[en] Some natural processes produce photons whose wavelengths are in the spectral ranges called extreme ultraviolet (EUV, 10-100 nm) and far ultraviolet (FUV, 100-200 nm), regions where most of the materials in nature turn absorbent. The manipulation and detection of these photons are fundamental in order to obtain information about the processes which generate them. Nowadays there is an increasing demand of optical instrumentation that requires more efficient optical coatings. Accurate optical constants in the FUV/EUV are needed for the design of coatings. The main goal of the present work has been to provide new optical coatings for the EUV/FUV ranges along with accurate and extensive optical data sets. Regarding optical constant research, in this work we have continued a research initiated by GOLD in the 1990s, aimed to find and characterize materials whose optical constants are suitable for the development of new coatings in the EUV/FUV ranges. Sr, Lu and SrF2 have been characterized in this work. With Lu, we have already completed the characterization of all the lanthanides, except Pm, that has not stable isotope. SiC and B4C had been previously characterized in the EUV/FUV range by GOLD; at this time we have also characterized these materials in the visible and ultraviolet ranges and obtained self-consistent optical constants in a wide spectrum, which will enable the design of new optical coatings for the EUV/FUV ranges with additional restrictions in the visible or ultraviolet. Not only have we characterized new materials, but also we have developed new tools for the optical-constant consistency analysis, along with new mathematical models to fit them. Hence, once the optical constants were experimentally determined, it is necessary to check their consistency. In this work, we have developed a new algorithm to evaluate the consistency of the optical-constant data sets. The new algorithm is able to give more weight to one spectral range over the others in the consistency analysis. On the other hand, we have developed a new algorithm to generate new analytical models starting from empirical and non-analytical models which are frequently used to fit experimental data. Taking advantage of the previously described tools, we have developed and/or characterized the following optical coatings for the EUV/FUV range: i) New narrowband reflective coatings for the Hydrogen Lyman ? line (102.57 nm); Observations in the latter line may unveil essential information for solar physics and astrophysics. These coatings were developed with the strong constraint to reject the Hydrogen Lyman ? line (121.57 nm), which is the most intense line in solar observation and hence it could mask the weaker Lyman ? line. The key parameter of these new coatings is that they have a high Lyman ?-to- Lyman ? reflectance ratio. ii) New transmittance coatings tuned at either the Oxygen I line (135.6 nm) or the central part of the N2 Lyman-Birge-Hopfield band (around 140-180 nm), with additional constraints in the near ultraviolet and visible ranges. These coatings were developed for the engineering model of the ?Atmospheric Photometer? (AP) instrument, aboard the spacecraft Feng-Yun 3D (FY-3D), developed by China, and scheduled to be launched in 2016. iii) We have characterized in the 4-90 nm range the EUV flight witnesses of ?Atmospheric Imaging Assembly? (AIA) instrument, aboard ?Solar Dynamic Observatory? (SDO), which is in orbit since 2010. This calibration is expected to further improve the understanding of the AIA instrument response and the corresponding interpretation of data furnished by AIA.

[es] Ciertos fen?menos f?sicos de la naturaleza producen fotones con longitudes de onda comprendidas en los intervalos espectrales llamados ultravioleta extremo (EUV, 10-100 nm) y lejano (FUV, 100-200 nm), regiones donde la mayor?a de los materiales de la naturaleza se tornan fuertemente absorbentes. La manipulaci?n y detecci?n de dichos fotones es fundamental para obtener informaci?n acerca de los procesos que los generan. Esto ha creado una demanda creciente de instrumentaci?n ?ptica que, a su vez, requiere de unos recubrimientos eficientes. Para el dise?o de los recubrimientos en el EUV/FUV es necesario disponer de constantes ?pticas precisas de los materiales que van a ser empleados. El objetivo de este trabajo ha sido proporcionar a la comunidad cient?fica nuevos recubrimientos para el EUV/FUV as? como conjuntos extensos y congruentes de constantes ?pticas para su dise?o. En el campo de la obtenci?n de las constantes ?pticas hemos seguido una l?nea de investigaci?n iniciada en GOLD en la d?cada de los 90 que consiste en la b?squeda y caracterizaci?n de materiales con propiedades prometedoras en el EUV/FUV. As?, hemos caracterizado los siguientes materiales en un amplio intervalo del espectro electromagn?tico: Sr, Lu y SrF2. Con la caracterizaci?n del Lu se ha completado el an?lisis de las constantes ?pticas de todos los lant?nidos (Exceptuando el Pm, por no poseer is?topos estables). El SiC y el B4C ya hab?an sido previamente caracterizados en el EUV/FUV; se han caracterizado aqu? en el visible y ultravioleta cercano para dise?ar ciertos recubrimientos en el EUV/FUV que requieren de restricciones adicionales en el visible y aleda?os. La contribuci?n en el campo de las constantes ?pticas tambi?n incluye la evaluaci?n de las constantes obtenidas y el desarrollo de modelos de ajuste. Obtenidos los conjuntos de constantes ?pticas experimentalmente, es necesario disponer de herramientas para analizar su congruencia global. Para ello hemos desarrollado nuevos algoritmos que, en la evaluaci?n de la congruencia de las constantes ?pticas obtenidas, asignan m?s peso al intervalo espectral deseado. Otro objetivo ha sido el desarrollo de modelos que describen las constantes ?pticas de materiales en funci?n de unos pocos par?metros. En esa l?nea, hemos obtenido un nuevo algoritmo para generar modelos anal?ticos a partir de los modelos emp?ricos que se utilizan habitualmente en el ajuste de datos experimentales de constantes ?pticas. Con las constantes ?pticas de los materiales anteriores y de otros caracterizados en el pasado, hemos llevado a cabo el desarrollo y caracterizaci?n de los siguientes recubrimientos para el EUV/FUV: i) Nuevos recubrimientos eficientes de banda estrecha para la l?nea Lyman ? del Hidr?geno (102.57 nm) de inter?s en f?sica solar y astrof?sica. Estos recubrimientos, que operan por reflexi?n, rechazan adem?s la l?nea Lyman ? del Hidr?geno (121.57 nm), que es m?s intensa en las observaciones de la corona solar y puede enmascarar la l?nea Lyman ?. ii) Nuevos recubrimientos de transmitancia para la l?nea OI del Ox?geno (135.6 nm) y la banda del N2 Lyman-Birge-Hopfield (140-180 nm) y con restricciones adicionales en el visible y ultravioleta cercano. Se trata de un recubrimiento para el instrumento ?Atmospheric Photometer? (AP) a bordo del sat?lite chino de observaci?n de la tierra Feng-Yun 3D, que est? previsto poner en ?rbita en 2016. iii) Caracterizaci?n en el intervalo 4-90 nm de todos los testigos de vuelo de los recubrimientos de reflectancia para el EUV del instrumento ?Atmospheric Imaging Assembly? (AIA) a bordo del sat?lite ?Solar Dynamic Observatory? (SDO), en ?rbita desde 2010. Esta calibraci?n permitir? un mejor an?lisis de los datos obtenidos por el AIA.