Plasma techniques for film deposition /
Konuma, Mitsuharu,1950-
Konuma, Mitsuharu,1950-Film deposition by plasma techniques.
Harrow : Alpha Science International,
c2005.
"[Originally published in 1992 as] Film deposition by plasma techniques, Springer-Verlag ... Some of the contents, especially the first half ... is based upon the old book ... however, many parts of the text and figures have been completely updated and revised"--Pref.
Includes bibliographical references (p. 273-323) and index.
Plasma-enhanced chemical vapor deposition.
Thin films.