# Presentation: 384648

## National Synchrotron Light Source II

**Nanoprobe Beamline **
**K. Evans-Lutterodt**
**November  8th, 2007**

## Scientific Mission

- Allow the study of nanomaterials which today play important roles in many diverse scientific fields, opening up a wide range of scientific problems ranging from studying the structure and function of catalytic nanoparticles, to the mapping of strain in buried grain boundaries, to determining the structure of single molecule devices.

## Example: Energy Research

- Fully functioning micro-fuel cells

- Fritz Prinz, Stanford Univ.
- R. O’Hayre, F. B. Prinz, J*. Electrochem. Soc*. **151**, A756 (2004)

- Need to determine
- Structure
- Composition
- Volume
- Surface Area
- of Pt nanoparticles in a carbon matrix

## Beamline Requirements and Specifications

- Requirements
- 10% Source size stability
- Floor vibration monitoring
- 25nm floor noise; (active vibration isolation gives 0.25nm)
- Remote endstation
- Specifications
- 1nm (convolution of spot size and  mechanical stability)
- Energy range*, 4.3 keV to 30 keV (covers elements Sc to U )
- *Do not expect to have 1nm over entire energy range (18 keV+)

## Conceptual Layout of Nanoprobe

## Physical Layout of Nanoprobe

**Physical Layout of Nanoprobe**

- FOE

- Mono hutch 1

- Mono hutch 2

## Location

- Nanoprobe line

- XPCS

## Insertion Device

- CPMU U19, or U20 device
- Low Beta straight section (maximum brightness)

| 
Type of source  | Low- straight section  (6.6m) |
| --- | --- |
| σx [μm]  | 28 |
| σx' [μrad]  | 19  |
| σy [μm]  | 2.6  |
| σy' [μrad]  | 3.2 |

## Front end Layout

- Front End Fixed Mask (FEFM)
- Z=14m
- Aperture Y=300um, X=1100um
- Differential Pump
- Z=14.5m
**Front End Adjustable Horizontal Source Aperture (FEHA)**
**Z=16m**
**Aperture Y=open, X=(0-1500um)+/- 500um**
- Shield Wall
- Z=26.7m

## Engineering Analysis of Front End Fixed Mask

- Thermal Analysis
- Stress Distribution

- Subjected to white beam from U19 CPMU device:

- Analysis also performed for FE horizontal aperture

## First Optics Enclosure

_**Contains:**_
- Power filter (Diamond)
- White beam Slits
- Horizontal Focusing mirror
- Conductance limiting Be window
- High heat load mono
- White beam monitor
- Bremsstrahlung stop
- Mono fluo screen
- Secondary Horizontal Source Aperture (+ BPM)
- Monochromatic shutter

## Power management

- Undulator produces             7.8kW
- FEFM (Mask)     absorbs (7.8kW - 354W)=7.446 kW
- HFM    (Mirror)      absorbs (354W-220W)= 134W
- HHM    (Mono)        absorbs   220W
- HRM    ( Mono)      ~0W

## Monochromatic  Hutch 1

- Tertiary Slits
- Beam monitor
- High Resolution Mono

## Monochromatic Hutches

- _Hutch 1_
- Quad diode BPM
- Aperture: Y=10mm, X=25mm
- Removable
- Tertiary Horizontal Source Aperture
- Aperture  Y=open, X = (0-5.0mm)+/-30mm
- Monochromatic Fluorescent Screen
- High-resolution mono (10-5 dE/E, removable fixed exit, energy range set by high res optics.)
- Possible location for experimental endstation

- _Hutch 2_
- 1 nm experimental endstation (at > 75m from source)
- Includes nanofocusing optics and sample stage
- Emphasizes fluorescent measurements

## Multilayer Laue Lenses

- substrate

- Varied line-spacing grating

- Depth-graded multilayers on flat Si substrate

-  Deposit varied line-spacing grating on flat substrate         (thinnest structures first)
-  Section to 5-20 m thickness (high aspect ratio structure)
- Assemble two into a single device (MLL)

- CNM, APS group: Maser *et al.*

- < 20nm performance!

## Kinoform Optics

- Instead of solid refractive optic:

- Use a kinoform:

- One can view the kinoform equivalently as
- A blazed zone plate
- An array of coherently interfering micro-lenses.

- K. E-L *et al.* (2003)

- < 80 nm

## We do not need to re-design beamline to accommodate either optic

- Both are line focus elements:
- will allow to correct for different vertical and horizontal source locations
- Both are chromatic  ~ 10-5, but MLL bandwidth is factor of 2 broader

## Side View

- Operational Mode 1: Direct mode

- Endstation in mono hutch 2 ( back hutch)

**Side View**

## Operational Mode 2: Waveguide mode

**Source**

**Focal Point  @ 41.34m**

**Front End Aperture (FEFM + FEHA)**

**Secondary Horizontal Source Aperture (SHSA)**

**Waveguide**

**.**

**.**

- Endstation in mono hutch 1

**Primary Focusing Optics**

**Horizontal Focusing Mirror ****(HFM)**

## Endstation 1 (APS Nanoprobe/Xradia)

_**Endstation Features**_
- First version being commisioned at APS
- Optical resolution 30nm
- Mechanical resolution projected 5nm
- More R&D required for positioning
- Fluorescence nanoprobe
- Full Field imaging
- Nano-Diffraction
- Nano-tomography
- Cryo sampleholder

- Beam     Direction

## Requirements imposed on Project

- _On Conventional Facilities_:
- Real time monitoring of vibrations
- Long beamline
- Satellite Building
- Utilities
- Ramp over long beamline section
- _On Accelerator Systems_
- Electron beam stability of  0.3 microns over 8 hrs

## Outstanding Issues

- Diamond filter thickness and phase error characterization
- 1nm resolution optics; Ongoing R&D effort
- Conservative mode is long beamline.
- Progress elsewhere on waveguide mode might give shorter beamline
- Vibration analysis/design ( see next)

## Should we attach nanoprobe to ring or not?

- Option A: Nanoprobe slab connected to main ring

- Option B: Nanoprobe slab isolated from main ring

- Nick Simos; finite element analysis tools

## And the answer is:

- Some vibration sources:

- and the system response

- Separating the nanoprobe remote slab reduces vibrations at experiment

## Undulator Beamline 2 Hard X-ray Nanoprobe (HXN)Total Estimated Cost ($ x 1000)

**Undulator Beamline 2 ****Hard X-ray Nanoprobe (HXN)****Total Estimated Cost ($ x 1000)**

| WBS Description | Direct $ |  |  | Total Burdened & Escalated | Bottoms up Contingency |  | Total with Contingency |
| --- | --- | --- | --- | --- | --- | --- | --- |
|  | FTEs | Labor | Non-Labor (Mtrl, Trvl, Act) |  | % | $ Value |  |
| 1.04.05.02  Undulator Beamline 2
Hard X-ray Nanoprobe (HXN)  | 12.5 | 1,084 | 8,784 | 12,726 | 44 | 5,592 | 18,319 |
| 1.04.05.02.01  Enclosures | 0.4 | 34 | 1,200 | 1,474 | 2 | 413 | 1,887 |
| 1.04.05.02.02  Beam Transport | 0.1 | 6 | 250 | 318 | .10 | 32 | 349 |
| 1.04.05.02.03  Utilities | 0.5 | 34 | 350 | 508 | 1 | 102 | 610 |
| 1.04.05.02.04  White Beam Components | 0.4 | 30 | 203 | 299 | 2 | 60 | 359 |
| 1.04.05.02.05  High Heatload Optics | 0 | 0 | 1,248 | 1,615 | 1 | 291 | 1,905 |
| 1.04.05.02.06  Beam Conditioning Optics | 0.4 | 31 | 604 | 770 | 1 | 85 | 855 |
| 1.04.05.02.07  Personnel Safety System | 0.8 | 49 | 65 | 182 | .24 | 44 | 226 |
| 1.04.05.02.08  Equipment Protection System | 0.4 | 24 | 25 | 86 | .24 | 20 | 104 |
| 1.04.05.02.09  Endstation 1 | 0.7 | 57 | 3,481 | 4,238 | 6 | 3,221 | 7,460 |
| 1.04.05.02.11  Beamline Controls | 0.2 | 12 | 400 | 497 | 2 | 149 | 646 |
| 1.04.05.02.12  Beamline Control Station | 0 | 0 | 25 | 34 | 0 | 0 | 34 |
| 1.04.05.02.13  Beamline Management | 8.7 | 806 | 33 | 1,642 | 2 | 804 | 2,447 |
| 1.04.05.02.14  Satellite Building  | 0 | 0 | 900 | 1,064 | 1 | 372 | 1,436 |

## Schedule Summary

## Slide 27

## Slide 28

## Slide 29

## Summary

- Nanoprobe line can be built to specifications, on time and on budget
- The design will deliver 1nm beams and experimental capability that will have significant impact across a range of disciplines
- Risks
- Need significant improvements in positioning control
- Optics R&D
- Attention to vibration sources