Before revision: Combined nanofabrication process of focused ion beam and cryo-DRIE was first reported by N Chekurov et al in their article "The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching" (Nanotechnology, 2009) .
After revision: Combined nanofabrication process of focused ion beam and cryo-DRIE was first reported by N Chekurov et al in their article "The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching" .