Before revision: 34 (6)p. 81, June 1992.Hyungcheol Shin, Neeta ha, Xue-Yu Qian, Graham W. Hills, Chenming Hu, “Plasma Etching Charge-Up Damage to Thin Oxides, ’’ Solid State Technology, p. 29, Aug. 1993 Fabs normally supply antenna rules, which are rules that must be obeyed to avoid this problem.
After revision: 34 (6)p. 81, June 1992.Hyungcheol Shin, Neeta ha, Xue-Yu Qian, Graham W. Hills, Chenming Hu, “Plasma Etching Charge-Up Damage to Thin Oxides, ’’ Solid State Technology, p. 29, Aug. 1993 Factories (fabs) normally supply antenna rules, which are rules that must be obeyed to avoid this problem.