Before revision: Steps A typical thick-film process would consist of the following stages: Lasering of substrates Typically thick film circuit substrates are Al2O3/alumina, beryllium oxide (BeO), aluminum nitride (AlN), stainless steel, sometimes even some polymers and in rare cases even silicon (Si) coated with silicon dioxide (SiO2)., Most used substrates for a thick-film process are either 94 or 96%DIF < alumina.
After revision: Steps A typical thick-film process would consist of the following stages: Lasering of substrates Typically thick film circuit substrates are Al2O3/alumina, beryllium oxide (BeO), aluminum nitride (AlN), stainless steel, sometimes even some polymers and in rare cases even silicon (Si) coated with silicon dioxide (SiO2)., Commonly used substrates for a thick-film processes are 94 or 96%DIF < lumina.