human: Given a node-centered hypergraph: <hypergraph>, where nodes represent papers and hyperedges represent sets of papers co-cited by a source paper.

Details of the hypergraph:
Center node: "layout decomposition for quadruple patterning lithography and beyond"
  Abstract: For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic and robust layout decomposition framework for QPL, which can be further extended to handle any general K-patterning lithography (K$>$4). Our framework is based on the semidefinite programming (SDP) formulation with novel coloring encoding. Meanwhile, we propose fast yet effective coloring assignment and achieve significant speedup. To our best knowledge, this is the first work on the general multiple patterning lithography layout decomposition.

Connected through hyperedge HE-1 (induced by source paper "openmpl an open source layout decomposer"):
  with members:
    - "a high performance triple patterning layout decomposer with balanced density"
    - "triple patterning lithography tpl layout decomposition using end cutting"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-2 (induced by source paper "e blow e beam lithography overlapping aware stencil planning for mcc system"):
  with members:
    - "l shape based layout fracturing for e beam lithography"
    - "layout decomposition for double patterning lithography"

Connected through hyperedge HE-3 (induced by source paper "triple patterning lithography tpl layout decomposition using end cutting"):
  with members:
    - "methodology for standard cell compliance and detailed placement for triple patterning lithography"
    - "a high performance triple patterning layout decomposer with balanced density"
    - "l shape based layout fracturing for e beam lithography"
    - "triad a triple patterning lithography aware detailed router"
    - "layout decomposition for double patterning lithography"

Question: Please tell me which class the center node belongs to. The 40 classes are: cs.NA(Numerical Analysis), cs.MM(Multimedia), cs.LO(Logic in Computer Science), cs.CY(Computers and Society), cs.CR(Cryptography and Security), cs.DC(Distributed, Parallel, and Cluster Computing), cs.HC(Human-Computer Interaction), cs.CE(Computational Engineering, Finance, and Science), cs.NI(Networking and Internet Architecture), cs.CC(Computational Complexity), cs.AI(Artificial Intelligence), cs.MA(Multiagent Systems), cs.GL(General Literature), cs.NE(Neural and Evolutionary Computing), cs.SC(Symbolic Computation), cs.AR(Hardware Architecture), cs.CV(Computer Vision and Pattern Recognition), cs.GR(Graphics), cs.ET(Emerging Technologies), cs.SY(Systems and Control), cs.CG(Computational Geometry), cs.OH(Other Computer Science), cs.PL(Programming Languages), cs.SE(Software Engineering), cs.LG(Machine Learning), cs.SD(Sound), cs.SI(Social and Information Networks), cs.RO(Robotics), cs.IT(Information Theory), cs.PF(Performance), cs.CL(Computation and Language), cs.IR(Information Retrieval), cs.MS(Mathematical Software), cs.FL(Formal Languages and Automata Theory), cs.DS(Data Structures and Algorithms), cs.OS(Operating Systems), cs.GT(Computer Science and Game Theory), cs.DB(Databases), cs.DL(Digital Libraries), cs.DM(Discrete Mathematics). Directly output the class name.

gpt: cs.DS(Data Structures and Algorithms)