CONCEPT OF A WORKFLOW MANAGEMENT SYSTEM APPLICATION FOR PHOTOMASK DESIGN
Journal: International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Year: 2020

The paper discusses the possibility of using a workflow management system (WFMS) for photomask design. A model for describing business logic has been proposed, and its effectiveness has been analyzed by modeling topology verification flow.