human: Given a node-centered hypergraph: <hypergraph>, where nodes represent papers and hyperedges represent sets of papers co-cited by a source paper.

Details of the hypergraph:
Center node: "triad a triple patterning lithography aware detailed router"
  Abstract: TPL-friendly detailed routers require a systematic approach to detect TPL conflicts. However, the complexity of conflict graph (CG) impedes directly detecting TPL conflicts in CG. This work proposes a token graph-embedded conflict graph (TECG) to facilitate the TPL conflict detection while maintaining high coloring-flexibility. We then develop a TPL aware detailed router (TRIAD) by applying TECG to a gridless router with the TPL stitch generation. Compared to a greedy coloring approach, experimental results indicate that TRIAD generates no conflicts and few stitches with shorter wirelength at the cost of 2.41× of runtime.

Connected through hyperedge HE-1 (induced by source paper "methodology for standard cell compliance and detailed placement for triple patterning lithography"):
  with members:
    - "a high performance triple patterning layout decomposer with balanced density"
    - "self aligned double patterning friendly configuration for standard cell library considering placement impact"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-2 (induced by source paper "a high performance triple patterning layout decomposer with balanced density"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-3 (induced by source paper "triple patterning lithography tpl layout decomposition using end cutting"):
  with members:
    - "layout decomposition for quadruple patterning lithography and beyond"
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "l shape based layout fracturing for e beam lithography"
    - "layout decomposition for double patterning lithography"

Question: Please tell me which class the center node belongs to. The 40 classes are: cs.NA(Numerical Analysis), cs.MM(Multimedia), cs.LO(Logic in Computer Science), cs.CY(Computers and Society), cs.CR(Cryptography and Security), cs.DC(Distributed, Parallel, and Cluster Computing), cs.HC(Human-Computer Interaction), cs.CE(Computational Engineering, Finance, and Science), cs.NI(Networking and Internet Architecture), cs.CC(Computational Complexity), cs.AI(Artificial Intelligence), cs.MA(Multiagent Systems), cs.GL(General Literature), cs.NE(Neural and Evolutionary Computing), cs.SC(Symbolic Computation), cs.AR(Hardware Architecture), cs.CV(Computer Vision and Pattern Recognition), cs.GR(Graphics), cs.ET(Emerging Technologies), cs.SY(Systems and Control), cs.CG(Computational Geometry), cs.OH(Other Computer Science), cs.PL(Programming Languages), cs.SE(Software Engineering), cs.LG(Machine Learning), cs.SD(Sound), cs.SI(Social and Information Networks), cs.RO(Robotics), cs.IT(Information Theory), cs.PF(Performance), cs.CL(Computation and Language), cs.IR(Information Retrieval), cs.MS(Mathematical Software), cs.FL(Formal Languages and Automata Theory), cs.DS(Data Structures and Algorithms), cs.OS(Operating Systems), cs.GT(Computer Science and Game Theory), cs.DB(Databases), cs.DL(Digital Libraries), cs.DM(Discrete Mathematics). Directly output the class name.

gpt: cs.AR(Hardware Architecture)