Before revision: Some examples of positive photoresists are: PMMA (polymethylmethacrylate) single-component Resist for deep-UV e-beam, x-ray Resin itself is DUV sensitive (slow) Chain scission mechanism Two-component DQN resists: Common resists for mercury lamps Diazoquinone ester (DQ) 20-50% weight photosensitive hydrophobic, not water soluble Phenolic Novolak Resin (N) Frequently used for near-UV exposures Water soluble UV exposure destroys the inhibitory effect of DQ Issues: Adhesion, Etch Resistance Negative photoresist 346x346px|A crosslinking of a polyisoprene rubber by a photoreactive biazide as negative photoresist 333x333px|A radical induced polymerization and crosslinking of an acrylate monomer as negative photoresist A negative photoresist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes insoluble in the photoresist developer.
After revision: ,Some examples of positive photoresists are: PMMA (polymethylmethacrylate) single-component Resist for deep-UV e-beam, x-ray Resin itself is DUV sensitive (slow) Chain scission mechanism Two-component DQN resists: Common resists for mercury lamps Diazoquinone ester (DQ) 20-50% weight photosensitive hydrophobic, not water soluble Phenolic Novolak Resin (N) Frequently used for near-UV exposures Water soluble UV exposure destroys the inhibitory effect of DQ Issues: Adhesion, Etch Resistance Negative photoresist 346x346px|A crosslinking of a polyisoprene rubber by a photoreactive biazide as negative photoresist 333x333px|A radical induced polymerization and crosslinking of an acrylate monomer as negative photoresist A negative photoresist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes insoluble in the photoresist developer.