Before revision: In order to characterize the morphology of semiconductor films, one can apply atomic force microscopy (AFM) scanning electron microscopy (SEM) and Grazing-incidence small-angle scattering (GISAS).
After revision: ,,In order to characterize the morphology of semiconductor films, one can apply atomic force microscopy (AFM) scanning electron microscopy (SEM) and Grazing-incidence small-angle scattering (GISAS).