Before revision: This technique builds on the high-throughput nanoelectroporation methods developed for cell reprogramming applications by Dr. Lee and Dr. Gallego-Perez of Ohio State’s Chemical and Biomolecular Engineering department.. Development was a joint effort between OSU’s College of Engineering and College of Medicine led by Dr. Gallego-Perez (Ph.D.), Dr. Lee (Ph.D.), and Dr. Sen (Ph.D.) This technology was fabricated using cleanroom techniques and photolithography and deep reactive ion etching (DRIE) (Link here to DRIE) of silicon wafers to create nanochannels with backside etching of a reservoir for loading desired factors as described in Gallego-Perez et al 2017.
After revision: This technique builds on the high-throughput nanoelectroporation methods developed for cell reprogramming applications by Dr. Lee and Dr. Gallego-Perez of Ohio State’s Chemical and Biomolecular Engineering department.. Development was a joint effort between OSU’s College of Engineering and College of Medicine led by Dr. Gallego-Perez (Ph.D.), Dr. Lee (Ph.D.), and Dr. Sen (Ph.D.) This technology was fabricated using cleanroom techniques and photolithography and deep reactive ion etching (DRIE) of silicon wafers to create nanochannels with backside etching of a reservoir for loading desired factors as described in Gallego-Perez et al 2017.