Before revision: "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology" Modern technologies for locating defects in photomasks are automated systems that involve scanning electron microscopy and other advanced tools .
After revision: ZEISS Webpage offering automated mask repair tools"VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology" Modern technologies for locating defects in photomasks are automated systems that involve scanning electron microscopy and other advanced tools .