Before revision: CharacteristicPositiveNegativeAdhesion to siliconFairExcellentRelative costMore expensiveLess expensiveDeveloper baseAqueousOrganicSolubility in the developerExposed region is solubleExposed region is insolubleMinimum feature0.5 µm7 nmStep coverageBetterLowerWet chemical resistanceFairExcellent Types Based on the chemical structure of photoresists, they can be classified into three types: photopolymeric, photodecomposing, photocrosslinking photoresist.223x223px|Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer404x404px|Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.
After revision: CharacteristicPositiveNegativeAdhesion to siliconFairExcellentRelative costMore expensiveLess expensiveDeveloper baseAqueousOrganicSolubility in the developerExposed region is solubleExposed region is insolubleMinimum feature0.5 µm7 nmStep coverageBetterLowerWet chemical resistanceFairExcellent Classification Based on the chemical structure of photoresists, they can be classified into three types: photopolymeric, photodecomposing, photocrosslinking photoresist.223x223px|Photopolymerization of methyl methacrylate monomers under UV that resulting into polymer404x404px|Photolysis of a dizaonaphthoquinone that leads to a much more polar environment, which allows aqueous base to dissolve a Bakelite-type polymer.