ceramic dielectric substrate;
a base plate supporting the ceramic dielectric substrate; and
a heater plate provided between the base plate and the first major surface,
the heater plate including a first heater element emitting heat due to a current flowing, and a second heater element emitting heat due to a current flowing,
a first heater element emitting heat due to a current flowing, and
a second heater element emitting heat due to a current flowing,
when viewed along a direction perpendicular to the first major surface, bends of the first heater element being more than bends of the second heater element, and the first heater element including a portion positioned at a gap of the second heater element.
The chuck according to claim 1 , wherein the heater plate includes a plurality of first heater regions and a plurality of second heater regions, the first heater element includes a plurality of first heater electrodes provided independently from each other in the plurality of first heater regions, the second heater element includes a plurality of second heater electrodes provided independently from each other in the plurality of second heater regions, and the number of the first heater regions is larger than the number of the second heater regions.
the heater plate includes a plurality of first heater regions and a plurality of second heater regions,
the first heater element includes a plurality of first heater electrodes provided independently from each other in the plurality of first heater regions,
the second heater element includes a plurality of second heater electrodes provided independently from each other in the plurality of second heater regions, and
the number of the first heater regions is larger than the number of the second heater regions.
The chuck according to claim 2 , wherein an electrical resistance of the first heater electrode is higher than an electrical resistance of the second heater electrode.
The chuck according to claim 1 , wherein the second heater element includes a connection region where an electrically conductive body is connected, the electrically conductive body supplying electrical power to the second heater element, and at least a portion of the first heater element overlaps the connection region when viewed along a direction perpendicular to the first major surface.
the second heater element includes a connection region where an electrically conductive body is connected, the electrically conductive body supplying electrical power to the second heater element, and
at least a portion of the first heater element overlaps the connection region when viewed along a direction perpendicular to the first major surface.
The chuck according to claim 2 , wherein the heater plate further includes a bypass layer electrically connected to at least one of the first heater element or the second heater element, the bypass layer being electrically conductive.
The chuck according to claim 5 , wherein the bypass layer is electrically connected to both the first heater element and the second heater element.
The chuck according to claim 5 , wherein the bypass layer includes a plurality of bypass portions, and the number of the bypass portions electrically connected to the first heater element is not more than 2 times the number of the first heater regions.
the bypass layer includes a plurality of bypass portions, and
the number of the bypass portions electrically connected to the first heater element is not more than 2 times the number of the first heater regions.
The chuck according to claim 2 , wherein the first heater electrode is not provided in one of the plurality of first heater regions.
The chuck according to claim 2 , wherein the first heater electrode is not provided in one of the plurality of first heater regions, the heater plate includes an electrically conductive portion provided in the first heater region where the first heater electrode is not provided, and the electrically conductive portion is not supplied with power from the outside.
the first heater electrode is not provided in one of the plurality of first heater regions,
the heater plate includes an electrically conductive portion provided in the first heater region where the first heater electrode is not provided, and
the electrically conductive portion is not supplied with power from the outside.
The chuck according to claim 1 , wherein the heater plate further includes a third heater element emitting heat due to a current flowing, the third heater element is provided in a layer different from a layer where the first heater element is provided and different from a layer where the second heater element is provided, and when viewed along the direction perpendicular to the first major surface, bends of the third heater element are more than the bends of the second heater element, and the third heater element includes a portion positioned at a gap of the second heater element.
the heater plate further includes a third heater element emitting heat due to a current flowing,
the third heater element is provided in a layer different from a layer where the first heater element is provided and different from a layer where the second heater element is provided, and
when viewed along the direction perpendicular to the first major surface, bends of the third heater element are more than the bends of the second heater element, and the third heater element includes a portion positioned at a gap of the second heater element.
The chuck according to claim 1 , wherein the first heater element is provided between the first major surface and the second heater element.
The chuck according to claim 1 , wherein the heater plate further includes at least one of a first support plate or a second support plate, the first support plate is provided on the first heater element and the second heater element, the second support plate is provided under the first heater element and the second heater element, a thermal conductivity of the first support plate is higher than a thermal conductivity of the first heater element and higher than a thermal conductivity of the second heater element, and a thermal conductivity of the second support plate is higher than the thermal conductivity of the first heater element and higher than the thermal conductivity of the second heater element.
the heater plate further includes at least one of a first support plate or a second support plate,
the first support plate is provided on the first heater element and the second heater element,
the second support plate is provided under the first heater element and the second heater element,
a thermal conductivity of the first support plate is higher than a thermal conductivity of the first heater element and higher than a thermal conductivity of the second heater element, and
a thermal conductivity of the second support plate is higher than the thermal conductivity of the first heater element and higher than the thermal conductivity of the second heater element.
The chuck according to claim 12 , wherein at least one of the first support plate or the second support plate has multiple types of recesses having mutually-different depths.
The chuck according to claim 1 , wherein the first heater element includes a first connection portion, an electrically conductive body being connected to the first connection portion and supplying electrical power to the first heater element, the second heater element includes a second connection portion, an electrically conductive body being connected to the second connection portion and supplying electrical power to the second heater element, and a width of the first connection portion is narrower than a width of the second connection portion.
the first heater element includes a first connection portion, an electrically conductive body being connected to the first connection portion and supplying electrical power to the first heater element,
the second heater element includes a second connection portion, an electrically conductive body being connected to the second connection portion and supplying electrical power to the second heater element, and
a width of the first connection portion is narrower than a width of the second connection portion.
The chuck according to claim 1 , further comprising a power supply terminal supplying electrical power to the heater plate and being provided from the heater plate toward the base plate, the power supply terminal including: a connection member connected to a socket, the socket supplying the electrical power from the outside; a conducting lead portion finer than the connection member; a supporter connected to the conducting lead portion; and a coupling portion connected to the supporter and coupled to at least one of the first heater element or the second heater element, the power supply terminal supplying the electrical power to the at least one of the first heater element or the second heater element.
the power supply terminal including: a connection member connected to a socket, the socket supplying the electrical power from the outside; a conducting lead portion finer than the connection member; a supporter connected to the conducting lead portion; and a coupling portion connected to the supporter and coupled to at least one of the first heater element or the second heater element,
a connection member connected to a socket, the socket supplying the electrical power from the outside;
a conducting lead portion finer than the connection member;
a supporter connected to the conducting lead portion; and
a coupling portion connected to the supporter and coupled to at least one of the first heater element or the second heater element,
the power supply terminal supplying the electrical power to the at least one of the first heater element or the second heater element.
The chuck according to claim 1 , further comprising a power supply terminal supplying electrical power to the heater plate and being provided in the base plate, the power supply terminal including: a power supply portion connected to a socket, the socket supplying the electrical power from the outside; and a terminal portion connected to the power supply portion and pressed onto at least one of the first heater element or the second heater element.
the power supply terminal including: a power supply portion connected to a socket, the socket supplying the electrical power from the outside; and a terminal portion connected to the power supply portion and pressed onto at least one of the first heater element or the second heater element.
a power supply portion connected to a socket, the socket supplying the electrical power from the outside; and
a terminal portion connected to the power supply portion and pressed onto at least one of the first heater element or the second heater element.
The chuck according to claim 1 , further comprising: a first power supply terminal supplying electrical power to the heater plate and being provided in the base plate; and a second power supply terminal supplying electrical power to the heater plate and being provided from the heater plate toward the base plate, the first power supply terminal including a power supply portion connected to a socket, the socket supplying the electrical power from the outside, and a terminal portion connected to the power supply portion and pressed onto the first heater element, the first power supply terminal supplying the electrical power to the first heater element, the second power supply terminal including a connection member connected to a socket, the socket supplying the electrical power from the outside, a conducting lead portion finer than the connection member, a supporter connected to the conducting lead portion, and a coupling portion connected to the supporter and coupled to the second heater element, the second power supply terminal supplying the electrical power to the second heater element.
a first power supply terminal supplying electrical power to the heater plate and being provided in the base plate; and
a second power supply terminal supplying electrical power to the heater plate and being provided from the heater plate toward the base plate,
the first power supply terminal including a power supply portion connected to a socket, the socket supplying the electrical power from the outside, and a terminal portion connected to the power supply portion and pressed onto the first heater element,
a power supply portion connected to a socket, the socket supplying the electrical power from the outside, and
a terminal portion connected to the power supply portion and pressed onto the first heater element,
the first power supply terminal supplying the electrical power to the first heater element,
the second power supply terminal including a connection member connected to a socket, the socket supplying the electrical power from the outside, a conducting lead portion finer than the connection member, a supporter connected to the conducting lead portion, and a coupling portion connected to the supporter and coupled to the second heater element,
a connection member connected to a socket, the socket supplying the electrical power from the outside,
a conducting lead portion finer than the connection member,
a supporter connected to the conducting lead portion, and
a coupling portion connected to the supporter and coupled to the second heater element,
the second power supply terminal supplying the electrical power to the second heater element.
The chuck according to claim 5 , further comprising a power supply terminal supplying electrical power to the heater plate and being provided from the heater plate toward the base plate, the power supply terminal including: a connection member connected to a socket, the socket supplying the electrical power from the outside; a conducting lead portion finer than the connection member; a supporter connected to the conducting lead portion; and a coupling portion connected to the supporter and coupled to the bypass layer, the power supply terminal supplying the electrical power via the bypass layer to at least one of the first heater element or the second heater element.
the power supply terminal including: a connection member connected to a socket, the socket supplying the electrical power from the outside; a conducting lead portion finer than the connection member; a supporter connected to the conducting lead portion; and a coupling portion connected to the supporter and coupled to the bypass layer,
a coupling portion connected to the supporter and coupled to the bypass layer,
the power supply terminal supplying the electrical power via the bypass layer to at least one of the first heater element or the second heater element.
The chuck according to claim 5 , further comprising a power supply terminal supplying electrical power to the heater plate and being provided in the base plate, the power supply terminal including: a power supply portion connected to a socket, the socket supplying the electrical power from the outside; and a terminal portion connected to the power supply portion and pressed onto the bypass layer.
the power supply terminal including: a power supply portion connected to a socket, the socket supplying the electrical power from the outside; and a terminal portion connected to the power supply portion and pressed onto the bypass layer.
a terminal portion connected to the power supply portion and pressed onto the bypass layer.
The chuck according to claim 5 , further comprising: a first power supply terminal supplying electrical power to the heater plate and being provided in the base plate; and a second power supply terminal supplying electrical power to the heater plate and being provided from the heater plate toward the base plate, the first power supply terminal including a power supply portion connected to a socket, the socket supplying the electrical power from the outside, and a terminal portion connected to the power supply portion and pressed onto the bypass layer, the first power supply terminal supplying the electrical power to the first heater element, the second power supply terminal including a connection member connected to a socket, the socket supplying the electrical power from the outside, a conducting lead portion finer than the connection member, a supporter connected to the conducting lead portion, and a coupling portion connected to the supporter and coupled to the bypass layer, the second power supply terminal supplying the electrical power via the bypass layer to the second heater element.
the first power supply terminal including a power supply portion connected to a socket, the socket supplying the electrical power from the outside, and a terminal portion connected to the power supply portion and pressed onto the bypass layer,
a terminal portion connected to the power supply portion and pressed onto the bypass layer,
the second power supply terminal including a connection member connected to a socket, the socket supplying the electrical power from the outside, a conducting lead portion finer than the connection member, a supporter connected to the conducting lead portion, and a coupling portion connected to the supporter and coupled to the bypass layer,
the second power supply terminal supplying the electrical power via the bypass layer to the second heater element.
Ref US20230010049A1: Claims:
An apparatus for semiconductor processing, the apparatus comprising: a pedestal having: a heating element; and a top plate; wherein: the top plate includes: a substrate support surface configured to support a semiconductor wafer when the semiconductor wafer is placed on the pedestal; one or more vacuum grooves located within a center region of the pedestal, each vacuum groove extending up to the substrate support surface and having an outer edge, wherein a center axis of the top plate passes through the center region; a gas groove that extends around the center region of the pedestal and has an inner edge and an outer edge; and a recessed region having one or more recessed surfaces and an inner perimeter positioned between the center region and the inner edge of the gas groove, âwherein the one or more recessed surfaces are each offset along the center axis from a reference plane coincident with the substrate support surface so that there is a gap between the one or more recessed surfaces and the reference plane, and âwherein, for each vacuum groove of the one or more vacuum grooves, the portion of the outer edge of the vacuum groove that is closest to the inner perimeter is separated from the inner perimeter by at least a corresponding first distance D 1 and separated from the closest portion of the gas groove by at least a corresponding second distance D 2 .
a pedestal having: a heating element; and a top plate; wherein: the top plate includes: a substrate support surface configured to support a semiconductor wafer when the semiconductor wafer is placed on the pedestal; one or more vacuum grooves located within a center r
[Truncated to input limit]