human: Given a node-centered hypergraph: <hypergraph>, where nodes represent papers and hyperedges represent sets of papers co-cited by a source paper.

Details of the hypergraph:
Center node: "triple patterning lithography tpl layout decomposition using end cutting"
  Abstract: Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. However, traditional LELELE type TPL technology suers from native conict and overlapping problems. Recently LELEEC process was proposed to overcome the limitations, where the third mask is used to generate the end-cuts. In this paper we propose the rst study for LELEEC layout decomposition. Conict graphs and endcut graphs are constructed to extract all the geometrical relationships of input layout and end-cut candidates. Based on these graphs, integer linear programming (ILP) is formulated to minimize the conict number and the stitch number.

Connected through hyperedge HE-1 (induced by source paper "openmpl an open source layout decomposer"):
  with members:
    - "layout decomposition for quadruple patterning lithography and beyond"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-2 (induced by source paper "layout decomposition for quadruple patterning lithography and beyond"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "layout decomposition for double patterning lithography"
    - "approximate graph coloring by semidefinite programming"

Connected through hyperedge HE-3 (induced by source paper "methodology for standard cell compliance and detailed placement for triple patterning lithography"):
  with members:
    - "a high performance triple patterning layout decomposer with balanced density"
    - "self aligned double patterning friendly configuration for standard cell library considering placement impact"
    - "triad a triple patterning lithography aware detailed router"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-4 (induced by source paper "a high performance triple patterning layout decomposer with balanced density"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "triad a triple patterning lithography aware detailed router"
    - "layout decomposition for double patterning lithography"

Question: Please tell me which class the center node belongs to. The 40 classes are: cs.NA(Numerical Analysis), cs.MM(Multimedia), cs.LO(Logic in Computer Science), cs.CY(Computers and Society), cs.CR(Cryptography and Security), cs.DC(Distributed, Parallel, and Cluster Computing), cs.HC(Human-Computer Interaction), cs.CE(Computational Engineering, Finance, and Science), cs.NI(Networking and Internet Architecture), cs.CC(Computational Complexity), cs.AI(Artificial Intelligence), cs.MA(Multiagent Systems), cs.GL(General Literature), cs.NE(Neural and Evolutionary Computing), cs.SC(Symbolic Computation), cs.AR(Hardware Architecture), cs.CV(Computer Vision and Pattern Recognition), cs.GR(Graphics), cs.ET(Emerging Technologies), cs.SY(Systems and Control), cs.CG(Computational Geometry), cs.OH(Other Computer Science), cs.PL(Programming Languages), cs.SE(Software Engineering), cs.LG(Machine Learning), cs.SD(Sound), cs.SI(Social and Information Networks), cs.RO(Robotics), cs.IT(Information Theory), cs.PF(Performance), cs.CL(Computation and Language), cs.IR(Information Retrieval), cs.MS(Mathematical Software), cs.FL(Formal Languages and Automata Theory), cs.DS(Data Structures and Algorithms), cs.OS(Operating Systems), cs.GT(Computer Science and Game Theory), cs.DB(Databases), cs.DL(Digital Libraries), cs.DM(Discrete Mathematics). Directly output the class name.

gpt: cs.AR(Hardware Architecture)