From: calendar@ALMADEN.IBM.COM (IBM Almaden Research Center Calendar)
Newsgroups: ba.seminars
Subject: IBM ARC seminars 24 - 28 AUG 92
Date: 20 Aug 92 22:42:06 GMT


                     IBM Almaden Research Center
                           650 Harry Road
                       San Jose, CA 95120-6099

                              CALENDAR
                         August 24-28, 1992


08/25 - NANO-HARDNESS INVESTIGATIONS OF THIN FILMS BY AN ATOMIC FORCE
MICROSCOPE
G. Persch, IBM Germany (Mainz)

Phys. Sci. Sem.    Tuesday, August 25    12:00 p.m.    Room: J2-609

Hardness measurements on extremely thin films on a sub-micron scale
using commercially available depth-sensing instruments require a minimum
thickness of 100 nm.  For thin films the intrinsic hardness can be
measured correctly only after both the indentation-size-effect due to
the elastic deformation and the influence of the substrate have been
considered properly.

To overcome this problem a new measurement technique for determining the
nano-hardness of very thin films has been developed.  The idea is based
on the modification of an atomic force microscopy using the same AFM
tips as indenter and topographical probe.  This gives the possibility to
measure the indentation area directly and not to deduce it from the
load/unload curve as it is done with a commercial nano-indenter.  For
small applied loads down to 10E-6 N a higher depth and area resolution
is possible for the hardness determination.  This is of great importance
for investigations on extremely thin protective coatings such as carbon
overcoat.
Host:  D. Chambliss


08/26 - DRY ETCH CHARACTERISTICS OF SILYLATED DEEP UV RESISTS IN NOVEL
PLASMA CONFIGURATIONS
Dr. S. Das, Components Research, Intel Corp., Santa Clara

Polym. Sci. & Tech. Sem.  Wednesday, August 26  9:00 a.m.  Room: J2-601

Surface-imaged resist (SIR) technology is a potentially attractive
scheme for deep submicron lithography to overcome depth of focus (DOF)
limitations in high NA steppers and increased resist adsorption at lower
wavelengths.  However, the degree of process complexity is greater than
with conventional resists processes.  Specifically, understanding the
resist interaction with silylation and plasma etch processes is of
critical importance for deriving the full benefits of this technology.
This requires optimizing both the resist chemistry for high silylation
contrast, and the etch process to minimize mask erosion and "grass"
formation.  The present study  investigates the silylation
characteristics of commercially available resist materials and the
pattern transfer fidelity using two novel etchers - magnetically
confined reactor (MCR) in a triode configuration and electron cyclotron
resonance etcher (ECR).  Key plasma parameters which have a major effect
on the pattern transfer in each type of etcher have been identified.
Feasibility of sub-0.5 micron resolution with minimal residue formation
have been successfully demonstrated in both etchers.
Host:  G. Wallraff


08/28 - THREE-VIEWGRAPH FORUM
G. McClelland, T. Rabedeau and J. Stoehr, IBM Almaden Research Center

Phys. Sci. Colloq.    Friday, August 28    10:30 a.m.    Room: Aud. A

These talks are presented as part of our summer series of
Three-Viewgraph Forums.  Each presentation will be a brief talk with the
main points emphasized by a maximum of three viewgraphs.  The
presentations will be followed by informal discussion.

1.  Gary McClelland - Observing the Motion of Individual Surface Atoms
    with Picosecond Resolution
2.  Tom Rabedeau - An X-Ray Reflectivity Study of the 4He
    Superfluid/Vapor Interfacial Profile
3.  Jo Stoehr - Element-Specific Magnetic Microscopy
Host:  J. Kaufman

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For further information on individual talks, please contact the host
listed above.

Visitors, please arrive 15 minutes early.  IBM's Almaden Research
Center (ARC) is located adjacent to Santa Teresa County Park, between
Almaden Expressway and U.S. 101, about 10 miles south of Interstate
280.  From U.S. 101, exit at Bernal Road, and follow Bernal Road west
past Santa Teresa Blvd. into the hills (ignoring the left turn for
Santa Teresa Park).  Alternatively, follow Almaden Expressway to its
southern terminus, turn left onto Harry Road, then go right at the ARC
entrance (about a quarter of a mile later) and go up the hill.  For
more detailed directions, please phone the ARC receptionist at (408)
927-1080.

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