Comprendre et maîtriser le passage de type I à type II de puits quantiques d'In(x)Ga(1-x)As(y)Sb(1-y) sur substrat de GaSb

Antimonide-based semiconductors are promising in the development of optoelectronic devices considering that the high electron mobility, the possibility to emit or absorb light for a large number of wavelengths in the infrared region and the change in recombination type for confined heterostructure make them a prime subject of research. A good number of publications are aimed at developing devices based on In(x)Ga(1-x)As(y)Sb(1-y) alloys to emit or detect a specific wavelength without giving much information about the composition determination or the band alignment. There are only a few fundamental studies about the incorporation of indium and none about the incorporation of arsenic tetramers by molecular beam epitaxy. Also, the values of the band offsets between binary compounds forming the In(x)Ga(1-x)As(y)Sb(1-y) alloys diverge and the methods used to do so are sometimes arbitrary.  A model was constructed and predicts the band alignment between In(x)Ga(1-x)As(y)Sb(1-y) alloys and GaSb for any values of x and y. This model considers thermal effects, strain and confinement for quantum wells. Therefore, it is possible to predict the type of recombination for any composition.  Indium atoms tend to segregate on the surface while the growth of In(x)Ga(1-x)Sb on GaSb is taking place by molecular beam epitaxy. This behavior has already been seen before and the work presented here corroborates this observation. It is possible to build up a thin layer of indium on the surface prior to the growth of the alloy to avoid a change of composition in the layer. The thickness of this layer is dependent on the temperature of the substrate and can be evaluated with a simple model of segregation. In the case of a quantum well, there will be another interface where the indium floating on the surface will incorporate. To avoid the formation of a long gradient of composition at this interface, it is recommended to grow a few monolayers of GaSb at low temperature without a growth interruption. This way, the indium will incorporate rapidly and leave a sharp interface.  The ratio between the indium beam equivalent pressure and the beam equivalent pressure of indium and gallium gives the nominal composition and is the same as the measured composition by XRD in the alloy. The incorporation of arsenic tetramers is not as straightforward in In(x)Ga(1-x)As(y)Sb(1-y) alloys and is shown to decrease when the V/III ratio is increased as measured by XRD. A simple kinetic model explained that this behavior is caused by antimony occupying a large fraction of the surface. The dissociation of tetramers into dimers is a reaction of second order and the tetramers occupy two sites on the surface and makes the incorporation a slower process. Therefore, the use of arsenic tetramers is not the best choice for a good control on the arsenic composition in the layer.  In(x)Ga(1-x)As(y)Sb(1-y) quantum wells were grown on GaSb and were optically characterized to observe the transition of type I recombination to type II. This transition could not be corroborated because all the measurements showed an unknown transition related to the GaSb buffer layer. The origin of this optical signature could not be identified, but may be related to a contaminant in the gallium cell. Identifying the source of this problem and solving it will be essential to go further and observe the transition of type I to type II.

Keyphrases: GaSb, Antimonide, band alignment, epitaxy, quantum well, segregation, spectroscopy, x-ray diffraction