Before revision: "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3540125582, Chapter 4: "Mask Inspection Technology" Modern technologies for locating defects in photomasks involve scanning electron microscopy and other advanced tools.
After revision: are automated systems that"VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3540125582, Chapter 4: "Mask Inspection Technology" Modern technologies for locating defects in photomasks involve scanning electron microscopy and other advanced tools.