Before revision: E-beam evolved directly from SEM technology and both use a focused electron beam, but no one would ever suggest that one could perform modern E-beam lithography experiments on a SEM that lacks the proper lithography hardware and software requirements .
After revision: E-beam evolved directly from SEM technology and both use a focused electron beam, but it is not possible to perform modern E-beam lithography experiments on a SEM that lacks the proper lithography hardware and software components .