FORMATION POSSIBILITY OF THE AL3SI METASTABLE PHASE DURING ION-BEAM AND MAGNETRON DEPOSITION OF COMPOSITE AL-SI FILMS
Journal: International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Year: 2020

Metastable phases such as Al3Si can form in Al-Si composite films obtained by magnetron and ion-beam sputtering. In this work, we investigated the stability region of the Al3Si phase depending on the composition of the ion-beam AlxSi1-x films. Using X-ray diffraction and Ultrasoft X-ray Emission Spectroscopy, an ordered Al3Si solution with a primitive unit cell of the cubic system Pm3m and a lattice parameter of 4.085 Å was found in Al1-xSix ionbeam films. Studies have shown that the long-range