Before revision: Often, inside the ion source a plasma is created between two tungsten electrodes, called reflectors, using a gas often based on fluorine containing the ion to be implanted whether it is germanium, boron, or silicon, such as boron trifluoride, boron difluoride, germanium tetrafluoride or silicon URL
After revision: Often, inside the ion source a plasma is created between two tungsten electrodes, called reflectors, using a gas often based on fluorine containing the ion to be implanted whether it is germanium, boron, or silicon, such as boron trifluoride, boron difluoride, germanium tetrafluoride or silicon tetrafluoride.