ATOMIC LAYER DEPOSITION OF THIN FILMS OF METAL AND THEIR OXIDES
Journal: International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Year: 2020

In this paper existing methods of atomic layer deposition of thin films of cobalt, ruthenium and their oxides are considered for their application for various purposes in the field of microelectronics.