Before revision: 462x462px|Photoresist of Photolithography A BARC coating ( bottom anti-reflectant coating ) may be applied before the photoresist is applied, to avoid reflections from occurring under the photoresist and to improve the photoresist's performance at smaller semiconductor nodes.
After revision: 462x462px|Photoresist of Photolithography A BARC coating ( Bottom Anti-Reflectant Coating ) may be applied before the photoresist is applied, to avoid reflections from occurring under the photoresist and to improve the photoresist's performance at smaller semiconductor nodes.