Low-Temperature Addition of Organolithiums to Functionalized Vinylsilanes under Formation of Secondary α-Lithiated Alkylsilanes
Christian Unkelbach; Carsten Strohmann; Journal of the American Chemical Society 131 (2009) 17044–17045; doi:10.1021/ja9076167

data_4105414
_publ_contact_author_address
;
Anorganische Chemie
Technische Universit\"at Dortmund
Otto-Hahn-Strasse
44227 Dortmund
Germany
;
_publ_contact_author_email       mail@carsten-strohmann.de
_publ_contact_author_fax         '0049 231 755 3807'
_publ_contact_author_name        'Carsten Strohmann'
_publ_contact_author_phone       '0049 231 888 3797'
_publ_section_title
;
 Low-Temperature Addition of Organolithiums to Functionalized Vinylsilanes
 under Formation of Secondary \a-Lithiated Alkylsilanes
;
_journal_name_full               'Journal of the American Chemical Society'
_journal_page_first              17044
_journal_page_last               17045
_journal_paper_doi               10.1021/ja9076167
_journal_volume                  131
_journal_year                    2009
_chemical_formula_sum            'C14 H34 Li N3 Si'
_chemical_formula_weight         279.47
_chemical_name_systematic
;
 ?
;
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_atom_sites_solution_secondary   difmap
_audit_creation_date             2009-08-20T13:50:07-00:00
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_cell_angle_beta                 86.29(5)
_cell_angle_gamma                71.87(6)
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_cell_length_a                   8.803(5)
_cell_length_b                   9.319(4)
_cell_length_c                   12.224(4)
_cell_measurement_reflns_used    2276
_cell_measurement_temperature    193(2)
_cell_measurement_theta_max      25
_cell_measurement_theta_min      2.31
_cell_volume                     945.3(8)
_computing_cell_refinement       'Cell in IPDS (Stoe & Cie, 1999)'
_computing_data_collection       'Expose in IPDS (Stoe & Cie, 1999)'
_computing_data_reduction        'Integrate in IPDS (Stoe & Cie, 1999)'
_computing_molecular_graphics    'Schakal99 (Keller, 1999)'
_computing_publication_material  'SHELXL-97 (Sheldrick, 1997)'
_computing_structure_refinement  'SHELXL-97 (Sheldrick, 1997)'
_computing_structure_solution    'SHELXS-97 (Sheldrick, 1997)'
_diffrn_ambient_temperature      193(2)
_diffrn_measured_fraction_theta_full 0.939
_diffrn_measured_fraction_theta_max 0.939
_diffrn_measurement_device_type  'Stoe IPDS'
_diffrn_measurement_method       'phi scans'
_diffrn_radiation_monochromator  graphite
_diffrn_radiation_type           MoK\a
_diffrn_radiation_wavelength     0.71073
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_diffrn_reflns_limit_h_max       10
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_diffrn_reflns_limit_k_min       -11
_diffrn_reflns_limit_l_max       14
_diffrn_reflns_limit_l_min       -14
_diffrn_reflns_number            7407
_diffrn_reflns_theta_full        25
_diffrn_reflns_theta_max         25
_diffrn_reflns_theta_min         2.31
_exptl_absorpt_coefficient_mu    0.117
_exptl_absorpt_correction_T_max  0.8426
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_exptl_absorpt_correction_type   empirical
_exptl_absorpt_process_details   'FACEIT in IPDS (Stoe & Cie, 1999)'
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_refine_ls_number_reflns         3140
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_refine_ls_shift/su_max          0.001
_refine_ls_shift/su_mean         0
_refine_ls_structure_factor_coef Fsqd
_refine_ls_weighting_details
'calc w=1/[\s^2^(Fo^2^)+(0.1308P)^2^+0.0100P] where P=(Fo^2^+2Fc^2^)/3'
_refine_ls_weighting_scheme      calc
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_cod_data_source_block           ch040408
_cod_original_cell_volume        945.3(7)
_cod_database_code               4105414