Before revision: Removal of nitride mask (layer 3) There are 4 basic layers/structures: Si, silicon substrate, wafer SiO2, buffer oxide (pad oxide), chemical vapor deposition silicon oxide Si3N4, nitride mask SiO2, insulation oxide, thermal oxidation Function of layers and structures The silicon wafer (layer 1) is used as a basis for building electronic structures (such as MOS transistors).
After revision: Removal of nitride mask (layer 3) 1-There are 4 basic layers/structures: Si, silicon substrate, wafer SiO2, buffer oxide (pad oxide), chemical vapor deposition silicon oxide Si3N4, nitride mask SiO2, insulation oxide, thermal oxidation Function of layers and structures The silicon wafer (layer 1) is used as a basis for building electronic structures (such as MOS transistors).