Insertion of Ni(0) and Pd(0) precursors into the Si-Si bond of a disilane with two hypercoordinate silicon atoms.
Usui, Ryosuke; Sunada, Yusuke; Chemical communications (Cambridge, England) 56 (2020) 8464–8467; doi:10.1039/d0cc03211e

data_7126753
_publ_section_title
;
 Insertion of Ni(0) and Pd(0) precursors into the Si-Si bond of a disilane
 with two hypercoordinate silicon atoms.
;
_journal_issue                   60
_journal_name_full
'Chemical communications (Cambridge, England)'
_journal_page_first              8464
_journal_page_last               8467
_journal_paper_doi               10.1039/d0cc03211e
_journal_volume                  56
_journal_year                    2020
_chemical_formula_moiety         'C44 H52 N6 Pd2 Si2'
_chemical_formula_sum            'C44 H52 N6 Pd2 Si2'
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_audit_update_record
;
2020-03-17 deposited with the CCDC.	2020-06-22 downloaded from the CCDC.
;
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'w = 1/[\s^2^(Fo^2^)+(0.0271P)^2^+3.1482P] where P=(Fo^2^+2Fc^2^)/3'
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_reflns_threshold_expression     F^2^>2.0\s(F^2^)
_cod_data_source_file            d0cc03211e2.cif
_cod_data_source_block           '[Pd(SiPh2pyrazolyl)(CNtBu)]2'
_cod_depositor_comments
'Adding full bibliography for 7126751--7126754.cif.'
_cod_database_code               7126753
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