Impact of secondary selection parameters on the morphology and crystalline quality of GaSb layers deposited using MBE technology
Year: 2025
Type: article
Language: en
Topic: Semiconductor Quantum Structures and Devices
Authors and affiliations:
raw_author_name: Dawid Jarosz
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Anna Juś
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Marta Pasternak
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Paweł Śliż
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Piotr Krzemiński
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Henryk Teisseyre
raw_affiliation_strings: Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, PL-02-668, Warsaw, Poland
raw_author_name: Marcin Stachowicz
raw_affiliation_strings: Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, PL-02-668, Warsaw, Poland
raw_author_name: Ewa Przeździecka
raw_affiliation_strings: Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, PL-02-668, Warsaw, Poland
raw_author_name: Łukasz Ciura
raw_affiliation_strings: Rzeszow University of Technology, W. Pola 2, PL-35-395 Rzeszow, Poland
raw_author_name: Ewa Bobko
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Małgorzata Trzyna-Sowa
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Kinga Maś
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Renata Wojnarowska-Nowak
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Oskar Nowak
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Daria Gudyka
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Brajan Tabor
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland
raw_author_name: Michał Marchewka
raw_affiliation_strings: University of Rzeszow, Institute of Materials Science and Engineering, Center of Microelectronics and Nanotechnology, Al. Rejtana 16c, PL-35-959 Rzeszow, Poland