ELECTRON SPECTROSCOPIC CONTROL OF SURFACE CLEANING OF SILICON SUBTRATES
Journal: International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Year: 2020

The work investigates the processes of purification - etching of the silicon surface with positive ions of cesium and subsequent annealing by total current spectroscopy.