human: Given a node-centered hypergraph: <hypergraph>, where nodes represent papers and hyperedges represent sets of papers co-cited by a source paper.

Details of the hypergraph:
Center node: "layout decomposition for double patterning lithography"
  Abstract: As minimum feature size and pitch spacing further decrease, triple patterning lithography (TPL) is a possible 193nm extension along the paradigm of double patterning lithography (DPL). However, there is very little study on TPL layout decomposition. In this paper, we show that TPL layout decomposition is a more difficult problem than that for DPL. We then propose a general integer linear programming formulation for TPL layout decomposition which can simultaneously minimize conflict and stitch numbers. Since ILP has very poor scalability, we propose three acceleration techniques without sacrificing solution quality: independent component computation, layout graph simplification, and bridge computation. For very dense layouts, even with these speedup techniques, ILP formulation may still be too slow. Therefore, we propose a novel vector programming formulation for TPL decomposition, and solve it through effective semidefinite programming (SDP) approximation. Experimental results show that the ILP with acceleration techniques can reduce 82% runtime compared to the baseline ILP. Using SDP based algorithm, the runtime can be further reduced by 42% with some tradeoff in the stitch number (reduced by 7%) and the conflict (9% more). However, for very dense layouts, SDP based algorithm can achieve 140× speed-up even compared with accelerated ILP.

Connected through hyperedge HE-1 (induced by source paper "openmpl an open source layout decomposer"):
  with members:
    - "layout decomposition for quadruple patterning lithography and beyond"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "triple patterning lithography tpl layout decomposition using end cutting"

Connected through hyperedge HE-2 (induced by source paper "layout decomposition for quadruple patterning lithography and beyond"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "approximate graph coloring by semidefinite programming"

Connected through hyperedge HE-3 (induced by source paper "methodology for standard cell compliance and detailed placement for triple patterning lithography"):
  with members:
    - "a high performance triple patterning layout decomposer with balanced density"
    - "self aligned double patterning friendly configuration for standard cell library considering placement impact"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "triad a triple patterning lithography aware detailed router"

Connected through hyperedge HE-4 (induced by source paper "a high performance triple patterning layout decomposer with balanced density"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "triad a triple patterning lithography aware detailed router"

Connected through hyperedge HE-5 (induced by source paper "e blow e beam lithography overlapping aware stencil planning for mcc system"):
  with members:
    - "layout decomposition for quadruple patterning lithography and beyond"
    - "l shape based layout fracturing for e beam lithography"

Connected through hyperedge HE-6 (induced by source paper "triple patterning lithography tpl layout decomposition using end cutting"):
  with members:
    - "layout decomposition for quadruple patterning lithography and beyond"
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "l shape based layout fracturing for e beam lithography"
    - "triad a triple patterning lithography aware detailed router"

Question: Please tell me which class the center node belongs to. The 40 classes are: cs.NA(Numerical Analysis), cs.MM(Multimedia), cs.LO(Logic in Computer Science), cs.CY(Computers and Society), cs.CR(Cryptography and Security), cs.DC(Distributed, Parallel, and Cluster Computing), cs.HC(Human-Computer Interaction), cs.CE(Computational Engineering, Finance, and Science), cs.NI(Networking and Internet Architecture), cs.CC(Computational Complexity), cs.AI(Artificial Intelligence), cs.MA(Multiagent Systems), cs.GL(General Literature), cs.NE(Neural and Evolutionary Computing), cs.SC(Symbolic Computation), cs.AR(Hardware Architecture), cs.CV(Computer Vision and Pattern Recognition), cs.GR(Graphics), cs.ET(Emerging Technologies), cs.SY(Systems and Control), cs.CG(Computational Geometry), cs.OH(Other Computer Science), cs.PL(Programming Languages), cs.SE(Software Engineering), cs.LG(Machine Learning), cs.SD(Sound), cs.SI(Social and Information Networks), cs.RO(Robotics), cs.IT(Information Theory), cs.PF(Performance), cs.CL(Computation and Language), cs.IR(Information Retrieval), cs.MS(Mathematical Software), cs.FL(Formal Languages and Automata Theory), cs.DS(Data Structures and Algorithms), cs.OS(Operating Systems), cs.GT(Computer Science and Game Theory), cs.DB(Databases), cs.DL(Digital Libraries), cs.DM(Discrete Mathematics). Directly output the class name.

gpt: cs.AR(Hardware Architecture)