Scalable self-aligned fabrication of nanoscale vertical a-IGZO TFTs utilizing angled deposition
Year: 2025
Type: article
Language: en
Topic: Thin-Film Transistor Technologies
Authors and affiliations:
raw_author_name: Jiyoung Bang
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Seungmin Choi
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Yeonsu Lee
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Yeonghun Lee
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222, Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Hyowon Kim
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Hyeonjeong Sun
raw_affiliation_strings: Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Electronic Engineering, Hanyang University, 222, Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Seungjae Lee
raw_affiliation_strings: Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Institute of Nano Science and Technology, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea
Department of Electronic Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Yeoeun Yun
raw_affiliation_strings: Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Electronic Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Kyubin Hwang
raw_affiliation_strings: Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Electronic Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Taeyang Kim
raw_affiliation_strings: Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Eunsuk Choi
raw_affiliation_strings: Information Display & Semiconductor Research Institute, Hanyang University, Seoul 04763, Republic of Korea
Information Display & Semiconductor Research Institute, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Onejae Sul
raw_affiliation_strings: Institute of Nano Science and Technology, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea
Institute of Nano Science and Technology, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)
raw_author_name: Seung-Beck Lee
raw_affiliation_strings: Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea
Institute of Nano Science and Technology, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea
Department of Electronic Engineering, Hanyang University, 222 Wangshimni-ro, Seongdong-gu, Seoul, 04763, Korea (the Republic of)