Before revision: The integrated heaters enable in-situ metrology of the written patterns, allowing feedback control, Scanning probe nanolithography system and method (EP2848997 A1) field stitching without the use of alignment markers and using pre-patterned structures as reference for sub-5 nm overlay.
After revision: The integrated heaters enable in-situ metrology of the written patterns, allowing feedback control, field stitching without the use of alignment markers and using pre-patterned structures as reference for sub-5 nm overlay.