Before revision: These rely on white light, typically optimized at approximately 538 nM and use incident bright and dard field as well as transmitted bright and dark field illumination to see pin holes, edge defects and contamination .
After revision: These rely on white light, typically optimized at approximately 538 nM and use incident bright and dark field as well as transmitted bright and dark field illumination to see pin holes, edge defects and many forms of contamination and substrate defects .